JP4994598B2 - 駆動装置 - Google Patents

駆動装置 Download PDF

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Publication number
JP4994598B2
JP4994598B2 JP2005078559A JP2005078559A JP4994598B2 JP 4994598 B2 JP4994598 B2 JP 4994598B2 JP 2005078559 A JP2005078559 A JP 2005078559A JP 2005078559 A JP2005078559 A JP 2005078559A JP 4994598 B2 JP4994598 B2 JP 4994598B2
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JP
Japan
Prior art keywords
displacement
link
driving
drive device
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005078559A
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English (en)
Japanese (ja)
Other versions
JP2006261481A5 (enExample
JP2006261481A (ja
Inventor
一朗 大貫
真 佐々木
啓太 三澤
誠 水野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005078559A priority Critical patent/JP4994598B2/ja
Priority to US11/374,193 priority patent/US7460320B2/en
Publication of JP2006261481A publication Critical patent/JP2006261481A/ja
Publication of JP2006261481A5 publication Critical patent/JP2006261481A5/ja
Priority to US12/208,443 priority patent/US7684136B2/en
Application granted granted Critical
Publication of JP4994598B2 publication Critical patent/JP4994598B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lens Barrels (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005078559A 2005-03-18 2005-03-18 駆動装置 Expired - Fee Related JP4994598B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005078559A JP4994598B2 (ja) 2005-03-18 2005-03-18 駆動装置
US11/374,193 US7460320B2 (en) 2005-03-18 2006-03-14 Driving system and optical-element driving system
US12/208,443 US7684136B2 (en) 2005-03-18 2008-09-11 Driving system and optical-element driving system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005078559A JP4994598B2 (ja) 2005-03-18 2005-03-18 駆動装置

Publications (3)

Publication Number Publication Date
JP2006261481A JP2006261481A (ja) 2006-09-28
JP2006261481A5 JP2006261481A5 (enExample) 2008-05-01
JP4994598B2 true JP4994598B2 (ja) 2012-08-08

Family

ID=37010041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005078559A Expired - Fee Related JP4994598B2 (ja) 2005-03-18 2005-03-18 駆動装置

Country Status (2)

Country Link
US (2) US7460320B2 (enExample)
JP (1) JP4994598B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4994598B2 (ja) * 2005-03-18 2012-08-08 キヤノン株式会社 駆動装置
JP5171061B2 (ja) * 2007-02-20 2013-03-27 キヤノン株式会社 駆動機構
US7589921B2 (en) * 2007-08-23 2009-09-15 Carl Zeiss Smt Ag Actuator device
JP5006762B2 (ja) * 2007-11-05 2012-08-22 キヤノン株式会社 露光装置及びデバイス製造方法
WO2018076339A1 (zh) * 2016-10-31 2018-05-03 中国科学院长春光学精密机械与物理研究所 光学元件六自由度微位移调节装置、投影物镜和光刻机

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01161326A (ja) * 1987-12-18 1989-06-26 Asahi Optical Co Ltd 焦点距離可変レンズのレンズ移動機構
DE4116270C2 (de) * 1990-05-18 2002-01-17 Toyo Tire & Rubber Co Dämpfungseinrichtung
JP3025904B2 (ja) * 1990-11-30 2000-03-27 東洋ゴム工業株式会社 防振装置
JPH0521246U (ja) * 1991-08-29 1993-03-19 株式会社タムロン 液晶プロジエクタ
JP3894509B2 (ja) * 1995-08-07 2007-03-22 キヤノン株式会社 光学装置、露光装置およびデバイス製造方法
JPH11189332A (ja) * 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP3631045B2 (ja) * 1999-06-16 2005-03-23 キヤノン株式会社 駆動装置、光学素子駆動装置、露光装置およびデバイス製造方法
JP4945845B2 (ja) * 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
US7154684B2 (en) * 2000-08-18 2006-12-26 Nikon Corporation Optical element holding apparatus
JP4945864B2 (ja) * 2000-08-18 2012-06-06 株式会社ニコン 保持装置、光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
JP2003337272A (ja) * 2002-03-12 2003-11-28 Nikon Corp 光学系の保持装置、光学素子の位置調整方法、鏡筒及び露光装置並びにデバイスの製造方法
JP4582306B2 (ja) * 2004-11-30 2010-11-17 株式会社ニコン 光学系及び露光装置
JP4994598B2 (ja) 2005-03-18 2012-08-08 キヤノン株式会社 駆動装置

Also Published As

Publication number Publication date
US20060209436A1 (en) 2006-09-21
US20090040632A1 (en) 2009-02-12
US7460320B2 (en) 2008-12-02
JP2006261481A (ja) 2006-09-28
US7684136B2 (en) 2010-03-23

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