JP4778896B2 - トリクロルシランの製造法及びトリクロルシランの製造に使用する珪素 - Google Patents
トリクロルシランの製造法及びトリクロルシランの製造に使用する珪素 Download PDFInfo
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- JP4778896B2 JP4778896B2 JP2006518566A JP2006518566A JP4778896B2 JP 4778896 B2 JP4778896 B2 JP 4778896B2 JP 2006518566 A JP2006518566 A JP 2006518566A JP 2006518566 A JP2006518566 A JP 2006518566A JP 4778896 B2 JP4778896 B2 JP 4778896B2
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- Prior art keywords
- silicon
- chromium
- reactor
- bed reactor
- selectivity
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
Description
のような種々の比率で含まれる主たる不純物はクロムと種々の金属間化合物相を形成し得る。
のクロムで合金化した。このクロム合金化珪素を前述した反応器及び製造法を用いるトリクロルシランの製造に使用した。図3に示すように、選択性はクロムで合金化された試料の場合により高かった。これらの操業においては、HClの100%
が転化された。
Claims (10)
- 珪素とHClガスとを、流動床反応器、攪拌床反応器または固定床反応器中で、250℃ないし1100℃の範囲の温度及び0.5−30気圧の絶対圧力の条件下で反応させることによってトリクロルシランを製造する際、反応器に供給される珪素が550ppmないし1%(重量)の範囲のクロムを含有することを特徴とするトリクロルシランの製造法。
- クロムが珪素と合金化されていることを特徴とする請求項1記載の製造法。
- 珪素を反応器に供給する前に、クロムを珪素と機械的に混合することを特徴とする請求項1記載の製造法。
- クロム含有粉砕体を用いて珪素を粉砕することによってクロムを珪素と機械的に混合することを特徴とする請求項3記載の製造法。
- 珪素とHClガスとを流動床反応器、攪拌床反応器又は固定床反応器中で250℃ないし1100℃の範囲の温度及び0.5-30気圧の絶対圧力の条件下で反応させることによってトリクロルシランを製造する際に、クロムを、反応器中のクロム含有量を該反応器中の珪素の重量に基づいて550ppmないし1%(重量)の範囲に制御するに必要な量で、反応器に供給することを特徴とするトリクロルシランの製造法。
- 反応器に供給されるクロムが珪素と合金化されたものであることを特徴とする請求項5に記載の製造法。
- 反応器に供給されるクロムを珪素と機械的に混合した後に該混合物を反応器に供給することを特徴とする請求項5に記載の製造法。
- クロムを、クロム含有粉砕体を用いて珪素を粉砕することによって、珪素と機械的に混合することを特徴とする請求項7に記載の製造法。
- クロム及び珪素を別個に反応器に添加することを特徴とする請求項5に記載の製造法。
- クロム化合物をHClガスとともに反応器に添加することを特徴とする請求項9に記載の製造法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20033093 | 2003-07-07 | ||
NO20033093A NO321276B1 (no) | 2003-07-07 | 2003-07-07 | Fremgangsmate for fremstilling av triklorsilan og silisium for bruk ved fremstilling av triklorsilan |
PCT/NO2004/000186 WO2005003030A1 (en) | 2003-07-07 | 2004-06-24 | Method for production of trichlorosilane and silicon for use in the production of trichlorosilane |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007527352A JP2007527352A (ja) | 2007-09-27 |
JP4778896B2 true JP4778896B2 (ja) | 2011-09-21 |
Family
ID=27800779
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006518566A Expired - Fee Related JP4778896B2 (ja) | 2003-07-07 | 2004-06-24 | トリクロルシランの製造法及びトリクロルシランの製造に使用する珪素 |
Country Status (11)
Country | Link |
---|---|
US (1) | US7462341B2 (ja) |
EP (1) | EP1680357B1 (ja) |
JP (1) | JP4778896B2 (ja) |
KR (1) | KR100752810B1 (ja) |
CN (1) | CN100349797C (ja) |
AT (1) | ATE409678T1 (ja) |
DE (2) | DE602004016876D1 (ja) |
EA (1) | EA009060B1 (ja) |
ES (1) | ES2310741T3 (ja) |
NO (1) | NO321276B1 (ja) |
WO (1) | WO2005003030A1 (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NO20043828L (no) * | 2004-09-13 | 2006-03-14 | Elkem As | Fremgangsmate for fremstilling av triklorsilan, fremgangsmate for fremstilling av silisium og silisium for bruk ved fremstilling av triklorsilan |
