EA200600192A1 - Способ получения трихлорсилана и кремния, используемого для получения трихлорсилана - Google Patents

Способ получения трихлорсилана и кремния, используемого для получения трихлорсилана

Info

Publication number
EA200600192A1
EA200600192A1 EA200600192A EA200600192A EA200600192A1 EA 200600192 A1 EA200600192 A1 EA 200600192A1 EA 200600192 A EA200600192 A EA 200600192A EA 200600192 A EA200600192 A EA 200600192A EA 200600192 A1 EA200600192 A1 EA 200600192A1
Authority
EA
Eurasian Patent Office
Prior art keywords
trichlorosilane
silicon
bed reactor
silicon used
producing
Prior art date
Application number
EA200600192A
Other languages
English (en)
Other versions
EA009060B1 (ru
Inventor
Ян-Отто Хоэль
Харри Мортен Ронг
Торбьерн Реэ
Харальд Арнльот Эйе
Original Assignee
Элкем Аса
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27800779&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EA200600192(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Элкем Аса filed Critical Элкем Аса
Publication of EA200600192A1 publication Critical patent/EA200600192A1/ru
Publication of EA009060B1 publication Critical patent/EA009060B1/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen

Abstract

Настоящее изобретение относится к способу для получения трихлорсилана взаимодействием кремния с газообразным HCl при температуре от 250 до 1100°С и абсолютном давлении 0,5-30 атм в реакторе с псевдоожиженным слоем, в реакторе с движущимся слоем или в реакторе с неподвижном слоем, где подаваемый в реактор кремний содержит от 30 до 10000 промиль хрома. Кроме того, изобретение относится к кремнию, используемому при получении трихлорсилана взаимодействием кремния с газообразным HCl, содержащим от 30 до 10000 промиль хрома, при этом оставшаяся часть, за исключением обычных примесей, приходится на кремний.
EA200600192A 2003-07-07 2004-06-24 Способ получения трихлорсилана и кремния, используемого для получения трихлорсилана EA009060B1 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NO20033093A NO321276B1 (no) 2003-07-07 2003-07-07 Fremgangsmate for fremstilling av triklorsilan og silisium for bruk ved fremstilling av triklorsilan
PCT/NO2004/000186 WO2005003030A1 (en) 2003-07-07 2004-06-24 Method for production of trichlorosilane and silicon for use in the production of trichlorosilane

Publications (2)

Publication Number Publication Date
EA200600192A1 true EA200600192A1 (ru) 2006-06-30
EA009060B1 EA009060B1 (ru) 2007-10-26

Family

ID=27800779

Family Applications (1)

Application Number Title Priority Date Filing Date
EA200600192A EA009060B1 (ru) 2003-07-07 2004-06-24 Способ получения трихлорсилана и кремния, используемого для получения трихлорсилана

Country Status (11)

Country Link
US (1) US7462341B2 (ru)
EP (1) EP1680357B1 (ru)
JP (1) JP4778896B2 (ru)
KR (1) KR100752810B1 (ru)
CN (1) CN100349797C (ru)
AT (1) ATE409678T1 (ru)
DE (2) DE602004016876D1 (ru)
EA (1) EA009060B1 (ru)
ES (1) ES2310741T3 (ru)
NO (1) NO321276B1 (ru)
WO (1) WO2005003030A1 (ru)

