JP4805033B2 - 洗浄ローラ - Google Patents
洗浄ローラ Download PDFInfo
- Publication number
- JP4805033B2 JP4805033B2 JP2006168613A JP2006168613A JP4805033B2 JP 4805033 B2 JP4805033 B2 JP 4805033B2 JP 2006168613 A JP2006168613 A JP 2006168613A JP 2006168613 A JP2006168613 A JP 2006168613A JP 4805033 B2 JP4805033 B2 JP 4805033B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- roller
- cleaning liquid
- substrate
- brush
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Brushes (AREA)
- Liquid Crystal (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006168613A JP4805033B2 (ja) | 2006-06-19 | 2006-06-19 | 洗浄ローラ |
| TW096110300A TW200800069A (en) | 2006-06-19 | 2007-03-26 | Washing roller |
| KR1020070047376A KR100889455B1 (ko) | 2006-06-19 | 2007-05-16 | 세정 롤러 |
| CNB2007101111834A CN100496332C (zh) | 2006-06-19 | 2007-06-14 | 清洗辊子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006168613A JP4805033B2 (ja) | 2006-06-19 | 2006-06-19 | 洗浄ローラ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007335796A JP2007335796A (ja) | 2007-12-27 |
| JP4805033B2 true JP4805033B2 (ja) | 2011-11-02 |
Family
ID=38934946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006168613A Expired - Fee Related JP4805033B2 (ja) | 2006-06-19 | 2006-06-19 | 洗浄ローラ |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4805033B2 (https=) |
| KR (1) | KR100889455B1 (https=) |
| CN (1) | CN100496332C (https=) |
| TW (1) | TW200800069A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12091348B2 (en) | 2017-07-12 | 2024-09-17 | Corning Incorporated | Apparatus and methods for manufacturing a glass substrate |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI594811B (zh) * | 2010-05-19 | 2017-08-11 | 湯瑪士衛斯特公司 | 用於擦洗基材的裝置與方法 |
| CN102755980A (zh) * | 2011-04-25 | 2012-10-31 | 中芯国际集成电路制造(上海)有限公司 | 晶圆清洗刷和晶圆清洗装置 |
| KR101203652B1 (ko) | 2011-06-16 | 2012-11-23 | 주식회사 포스코 | 브러쉬 롤의 세정건조장치 |
| KR101318533B1 (ko) * | 2012-08-16 | 2013-10-16 | 주식회사 케이씨텍 | 기판 세정 장치 |
| CN103894354B (zh) * | 2012-12-27 | 2017-02-08 | 北京汉能创昱科技有限公司 | 一种基板清洗装置 |
| KR101590863B1 (ko) * | 2014-03-03 | 2016-02-18 | 주식회사 한길이에스티 | 인쇄회로기판 세척기 |
| CN104117517A (zh) * | 2014-06-26 | 2014-10-29 | 苏州一合光学有限公司 | 玻璃风刀清洗机的滚刷辊结构 |
| CN104043604A (zh) * | 2014-06-26 | 2014-09-17 | 深圳市华星光电技术有限公司 | 清洁刷结构 |
| CN106733795A (zh) * | 2016-12-26 | 2017-05-31 | 重庆荣易达铝业有限公司 | 清除缸盖孔道金属屑的方法 |
| CN107051930A (zh) * | 2016-12-26 | 2017-08-18 | 重庆荣易达铝业有限公司 | 缸盖弯孔清洗装置 |
| CN108638944A (zh) * | 2018-03-26 | 2018-10-12 | 合肥市富园汽车改装有限公司 | 一种户外宣传车显示屏清灰装置 |
| CN109037116B (zh) * | 2018-08-31 | 2021-05-28 | 上海华力微电子有限公司 | 晶圆清洗装置 |
| CN110664106A (zh) * | 2019-09-12 | 2020-01-10 | 安徽名扬刷业有限公司 | 一种清洗机用毛辊刷 |
| CN111014123B (zh) * | 2019-11-22 | 2021-07-13 | 沈阳丰晟电力设备有限公司 | 一种波纹油箱波纹片清理装置 |
| CN111851374B (zh) * | 2020-07-22 | 2022-06-07 | 山东城邦建设有限公司 | 一种市政环保用道路中间防护栏清洁机构 |
| CN112007882A (zh) * | 2020-08-26 | 2020-12-01 | 安徽普冈电子材料有限公司 | 一种腐蚀箔高效清洗装置 |
| CN113208265A (zh) * | 2020-12-08 | 2021-08-06 | 安徽立森刷业有限公司 | Tft-lcd显示屏生产中用清洗毛刷辊及其制作方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0774132A (ja) * | 1993-09-06 | 1995-03-17 | Fujitsu Ltd | ブラシスクラバとブラシスクラブ方法 |
| JP2000015190A (ja) * | 1998-07-03 | 2000-01-18 | Matsushita Electric Ind Co Ltd | 基板洗浄方法及び装置 |
| JP2000202379A (ja) * | 1999-01-14 | 2000-07-25 | Nikon Corp | ネジ穴洗浄装置および部品の洗浄方法 |
| KR100685919B1 (ko) * | 2000-12-29 | 2007-02-22 | 엘지.필립스 엘시디 주식회사 | 세정 장치 |
| KR20040104062A (ko) * | 2003-06-03 | 2004-12-10 | 삼성전자주식회사 | 웨이퍼 세정 장치 |
| JP2005138053A (ja) * | 2003-11-07 | 2005-06-02 | Sumitomo Precision Prod Co Ltd | 基板洗浄装置 |
-
2006
- 2006-06-19 JP JP2006168613A patent/JP4805033B2/ja not_active Expired - Fee Related
-
2007
- 2007-03-26 TW TW096110300A patent/TW200800069A/zh not_active IP Right Cessation
- 2007-05-16 KR KR1020070047376A patent/KR100889455B1/ko not_active Expired - Fee Related
- 2007-06-14 CN CNB2007101111834A patent/CN100496332C/zh not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12091348B2 (en) | 2017-07-12 | 2024-09-17 | Corning Incorporated | Apparatus and methods for manufacturing a glass substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100496332C (zh) | 2009-06-10 |
| TW200800069A (en) | 2008-01-01 |
| JP2007335796A (ja) | 2007-12-27 |
| CN101091604A (zh) | 2007-12-26 |
| KR100889455B1 (ko) | 2009-03-17 |
| KR20070120423A (ko) | 2007-12-24 |
| TWI327897B (https=) | 2010-08-01 |
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