NO20054402L (no) * | 2005-09-22 | 2007-03-23 | Elkem As | Method for production of trichlorosilane and silicon for use in the production of trichlorosilane |
EP2371382B1 (en) | 2005-12-29 | 2016-03-02 | Boehringer Ingelheim Vetmedica, Inc. | Use of a PCV2 immunogenic composition for lessening clinical symptoms in pigs |
KR101573933B1 (ko) * | 2008-02-29 | 2015-12-02 | 미쓰비시 마테리알 가부시키가이샤 | 트리클로로실란의 제조 방법 및 제조 장치 |
US20100264362A1 (en) * | 2008-07-01 | 2010-10-21 | Yongchae Chee | Method of producing trichlorosilane (TCS) rich Chlorosilane product stably from a fluidized gas phase reactor (FBR) and the structure of the reactor |
DE102008041974A1 (de) | 2008-09-10 | 2010-03-11 | Evonik Degussa Gmbh | Vorrichtung, deren Verwendung und ein Verfahren zur energieautarken Hydrierung von Chlorsilanen |
WO2010074673A1 (en) * | 2008-12-23 | 2010-07-01 | Arise Technologies Corporation | Method and apparatus for the production of chlorosilanes |
KR101687833B1 (ko) * | 2009-01-20 | 2016-12-19 | 미쓰비시 마테리알 가부시키가이샤 | 트리클로로실란 제조 장치 및 트리클로로실란 제조 방법 |
US8168123B2 (en) * | 2009-02-26 | 2012-05-01 | Siliken Chemicals, S.L. | Fluidized bed reactor for production of high purity silicon |
WO2010123869A1 (en) * | 2009-04-20 | 2010-10-28 | Ae Polysilicon Corporation | Methods and system for cooling a reaction effluent gas |
JP2012523963A (ja) | 2009-04-20 | 2012-10-11 | エーイー ポリシリコン コーポレーション | ケイ化物がコーティングされた金属表面を有する反応器 |
NO20100358A1 (no) * | 2010-03-12 | 2011-09-13 | Elkem As | Fremgangsmate for fremstilling av triklorsilan fra silisium, hydrogen og silisiumtetraklorid |
NO334216B1 (no) * | 2010-08-13 | 2014-01-13 | Elkem As | Fremgangsmåte for fremstilling av triklorsilan og silisium for bruk ved fremstilling av triklorsilan |
EP2825506A4 (en) * | 2012-03-14 | 2015-12-02 | Sitec Gmbh | PRODUCTION OF TRICHLOROSILANE |
US8875728B2 (en) | 2012-07-12 | 2014-11-04 | Siliken Chemicals, S.L. | Cooled gas distribution plate, thermal bridge breaking system, and related methods |
EP2969948A1 (en) * | 2013-03-13 | 2016-01-20 | SiTec GmbH | Temperature management in chlorination processes and systems related thereto |
DE102013215011A1 (de) | 2013-07-31 | 2015-02-05 | Wacker Chemie Ag | Verfahren zur Herstellung von Trichlorsilan |
KR101580171B1 (ko) | 2014-01-23 | 2015-12-24 | 한국화학연구원 | 금속 실리사이드 표면개질 방법, 표면개질된 금속 실리사이드를 이용한 삼염화실란의 제조방법 및 제조장치 |
US10040689B2 (en) * | 2014-12-19 | 2018-08-07 | Dow Silicones Corporation | Process for preparing monohydrogentrihalosilanes |
JP2022534930A (ja) * | 2019-05-29 | 2022-08-04 | ワッカー ケミー アクチエンゲゼルシャフト | 構造最適化シリコン粒子を有するトリクロロシランを生成するための方法 |
JP7278888B2 (ja) * | 2019-06-28 | 2023-05-22 | 高純度シリコン株式会社 | トリクロロシランの製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55136116A (en) * | 1979-04-11 | 1980-10-23 | Dow Corning | Preparation of silicon |
WO2003018207A1 (en) * | 2001-08-27 | 2003-03-06 | Elkem Asa | Method for removing impurities from silicon-containing residues |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2380995A (en) * | 1941-09-26 | 1945-08-07 | Gen Electric | Preparation of organosilicon halides |
