CN100496332C - 清洗辊子 - Google Patents

清洗辊子 Download PDF

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Publication number
CN100496332C
CN100496332C CNB2007101111834A CN200710111183A CN100496332C CN 100496332 C CN100496332 C CN 100496332C CN B2007101111834 A CNB2007101111834 A CN B2007101111834A CN 200710111183 A CN200710111183 A CN 200710111183A CN 100496332 C CN100496332 C CN 100496332C
Authority
CN
China
Prior art keywords
cleaning
main body
roller
roller main
mentioned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2007101111834A
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English (en)
Chinese (zh)
Other versions
CN101091604A (zh
Inventor
岛井太
河田茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of CN101091604A publication Critical patent/CN101091604A/zh
Application granted granted Critical
Publication of CN100496332C publication Critical patent/CN100496332C/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0412—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Brushes (AREA)
  • Liquid Crystal (AREA)
CNB2007101111834A 2006-06-19 2007-06-14 清洗辊子 Expired - Fee Related CN100496332C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006168613 2006-06-19
JP2006168613A JP4805033B2 (ja) 2006-06-19 2006-06-19 洗浄ローラ

Publications (2)

Publication Number Publication Date
CN101091604A CN101091604A (zh) 2007-12-26
CN100496332C true CN100496332C (zh) 2009-06-10

Family

ID=38934946

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2007101111834A Expired - Fee Related CN100496332C (zh) 2006-06-19 2007-06-14 清洗辊子

Country Status (4)

Country Link
JP (1) JP4805033B2 (https=)
KR (1) KR100889455B1 (https=)
CN (1) CN100496332C (https=)
TW (1) TW200800069A (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI594811B (zh) * 2010-05-19 2017-08-11 湯瑪士衛斯特公司 用於擦洗基材的裝置與方法
CN102755980A (zh) * 2011-04-25 2012-10-31 中芯国际集成电路制造(上海)有限公司 晶圆清洗刷和晶圆清洗装置
KR101203652B1 (ko) 2011-06-16 2012-11-23 주식회사 포스코 브러쉬 롤의 세정건조장치
KR101318533B1 (ko) * 2012-08-16 2013-10-16 주식회사 케이씨텍 기판 세정 장치
CN103894354B (zh) * 2012-12-27 2017-02-08 北京汉能创昱科技有限公司 一种基板清洗装置
KR101590863B1 (ko) * 2014-03-03 2016-02-18 주식회사 한길이에스티 인쇄회로기판 세척기
CN104117517A (zh) * 2014-06-26 2014-10-29 苏州一合光学有限公司 玻璃风刀清洗机的滚刷辊结构
CN104043604A (zh) * 2014-06-26 2014-09-17 深圳市华星光电技术有限公司 清洁刷结构
CN106733795A (zh) * 2016-12-26 2017-05-31 重庆荣易达铝业有限公司 清除缸盖孔道金属屑的方法
CN107051930A (zh) * 2016-12-26 2017-08-18 重庆荣易达铝业有限公司 缸盖弯孔清洗装置
TWI753183B (zh) 2017-07-12 2022-01-21 美商康寧公司 製造玻璃基板的設備及方法
CN108638944A (zh) * 2018-03-26 2018-10-12 合肥市富园汽车改装有限公司 一种户外宣传车显示屏清灰装置
CN109037116B (zh) * 2018-08-31 2021-05-28 上海华力微电子有限公司 晶圆清洗装置
CN110664106A (zh) * 2019-09-12 2020-01-10 安徽名扬刷业有限公司 一种清洗机用毛辊刷
CN111014123B (zh) * 2019-11-22 2021-07-13 沈阳丰晟电力设备有限公司 一种波纹油箱波纹片清理装置
CN111851374B (zh) * 2020-07-22 2022-06-07 山东城邦建设有限公司 一种市政环保用道路中间防护栏清洁机构
CN112007882A (zh) * 2020-08-26 2020-12-01 安徽普冈电子材料有限公司 一种腐蚀箔高效清洗装置
CN113208265A (zh) * 2020-12-08 2021-08-06 安徽立森刷业有限公司 Tft-lcd显示屏生产中用清洗毛刷辊及其制作方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0774132A (ja) * 1993-09-06 1995-03-17 Fujitsu Ltd ブラシスクラバとブラシスクラブ方法
JP2000015190A (ja) * 1998-07-03 2000-01-18 Matsushita Electric Ind Co Ltd 基板洗浄方法及び装置
JP2000202379A (ja) * 1999-01-14 2000-07-25 Nikon Corp ネジ穴洗浄装置および部品の洗浄方法
KR100685919B1 (ko) * 2000-12-29 2007-02-22 엘지.필립스 엘시디 주식회사 세정 장치
KR20040104062A (ko) * 2003-06-03 2004-12-10 삼성전자주식회사 웨이퍼 세정 장치
JP2005138053A (ja) * 2003-11-07 2005-06-02 Sumitomo Precision Prod Co Ltd 基板洗浄装置

Also Published As

Publication number Publication date
TW200800069A (en) 2008-01-01
JP2007335796A (ja) 2007-12-27
JP4805033B2 (ja) 2011-11-02
CN101091604A (zh) 2007-12-26
KR100889455B1 (ko) 2009-03-17
KR20070120423A (ko) 2007-12-24
TWI327897B (https=) 2010-08-01

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Granted publication date: 20090610

CF01 Termination of patent right due to non-payment of annual fee