AU2002217047A1 - Method for producing trichlorosilane - Google Patents

Method for producing trichlorosilane

Info

Publication number
AU2002217047A1
AU2002217047A1 AU2002217047A AU1704702A AU2002217047A1 AU 2002217047 A1 AU2002217047 A1 AU 2002217047A1 AU 2002217047 A AU2002217047 A AU 2002217047A AU 1704702 A AU1704702 A AU 1704702A AU 2002217047 A1 AU2002217047 A1 AU 2002217047A1
Authority
AU
Australia
Prior art keywords
producing trichlorosilane
residence time
hydrogen chloride
silicon tetrachloride
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002217047A
Inventor
Frank Becker
Sigurd Buchholz
Leslaw Mleczko
Torsten Sill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SolarWorld AG
Original Assignee
SolarWorld AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SolarWorld AG filed Critical SolarWorld AG
Publication of AU2002217047A1 publication Critical patent/AU2002217047A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/043—Monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

The invention relates to a method for producing trichlorosilane by reacting silicon with silicon tetrachloride and hydrogen while adding hydrogen chloride, the residence time of the hydrogen chloride in the reaction chamber being less than the residence time of the silicon tetrachloride.
AU2002217047A 2000-12-14 2001-11-21 Method for producing trichlorosilane Abandoned AU2002217047A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10062413.8 2000-12-14
DE10062413A DE10062413A1 (en) 2000-12-14 2000-12-14 Process for the preparation of trichlorosilane
PCT/EP2001/013496 WO2002048024A2 (en) 2000-12-14 2001-11-21 Method for producing trichlorosilane

Publications (1)

Publication Number Publication Date
AU2002217047A1 true AU2002217047A1 (en) 2002-06-24

Family

ID=7667187

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002217047A Abandoned AU2002217047A1 (en) 2000-12-14 2001-11-21 Method for producing trichlorosilane

Country Status (6)

Country Link
US (1) US20040047793A1 (en)
EP (1) EP1341722B1 (en)
AT (1) ATE267143T1 (en)
AU (1) AU2002217047A1 (en)
DE (2) DE10062413A1 (en)
WO (1) WO2002048024A2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006050329B3 (en) * 2006-10-25 2007-12-13 Wacker Chemie Ag Preparing trichlorosilane-containing product mixture comprises reacting tetrachlorosilane with hydrogen containing educt gas, where the reaction takes place in supercritical pressure of the educt gas
DE102008017304A1 (en) * 2008-03-31 2009-10-01 Schmid Silicon Technology Gmbh Process and plant for the production of ultrapure silicon
AU2012261522B2 (en) * 2008-11-05 2015-02-05 Lord Ltd. Lp An apparatus and process for hydrogenation of a silicon tetrahalide and silicon to the trihalosilane
US8178051B2 (en) * 2008-11-05 2012-05-15 Stephen Michael Lord Apparatus and process for hydrogenation of a silicon tetrahalide and silicon to the trihalosilane
DE102009037155B3 (en) * 2009-08-04 2010-11-04 Schmid Silicon Technology Gmbh Process and plant for the production of trichlorosilane
US8298490B2 (en) * 2009-11-06 2012-10-30 Gtat Corporation Systems and methods of producing trichlorosilane
US20110243825A1 (en) * 2010-03-30 2011-10-06 Peak Sun Silicon Corporation Tetrahalosilane converter
TWI620906B (en) * 2010-09-27 2018-04-11 Ｇｔａｔ股份有限公司 Heater and related methods therefor
CN103260716B (en) 2010-12-20 2015-10-14 Memc电子材料有限公司 Polysilicon is prepared in the basic closed-loop policy relating to disproportionation operation
CN102642812A (en) * 2012-04-11 2012-08-22 中国恩菲工程技术有限公司 System for recovering hydrogen chloride from reductive tail gas
US9796594B2 (en) 2013-12-10 2017-10-24 Summit Process Design, Inc. Process for producing trichlorosilane
CN109963645B (en) * 2016-11-23 2022-03-11 瓦克化学股份公司 Method for hydrogenating silicon tetrachloride
CN111201198B (en) * 2017-10-05 2023-02-17 瓦克化学股份公司 Process for preparing chlorosilanes
CN109694077B (en) * 2017-10-24 2021-04-06 新特能源股份有限公司 Device and method for converting silicon tetrachloride into trichlorosilane
CN114127012B (en) * 2018-12-18 2024-02-06 瓦克化学股份公司 Method for producing chlorosilanes
WO2020125955A1 (en) * 2018-12-18 2020-06-25 Wacker Chemie Ag Process for preparing chlorosilanes
WO2020221421A1 (en) * 2019-04-29 2020-11-05 Wacker Chemie Ag Process for producing trichlorosilane with structure-optimised silicon particles

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1162028A (en) * 1979-08-01 1984-02-14 Larry M. Coleman Ultrahigh purity silane and silicon production
JPS5673617A (en) * 1979-11-17 1981-06-18 Osaka Titanium Seizo Kk Manufacture of trichlorosilane
DE3024319C2 (en) * 1980-06-27 1983-07-21 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Continuous process for the production of trichlorosilane
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
US5176892A (en) * 1990-12-06 1993-01-05 Dow Corning Corporation Supported metal catalyzed production of tetrachlorosilane

Also Published As

Publication number Publication date
ATE267143T1 (en) 2004-06-15
EP1341722A2 (en) 2003-09-10
EP1341722B1 (en) 2004-05-19
WO2002048024A2 (en) 2002-06-20
DE50102361D1 (en) 2004-06-24
WO2002048024A3 (en) 2003-03-27
US20040047793A1 (en) 2004-03-11
DE10062413A1 (en) 2002-07-04

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