US4585643A (en) * | 1985-05-31 | 1986-04-29 | Union Carbide Corporation | Process for preparing chlorosilanes from silicon and hydrogen chloride using an oxygen promoter |
DE3809784C1 (ja) * | 1988-03-23 | 1989-07-13 | Huels Ag, 4370 Marl, De | |
KR950002860B1 (ko) * | 1992-06-13 | 1995-03-27 | 한국과학기술연구원 | 클로로알켄닐실란들과그제조방법 |
US5871705A (en) * | 1996-09-19 | 1999-02-16 | Tokuyama Corporation | Process for producing trichlorosilane |
DE19645359A1 (de) * | 1996-11-04 | 1998-05-07 | Bayer Ag | Verfahren zur Herstellung von Alkylhalogensilanen |
DE10063863A1 (de) | 2000-12-21 | 2003-07-10 | Solarworld Ag | Wirbelbettreaktor für die Trichlorsilansynthese |
JP3812642B2 (ja) * | 2001-02-14 | 2006-08-23 | 信越化学工業株式会社 | オルガノハロシランの製造方法 |
DE10118483C1 (de) * | 2001-04-12 | 2002-04-18 | Wacker Chemie Gmbh | Staubrückführung bei der Direktsynthese von Chlor- und Methylchlorsilanen in Wirbelschicht |
US7780938B2 (en) * | 2006-04-13 | 2010-08-24 | Cabot Corporation | Production of silicon through a closed-loop process |
-
2003
- 2003-07-07 NO NO20033093A patent/NO321276B1/no not_active IP Right Cessation
-
2004
- 2004-06-24 EP EP04748762A patent/EP1680357B1/en not_active Revoked
- 2004-06-24 CN CNB2004800196948A patent/CN100349797C/zh not_active Expired - Fee Related
- 2004-06-24 JP JP2006518566A patent/JP4778896B2/ja not_active Expired - Fee Related
- 2004-06-24 ES ES04748762T patent/ES2310741T3/es active Active
- 2004-06-24 DE DE602004016876T patent/DE602004016876D1/de active Active
- 2004-06-24 DE DE04748762T patent/DE04748762T1/de active Pending
- 2004-06-24 KR KR1020067000260A patent/KR100752810B1/ko not_active IP Right Cessation
- 2004-06-24 US US10/563,781 patent/US7462341B2/en not_active Expired - Fee Related
- 2004-06-24 WO PCT/NO2004/000186 patent/WO2005003030A1/en active Application Filing
- 2004-06-24 EA EA200600192A patent/EA009060B1/ru not_active IP Right Cessation
- 2004-06-24 AT AT04748762T patent/ATE409678T1/de active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55136116A (en) * | 1979-04-11 | 1980-10-23 | Dow Corning | Preparation of silicon |
WO2003018207A1 (en) * | 2001-08-27 | 2003-03-06 | Elkem Asa | Method for removing impurities from silicon-containing residues |
Also Published As
Publication number | Publication date |
---|---|
EA200600192A1 (ru) | 2006-06-30 |
CN1819971A (zh) | 2006-08-16 |
KR100752810B1 (ko) | 2007-08-29 |
EA009060B1 (ru) | 2007-10-26 |
ES2310741T3 (es) | 2009-01-16 |
NO20033093L (no) | 2005-01-10 |
DE602004016876D1 (de) | 2008-11-13 |
DE04748762T1 (de) | 2007-06-06 |
WO2005003030A1 (en) | 2005-01-13 |
ATE409678T1 (de) | 2008-10-15 |
EP1680357A1 (en) | 2006-07-19 |
CN100349797C (zh) | 2007-11-21 |
JP2007527352A (ja) | 2007-09-27 |
US20070086936A1 (en) | 2007-04-19 |
NO20033093D0 (no) | 2003-07-07 |
NO321276B1 (no) | 2006-04-18 |
KR20060056306A (ko) | 2006-05-24 |
US7462341B2 (en) | 2008-12-09 |
EP1680357B1 (en) | 2008-10-01 |
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