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NO20043828L (no) * 2004-09-13 2006-03-14 Elkem As Fremgangsmate for fremstilling av triklorsilan, fremgangsmate for fremstilling av silisium og silisium for bruk ved fremstilling av triklorsilan
NO20054402L (no) * 2005-09-22 2007-03-23 Elkem As Method for production of trichlorosilane and silicon for use in the production of trichlorosilane
DK2371383T3 (en) 2005-12-29 2015-11-30 Boehringer Ingelheim Vetmed Use of a PCV2 immunogenic composition for reduction of clinical symptoms in pigs
KR101573933B1 (ko) * 2008-02-29 2015-12-02 미쓰비시 마테리알 가부시키가이샤 트리클로로실란의 제조 방법 및 제조 장치
US20100264362A1 (en) * 2008-07-01 2010-10-21 Yongchae Chee Method of producing trichlorosilane (TCS) rich Chlorosilane product stably from a fluidized gas phase reactor (FBR) and the structure of the reactor
DE102008041974A1 (de) 2008-09-10 2010-03-11 Evonik Degussa Gmbh Vorrichtung, deren Verwendung und ein Verfahren zur energieautarken Hydrierung von Chlorsilanen
WO2010074673A1 (en) * 2008-12-23 2010-07-01 Arise Technologies Corporation Method and apparatus for the production of chlorosilanes
KR101687833B1 (ko) * 2009-01-20 2016-12-19 미쓰비시 마테리알 가부시키가이샤 트리클로로실란 제조 장치 및 트리클로로실란 제조 방법
US8168123B2 (en) * 2009-02-26 2012-05-01 Siliken Chemicals, S.L. Fluidized bed reactor for production of high purity silicon
JP2012523963A (ja) 2009-04-20 2012-10-11 エーイー ポリシリコン コーポレーション ケイ化物がコーティングされた金属表面を有する反応器
TWI454309B (zh) * 2009-04-20 2014-10-01 Jiangsu Zhongneng Polysilicon Technology Dev Co Ltd 用於將反應排出氣體冷卻之方法及系統
NO20100358A1 (no) * 2010-03-12 2011-09-13 Elkem As Fremgangsmate for fremstilling av triklorsilan fra silisium, hydrogen og silisiumtetraklorid
NO334216B1 (no) 2010-08-13 2014-01-13 Elkem As Fremgangsmåte for fremstilling av triklorsilan og silisium for bruk ved fremstilling av triklorsilan
US20150030520A1 (en) * 2012-03-14 2015-01-29 Centrotherm Photovoltaics Usa, Inc. Trichlorosilane production
US8875728B2 (en) 2012-07-12 2014-11-04 Siliken Chemicals, S.L. Cooled gas distribution plate, thermal bridge breaking system, and related methods
WO2014165165A1 (en) * 2013-03-13 2014-10-09 Centrotherm Photovoltaics Usa, Inc. Temperature management in chlorination processes and systems related thereto
DE102013215011A1 (de) 2013-07-31 2015-02-05 Wacker Chemie Ag Verfahren zur Herstellung von Trichlorsilan
KR101580171B1 (ko) 2014-01-23 2015-12-24 한국화학연구원 금속 실리사이드 표면개질 방법, 표면개질된 금속 실리사이드를 이용한 삼염화실란의 제조방법 및 제조장치
EP3233732B8 (en) * 2014-12-19 2020-06-17 DDP Specialty Electronic Materials US 9, LLC Process for preparing monohydrogentrihalosilanes
WO2020239228A1 (de) * 2019-05-29 2020-12-03 Wacker Chemie Ag Verfahren zur herstellung von trichlorsilan mit strukturoptimierten silicium-partikeln
JP7278888B2 (ja) * 2019-06-28 2023-05-22 高純度シリコン株式会社 トリクロロシランの製造方法

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US2380995A (en) * 1941-09-26 1945-08-07 Gen Electric Preparation of organosilicon halides
US4247528A (en) * 1979-04-11 1981-01-27 Dow Corning Corporation Method for producing solar-cell-grade silicon
US4585643A (en) * 1985-05-31 1986-04-29 Union Carbide Corporation Process for preparing chlorosilanes from silicon and hydrogen chloride using an oxygen promoter
DE3809784C1 (ru) * 1988-03-23 1989-07-13 Huels Ag, 4370 Marl, De
KR950002860B1 (ko) * 1992-06-13 1995-03-27 한국과학기술연구원 클로로알켄닐실란들과그제조방법
US5871705A (en) * 1996-09-19 1999-02-16 Tokuyama Corporation Process for producing trichlorosilane
DE19645359A1 (de) * 1996-11-04 1998-05-07 Bayer Ag Verfahren zur Herstellung von Alkylhalogensilanen
DE10063863A1 (de) * 2000-12-21 2003-07-10 Solarworld Ag Wirbelbettreaktor für die Trichlorsilansynthese
JP3812642B2 (ja) * 2001-02-14 2006-08-23 信越化学工業株式会社 オルガノハロシランの製造方法
DE10118483C1 (de) * 2001-04-12 2002-04-18 Wacker Chemie Gmbh Staubrückführung bei der Direktsynthese von Chlor- und Methylchlorsilanen in Wirbelschicht
NO20014148A (no) * 2001-08-27 2003-02-03 Elkem As Fremgangsmåte for fjerning av forurensinger fra silisiuminneholdende residuer
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Also Published As

Publication number Publication date
ATE409678T1 (de) 2008-10-15
DE602004016876D1 (de) 2008-11-13
EP1680357B1 (en) 2008-10-01
DE04748762T1 (de) 2007-06-06
CN100349797C (zh) 2007-11-21
EP1680357A1 (en) 2006-07-19
EA009060B1 (ru) 2007-10-26
NO321276B1 (no) 2006-04-18
ES2310741T3 (es) 2009-01-16
US7462341B2 (en) 2008-12-09
NO20033093D0 (no) 2003-07-07
NO20033093L (no) 2005-01-10
KR20060056306A (ko) 2006-05-24
JP2007527352A (ja) 2007-09-27
JP4778896B2 (ja) 2011-09-21
CN1819971A (zh) 2006-08-16
WO2005003030A1 (en) 2005-01-13
US20070086936A1 (en) 2007-04-19
KR100752810B1 (ko) 2007-08-29

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MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): AM AZ BY KG MD TJ TM

MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): KZ RU