JP4918537B2 - 半導体ウエハの保護テープ剥離方法および保護テープ剥離装置 - Google Patents
半導体ウエハの保護テープ剥離方法および保護テープ剥離装置 Download PDFInfo
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- JP4918537B2 JP4918537B2 JP2008315537A JP2008315537A JP4918537B2 JP 4918537 B2 JP4918537 B2 JP 4918537B2 JP 2008315537 A JP2008315537 A JP 2008315537A JP 2008315537 A JP2008315537 A JP 2008315537A JP 4918537 B2 JP4918537 B2 JP 4918537B2
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- 230000001681 protective effect Effects 0.000 title claims description 56
- 239000004065 semiconductor Substances 0.000 title claims description 39
- 238000000034 method Methods 0.000 title claims description 34
- 230000007547 defect Effects 0.000 claims description 28
- 238000012544 monitoring process Methods 0.000 claims description 11
- 238000004364 calculation method Methods 0.000 claims description 4
- 238000005336 cracking Methods 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/0046—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by constructional aspects of the apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B41/00—Arrangements for controlling or monitoring lamination processes; Safety arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/1062—Prior to assembly
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/108—Flash, trim or excess removal
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Dicing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
半導体ウエハの外周部に発生した欠陥を検出してその位置を記憶し、
記憶した位置情報から隣り合う欠陥同士の間隔を算出し、当該算出結果と前記剥離テープの幅を比較して剥離テープ幅より大きい間隔部分を求め、
求めた前記間隔部分から剥離テープの貼り付けおよび剥離を開始する
ことを特徴とする。
表面に保護テープが貼り付けられた半導体ウエハを載置保持する剥離テーブルと、
前記剥離テーブルに載置保持された半導体ウエハの表面にウエハ径よりも幅狭の剥離テープをウエハ直径方向に貼り付けて剥離するテープ剥離機構と、
前記剥離テーブルに載置保持された半導体ウエハの外周部を監視して欠陥を検出するウエハ監視機構と、
検出された欠陥のウエハ周方向での位置を記憶するとともに、隣り合う欠陥同士の間隔を算出して、前記剥離テープの幅より大きい間隔部分を求め、前記テープ剥離機構による剥離テープの貼り付け開始位置を前記幅広間隔部位にセットする制御手段と、
を備えたことを特徴とする。
3 … テープ剥離機構
4 … 剥離テープ供給部
5 … テープ回収部
6 … ウエハ監視機構
PT … 保護テープ
ST … 剥離テープ
W … 半導体ウエハ
Claims (3)
- 半導体ウエハの表面に貼り付けられた保護テープに当該半導体ウエハの直径よりも幅狭の剥離テープを貼り付けて剥離することで剥離テープと一体に保護テープをウエハ表面から剥離する半導体ウエハの保護テープ剥離方法であって、
半導体ウエハの外周部に発生した欠陥を検出してその位置を記憶し、
記憶した位置情報から隣り合う欠陥同士の間隔を算出し、当該算出結果と前記剥離テープの幅を比較して剥離テープ幅より大きい間隔部分を求め、
求めた前記間隔部分から剥離テープの貼り付けおよび剥離を開始する
ことを特徴とする半導体ウエハの保護テープ剥離方法。 - 請求項1に記載の半導体ウエハの保護テープ剥離方法において、
算出された間隔部位のうちの最も大きい間隔部分から剥離テープの貼り付けを開始する
ことを特徴とする半導体ウエハの保護テープ剥離方法。 - 半導体ウエハの表面に貼り付けられた保護テープに当該半導体ウエハの直径よりも幅狭の剥離テープを貼り付けて剥離することで剥離テープと一体に保護テープをウエハ表面から剥離する半導体ウエハの保護テープ剥離装置であって、
表面に保護テープが貼り付けられた半導体ウエハを載置保持する剥離テーブルと、
前記剥離テーブルに載置保持された半導体ウエハの表面にウエハ径よりも幅狭の剥離テープをウエハ直径方向に貼り付けて剥離するテープ剥離機構と、
前記剥離テーブルに載置保持された半導体ウエハの外周部を監視して欠陥を検出するウエハ監視機構と、
検出された欠陥のウエハ周方向での位置を記憶するとともに、隣り合う欠陥同士の間隔を算出して、前記剥離テープの幅より大きい間隔部分を求め、前記テープ剥離機構による剥離テープの貼り付け開始位置を前記幅広間隔部位にセットする制御手段と、
を備えたことを特徴とする半導体ウエハの保護テープ剥離装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008315537A JP4918537B2 (ja) | 2008-12-11 | 2008-12-11 | 半導体ウエハの保護テープ剥離方法および保護テープ剥離装置 |
KR1020090114276A KR20100067606A (ko) | 2008-12-11 | 2009-11-25 | 반도체 웨이퍼의 보호 테이프 박리 방법 및 보호 테이프 박리 장치 |
US12/630,638 US8038816B2 (en) | 2008-12-11 | 2009-12-03 | Method and apparatus for separating protective tape from semiconductor wafer |
CN2009102527418A CN101752219B (zh) | 2008-12-11 | 2009-12-09 | 半导体晶圆的保护带剥离方法及保护带剥离装置 |
TW098142178A TWI447792B (zh) | 2008-12-11 | 2009-12-10 | 半導體晶圓之保護帶剝離方法及保護帶剝離裝置 |
Applications Claiming Priority (1)
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JP2008315537A JP4918537B2 (ja) | 2008-12-11 | 2008-12-11 | 半導体ウエハの保護テープ剥離方法および保護テープ剥離装置 |
Publications (2)
Publication Number | Publication Date |
