KR100889455B1 - 세정 롤러 - Google Patents

세정 롤러 Download PDF

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Publication number
KR100889455B1
KR100889455B1 KR1020070047376A KR20070047376A KR100889455B1 KR 100889455 B1 KR100889455 B1 KR 100889455B1 KR 1020070047376 A KR1020070047376 A KR 1020070047376A KR 20070047376 A KR20070047376 A KR 20070047376A KR 100889455 B1 KR100889455 B1 KR 100889455B1
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KR
South Korea
Prior art keywords
cleaning
cleaning liquid
roller
brush
main body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020070047376A
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English (en)
Korean (ko)
Other versions
KR20070120423A (ko
Inventor
후토시 시마이
시게루 가와타
Original Assignee
도쿄 오카 고교 가부시키가이샤
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Application filed by 도쿄 오카 고교 가부시키가이샤 filed Critical 도쿄 오카 고교 가부시키가이샤
Publication of KR20070120423A publication Critical patent/KR20070120423A/ko
Application granted granted Critical
Publication of KR100889455B1 publication Critical patent/KR100889455B1/ko
Expired - Fee Related legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Brushes (AREA)
  • Liquid Crystal (AREA)
KR1020070047376A 2006-06-19 2007-05-16 세정 롤러 Expired - Fee Related KR100889455B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00168613 2006-06-19
JP2006168613A JP4805033B2 (ja) 2006-06-19 2006-06-19 洗浄ローラ

Publications (2)

Publication Number Publication Date
KR20070120423A KR20070120423A (ko) 2007-12-24
KR100889455B1 true KR100889455B1 (ko) 2009-03-17

Family

ID=38934946

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070047376A Expired - Fee Related KR100889455B1 (ko) 2006-06-19 2007-05-16 세정 롤러

Country Status (4)

Country Link
JP (1) JP4805033B2 (https=)
KR (1) KR100889455B1 (https=)
CN (1) CN100496332C (https=)
TW (1) TW200800069A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101203652B1 (ko) 2011-06-16 2012-11-23 주식회사 포스코 브러쉬 롤의 세정건조장치
CN108638944A (zh) * 2018-03-26 2018-10-12 合肥市富园汽车改装有限公司 一种户外宣传车显示屏清灰装置

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI594811B (zh) * 2010-05-19 2017-08-11 湯瑪士衛斯特公司 用於擦洗基材的裝置與方法
CN102755980A (zh) * 2011-04-25 2012-10-31 中芯国际集成电路制造(上海)有限公司 晶圆清洗刷和晶圆清洗装置
KR101318533B1 (ko) * 2012-08-16 2013-10-16 주식회사 케이씨텍 기판 세정 장치
CN103894354B (zh) * 2012-12-27 2017-02-08 北京汉能创昱科技有限公司 一种基板清洗装置
KR101590863B1 (ko) * 2014-03-03 2016-02-18 주식회사 한길이에스티 인쇄회로기판 세척기
CN104117517A (zh) * 2014-06-26 2014-10-29 苏州一合光学有限公司 玻璃风刀清洗机的滚刷辊结构
CN104043604A (zh) * 2014-06-26 2014-09-17 深圳市华星光电技术有限公司 清洁刷结构
CN106733795A (zh) * 2016-12-26 2017-05-31 重庆荣易达铝业有限公司 清除缸盖孔道金属屑的方法
CN107051930A (zh) * 2016-12-26 2017-08-18 重庆荣易达铝业有限公司 缸盖弯孔清洗装置
TWI753183B (zh) 2017-07-12 2022-01-21 美商康寧公司 製造玻璃基板的設備及方法
CN109037116B (zh) * 2018-08-31 2021-05-28 上海华力微电子有限公司 晶圆清洗装置
CN110664106A (zh) * 2019-09-12 2020-01-10 安徽名扬刷业有限公司 一种清洗机用毛辊刷
CN111014123B (zh) * 2019-11-22 2021-07-13 沈阳丰晟电力设备有限公司 一种波纹油箱波纹片清理装置
CN111851374B (zh) * 2020-07-22 2022-06-07 山东城邦建设有限公司 一种市政环保用道路中间防护栏清洁机构
CN112007882A (zh) * 2020-08-26 2020-12-01 安徽普冈电子材料有限公司 一种腐蚀箔高效清洗装置
CN113208265A (zh) * 2020-12-08 2021-08-06 安徽立森刷业有限公司 Tft-lcd显示屏生产中用清洗毛刷辊及其制作方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020056409A (ko) * 2000-12-29 2002-07-10 구본준, 론 위라하디락사 세정 장치
KR20040104062A (ko) * 2003-06-03 2004-12-10 삼성전자주식회사 웨이퍼 세정 장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0774132A (ja) * 1993-09-06 1995-03-17 Fujitsu Ltd ブラシスクラバとブラシスクラブ方法
JP2000015190A (ja) * 1998-07-03 2000-01-18 Matsushita Electric Ind Co Ltd 基板洗浄方法及び装置
JP2000202379A (ja) * 1999-01-14 2000-07-25 Nikon Corp ネジ穴洗浄装置および部品の洗浄方法
JP2005138053A (ja) * 2003-11-07 2005-06-02 Sumitomo Precision Prod Co Ltd 基板洗浄装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020056409A (ko) * 2000-12-29 2002-07-10 구본준, 론 위라하디락사 세정 장치
KR20040104062A (ko) * 2003-06-03 2004-12-10 삼성전자주식회사 웨이퍼 세정 장치

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101203652B1 (ko) 2011-06-16 2012-11-23 주식회사 포스코 브러쉬 롤의 세정건조장치
CN108638944A (zh) * 2018-03-26 2018-10-12 合肥市富园汽车改装有限公司 一种户外宣传车显示屏清灰装置

Also Published As

Publication number Publication date
CN100496332C (zh) 2009-06-10
TW200800069A (en) 2008-01-01
JP2007335796A (ja) 2007-12-27
JP4805033B2 (ja) 2011-11-02
CN101091604A (zh) 2007-12-26
KR20070120423A (ko) 2007-12-24
TWI327897B (https=) 2010-08-01

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