JP4711446B2 - Finfetと一体化した平坦基板デバイス及びその製造方法 - Google Patents
Finfetと一体化した平坦基板デバイス及びその製造方法 Download PDFInfo
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- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
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- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
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- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
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- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66787—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a gate at the side of the channel
- H01L29/66795—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a gate at the side of the channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
Description
101:SOIウエハ
102:デバイス
103:基板
104、106、108、110:逆型ウェル領域
105:埋め込み分離層
111:浅いトレンチ分離領域
115:シリコン層
125:FinFETゲート
127:FETゲート
130:FinFET
131:平坦型FET
Claims (3)
- 基板と、
前記基板上の埋め込み分離層と、
前記埋め込み分離層上のフィン型電解効果トランジスタ(FinFET)と、
前記基板における平坦型電解効果トランジスタ(FET)であって、前記FETのゲート領域が前記FinFETのゲート領域と同様な高さに形成される、平坦型電解効果トランジスタ(FET)と、
を含む構造体。 - 基板と、
前記基板上の埋め込み分離層と、
前記埋め込み分離層上の半導体層と、
を含むシリコン・オン・インシュレータ(SOI)ウエハと、
前記埋め込み分離層上のフィン型電解効果トランジスタ(FinFET)と、
前記基板に組み込まれた平坦型電解効果トランジスタ(FET)であって、前記FETのゲート領域が前記FinFETのゲート領域と同様な高さに形成される、平坦型電解効果トランジスタ(FET)と、
を含む構造体。 - フィン型電解効果トランジスタ(FinFET)と一体化した平坦型電界効果トランジスタ(FET)基板デバイスを形成するための方法であって、
基板を準備するステップと、
埋め込み分離層を前記基板上に形成するステップと、
半導体層を前記埋め込み分離層に結合するステップと、
第1の誘電体層を前記半導体層上に形成した後、該第1の誘電体層をハードマスクとして該半導体層をエッチングしてフィン型構造体を形成するステップと、
前記埋め込み分離層の一部分を選択的に除去して前記基板を露出させるステップと、
前記フィン型構造体の側壁の上及び露出した前記基板の上に第2の誘電体層を形成するステップと、
前記第1の誘電体層の上及び前記第2の誘電体層の上にゲート材料を同時に堆積するステップと、
前記ゲート材料を同時に平坦化してFinFETのゲート領域とFETのゲート領域とを同様な高さに形成するステップと、
含む方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US10/711,974 | 2004-10-18 | ||
US10/711,974 US6949768B1 (en) | 2004-10-18 | 2004-10-18 | Planar substrate devices integrated with finfets and method of manufacture |
PCT/US2005/036471 WO2006044349A2 (en) | 2004-10-18 | 2005-10-11 | Planar substrate devices integrated with finfets and method of manufacture |
Publications (3)
Publication Number | Publication Date |
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JP2008517464A JP2008517464A (ja) | 2008-05-22 |
JP2008517464A5 JP2008517464A5 (ja) | 2008-09-04 |
JP4711446B2 true JP4711446B2 (ja) | 2011-06-29 |
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Application Number | Title | Priority Date | Filing Date |
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JP2007536791A Expired - Fee Related JP4711446B2 (ja) | 2004-10-18 | 2005-10-11 | Finfetと一体化した平坦基板デバイス及びその製造方法 |
Country Status (7)
Country | Link |
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US (2) | US6949768B1 (ja) |
EP (1) | EP1805795A4 (ja) |
JP (1) | JP4711446B2 (ja) |
KR (2) | KR100985639B1 (ja) |
CN (1) | CN100533758C (ja) |
TW (1) | TWI380343B (ja) |
WO (1) | WO2006044349A2 (ja) |
Families Citing this family (98)
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WO2006006438A1 (ja) * | 2004-07-12 | 2006-01-19 | Nec Corporation | 半導体装置及びその製造方法 |
JP2006049627A (ja) * | 2004-08-05 | 2006-02-16 | Toshiba Corp | 半導体装置及びその製造方法 |
KR100612419B1 (ko) * | 2004-10-19 | 2006-08-16 | 삼성전자주식회사 | 핀 트랜지스터 및 평판 트랜지스터를 갖는 반도체 소자 및그 형성 방법 |
JP2006261188A (ja) * | 2005-03-15 | 2006-09-28 | Seiko Epson Corp | 半導体装置の製造方法及び半導体装置 |
US7920544B2 (en) * | 2005-03-28 | 2011-04-05 | Qualcomm Incorporated | Method and apparatus for enhancing signal-to-noise ratio of position location measurements |
JP2007018588A (ja) * | 2005-07-06 | 2007-01-25 | Toshiba Corp | 半導体記憶装置および半導体記憶装置の駆動方法 |
WO2007049170A1 (en) * | 2005-10-25 | 2007-05-03 | Nxp B.V. | Finfet transistors |
US7512017B2 (en) * | 2005-12-21 | 2009-03-31 | Intel Corporation | Integration of planar and tri-gate devices on the same substrate |
US7264743B2 (en) * | 2006-01-23 | 2007-09-04 | Lam Research Corporation | Fin structure formation |
JP2007294857A (ja) * | 2006-03-28 | 2007-11-08 | Elpida Memory Inc | 半導体装置及びその製造方法 |
US7803670B2 (en) * | 2006-07-20 | 2010-09-28 | Freescale Semiconductor, Inc. | Twisted dual-substrate orientation (DSO) substrates |
US7456471B2 (en) * | 2006-09-15 | 2008-11-25 | International Business Machines Corporation | Field effect transistor with raised source/drain fin straps |
US8368144B2 (en) * | 2006-12-18 | 2013-02-05 | Infineon Technologies Ag | Isolated multigate FET circuit blocks with different ground potentials |
US8492796B2 (en) * | 2007-03-13 | 2013-07-23 | Infineon Technologies Ag | MuGFET switch |
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US7368354B2 (en) | 2008-05-06 |
WO2006044349A9 (en) | 2007-08-16 |
CN101103463A (zh) | 2008-01-09 |
TW200614334A (en) | 2006-05-01 |
TWI380343B (en) | 2012-12-21 |
US20060084212A1 (en) | 2006-04-20 |
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