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JP2010141101A JP2010141101A (ja) | 2010-06-24 |
JP4918537B2 true JP4918537B2 (ja) | 2012-04-18 |
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JP2008315537A Expired - Fee Related JP4918537B2 (ja) | 2008-12-11 | 2008-12-11 | 半導体ウエハの保護テープ剥離方法および保護テープ剥離装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8038816B2 (ja) |
JP (1) | JP4918537B2 (ja) |
KR (1) | KR20100067606A (ja) |
CN (1) | CN101752219B (ja) |
TW (1) | TWI447792B (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5601071B2 (ja) * | 2010-07-30 | 2014-10-08 | トヨタ自動車株式会社 | 保護テープの剥離方法 |
JP5702983B2 (ja) * | 2010-10-12 | 2015-04-15 | 日東電工株式会社 | 両面粘着テープ貼付け方法および両面粘着テープ貼付け装置 |
KR101320773B1 (ko) * | 2012-01-16 | 2013-10-21 | 주식회사대지정밀 | 디에프에스알용 필링시스템 |
CN107381199B (zh) * | 2013-09-17 | 2019-04-19 | 日本电气硝子株式会社 | 玻璃膜剥离装置 |
JP6422355B2 (ja) * | 2015-01-29 | 2018-11-14 | 株式会社ディスコ | アライメント方法 |
CN106515171B (zh) * | 2016-12-09 | 2019-07-12 | 广东莱宝智能装备股份有限公司 | Ccd自动覆膜裁切收料机 |
JP2019181358A (ja) * | 2018-04-08 | 2019-10-24 | Aca株式会社 | 塗膜生成方法、および、塗膜構造 |
JP7061012B2 (ja) * | 2018-05-01 | 2022-04-27 | 株式会社ディスコ | 加工装置 |
US11430677B2 (en) * | 2018-10-30 | 2022-08-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer taping apparatus and method |
JP7266398B2 (ja) * | 2018-12-11 | 2023-04-28 | 株式会社ディスコ | 切削装置及び切削装置を用いたウエーハの加工方法 |
CN109878195A (zh) * | 2019-03-05 | 2019-06-14 | 苏州嘉大电子有限公司 | 剥离装置 |
JP2020191430A (ja) * | 2019-05-24 | 2020-11-26 | 株式会社ディスコ | ウェーハの処理方法及びテープ剥離装置 |
TWI806502B (zh) * | 2022-03-18 | 2023-06-21 | 萬潤科技股份有限公司 | 散熱膠墊貼合方法、裝置及設備 |
CN115588626B (zh) * | 2022-12-12 | 2023-03-24 | 北京象帝先计算技术有限公司 | 晶圆的缺陷模式识别方法、设备及存储介质 |
Family Cites Families (11)
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JPS63155635A (ja) * | 1986-12-18 | 1988-06-28 | Nitto Electric Ind Co Ltd | 半導体ウエハの自動貼付け装置 |
JP4502547B2 (ja) | 2000-08-07 | 2010-07-14 | 日東電工株式会社 | 半導体ウエハの保護テープ除去方法およびその装置 |
KR100537684B1 (ko) * | 2001-09-19 | 2005-12-20 | 올림푸스 가부시키가이샤 | 반도체웨이퍼검사장치 |
JP3826849B2 (ja) * | 2002-06-07 | 2006-09-27 | 株式会社Sumco | 欠陥検査方法および欠陥検査装置 |
JP4275522B2 (ja) * | 2003-12-26 | 2009-06-10 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP2006100413A (ja) * | 2004-09-28 | 2006-04-13 | Tokyo Seimitsu Co Ltd | フィルム貼付方法およびフィルム貼付装置 |
JP4326519B2 (ja) * | 2005-03-31 | 2009-09-09 | 日東電工株式会社 | 保護テープ剥離方法およびこれを用いた装置 |
JP4557871B2 (ja) * | 2005-11-28 | 2010-10-06 | 東京エレクトロン株式会社 | 欠損基板の検出方法及びその検出装置 |
WO2008136503A1 (ja) * | 2007-05-08 | 2008-11-13 | Tokyo Electron Limited | 処理装置、処理方法、被処理体の認識方法および記憶媒体 |
JP5022793B2 (ja) * | 2007-07-02 | 2012-09-12 | 日東電工株式会社 | 半導体ウエハの欠陥位置検出方法 |
JP4693817B2 (ja) * | 2007-07-02 | 2011-06-01 | 日東電工株式会社 | 半導体ウエハへの粘着テープ貼付け方法および保護テープの剥離方法 |
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2008
- 2008-12-11 JP JP2008315537A patent/JP4918537B2/ja not_active Expired - Fee Related
-
2009
- 2009-11-25 KR KR1020090114276A patent/KR20100067606A/ko active IP Right Grant
- 2009-12-03 US US12/630,638 patent/US8038816B2/en not_active Expired - Fee Related
- 2009-12-09 CN CN2009102527418A patent/CN101752219B/zh not_active Expired - Fee Related
- 2009-12-10 TW TW098142178A patent/TWI447792B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2010141101A (ja) | 2010-06-24 |
CN101752219B (zh) | 2013-10-30 |
TWI447792B (zh) | 2014-08-01 |
KR20100067606A (ko) | 2010-06-21 |
US8038816B2 (en) | 2011-10-18 |
CN101752219A (zh) | 2010-06-23 |
US20100147442A1 (en) | 2010-06-17 |
TW201030824A (en) | 2010-08-16 |
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