JP4657563B2 - イミド基含有ポリマー材料からなる版型の印刷パターン形成および消去方法 - Google Patents
イミド基含有ポリマー材料からなる版型の印刷パターン形成および消去方法 Download PDFInfo
- Publication number
- JP4657563B2 JP4657563B2 JP2002127910A JP2002127910A JP4657563B2 JP 4657563 B2 JP4657563 B2 JP 4657563B2 JP 2002127910 A JP2002127910 A JP 2002127910A JP 2002127910 A JP2002127910 A JP 2002127910A JP 4657563 B2 JP4657563 B2 JP 4657563B2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- printing
- polymer material
- material containing
- hydrophilic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007639 printing Methods 0.000 title claims abstract description 43
- 238000000034 method Methods 0.000 title claims description 48
- 125000005462 imide group Chemical group 0.000 title claims description 12
- 239000002861 polymer material Substances 0.000 title claims description 10
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 30
- 239000000126 substance Substances 0.000 claims abstract description 27
- 239000007800 oxidant agent Substances 0.000 claims abstract description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 9
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 238000007645 offset printing Methods 0.000 claims description 5
- 229920002312 polyamide-imide Polymers 0.000 claims description 5
- 239000012286 potassium permanganate Substances 0.000 claims description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 150000004676 glycans Chemical class 0.000 claims description 4
- 229910017604 nitric acid Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229920001282 polysaccharide Polymers 0.000 claims description 4
- 239000005017 polysaccharide Substances 0.000 claims description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- 239000004962 Polyamide-imide Substances 0.000 claims description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 3
- 238000012993 chemical processing Methods 0.000 claims description 2
- 229910000071 diazene Inorganic materials 0.000 claims description 2
- 239000002563 ionic surfactant Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 239000004642 Polyimide Substances 0.000 abstract description 17
- 229920001721 polyimide Polymers 0.000 abstract description 17
- 239000000243 solution Substances 0.000 description 12
- 239000000976 ink Substances 0.000 description 8
- 230000003647 oxidation Effects 0.000 description 8
- 238000007254 oxidation reaction Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 238000010306 acid treatment Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000010410 layer Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000012459 cleaning agent Substances 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- RFSUNEUAIZKAJO-VRPWFDPXSA-N D-Fructose Natural products OC[C@H]1OC(O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-VRPWFDPXSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 description 1
- SRBFZHDQGSBBOR-OWMBCFKOSA-N L-ribopyranose Chemical compound O[C@H]1COC(O)[C@@H](O)[C@H]1O SRBFZHDQGSBBOR-OWMBCFKOSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- PYMYPHUHKUWMLA-UHFFFAOYSA-N arabinose Natural products OCC(O)C(O)C(O)C=O PYMYPHUHKUWMLA-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- SRBFZHDQGSBBOR-UHFFFAOYSA-N beta-D-Pyranose-Lyxose Natural products OC1COC(O)C(O)C1O SRBFZHDQGSBBOR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000013033 photocatalytic degradation reaction Methods 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1041—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by modification of the lithographic properties without removal or addition of material, e.g. by the mere generation of a lithographic pattern
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Printing Plates And Materials Therefor (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Rotary Presses (AREA)
- Liquid Developers In Electrophotography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10121561A DE10121561A1 (de) | 2001-05-03 | 2001-05-03 | Bebilderung und Löschung einer Druckform aus Polymermaterial mit Imid-Gruppen |
| DE10121561.4 | 2001-05-03 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003011316A JP2003011316A (ja) | 2003-01-15 |
| JP2003011316A5 JP2003011316A5 (enExample) | 2005-09-22 |
| JP4657563B2 true JP4657563B2 (ja) | 2011-03-23 |
Family
ID=7683521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002127910A Expired - Fee Related JP4657563B2 (ja) | 2001-05-03 | 2002-04-30 | イミド基含有ポリマー材料からなる版型の印刷パターン形成および消去方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6919165B2 (enExample) |
| EP (1) | EP1254768B1 (enExample) |
| JP (1) | JP4657563B2 (enExample) |
| CN (1) | CN1264676C (enExample) |
| AT (1) | ATE288830T1 (enExample) |
| CZ (1) | CZ300557B6 (enExample) |
| DE (2) | DE10121561A1 (enExample) |
| DK (1) | DK1254768T3 (enExample) |
| HK (1) | HK1053087B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10206938A1 (de) * | 2002-02-19 | 2003-09-04 | Oce Printing Systems Gmbh | Verfahren und Einrichtung zum Drucken, wobei eine hydrophile Schicht erzeugt und diese strukturiert wird |
| US6566039B1 (en) * | 2002-06-04 | 2003-05-20 | Gary Ganghui Teng | Variable data lithographic printing device and method |
| US6789478B1 (en) * | 2003-02-28 | 2004-09-14 | Heidelberger Druckmaschinen Ag | Device and method for controlling fluid delivery |
| US7879535B2 (en) * | 2004-03-26 | 2011-02-01 | Fujifilm Corporation | Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material |
| DE102005046863A1 (de) * | 2005-09-30 | 2007-06-14 | Man Roland Druckmaschinen Ag | Druckform |
| US7709185B2 (en) | 2006-03-24 | 2010-05-04 | Heidelberger Druckmaschinen Ag | Method for imaging a lithographic printing form |
| US20100251914A1 (en) * | 2009-04-01 | 2010-10-07 | Xerox Corporation | Imaging member |
| CN112571697A (zh) * | 2020-10-12 | 2021-03-30 | 安徽美阅文化发展股份有限公司 | 一种纸张印刷品深压纹凹凸版的生产工艺 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE103977C (enExample) | ||||
| DD103977A1 (enExample) * | 1973-04-11 | 1974-02-12 | ||
| US4568632A (en) * | 1982-10-07 | 1986-02-04 | International Business Machines Corporation | Patterning of polyimide films with far ultraviolet light |
| US4634659A (en) * | 1984-12-19 | 1987-01-06 | Lehigh University | Processing-free planographic printing plate |
| US4693958A (en) * | 1985-01-28 | 1987-09-15 | Lehigh University | Lithographic plates and production process therefor |
| US4999251A (en) * | 1989-04-03 | 1991-03-12 | General Electric Company | Method for treating polyetherimide substrates and articles obtained therefrom |
| US5051312A (en) | 1990-03-29 | 1991-09-24 | E. I. Du Pont De Nemours And Company | Modification of polymer surfaces |
| JPH04193956A (ja) * | 1990-11-28 | 1992-07-14 | Sumitomo Metal Mining Co Ltd | ポリイミド樹脂のエッチング法 |
| JPH04356387A (ja) * | 1991-05-30 | 1992-12-10 | Shin Etsu Polymer Co Ltd | 付着フラグメントの除去方法 |
| US5288519A (en) * | 1992-04-27 | 1994-02-22 | General Electric Company | Method of producing modified polyimide layer having improved adhesion to metal layer thereon |
| JP3405473B2 (ja) * | 1994-03-31 | 2003-05-12 | 日立化成工業株式会社 | 耐熱性樹脂のレ−ザ加工法 |
| JPH08310148A (ja) * | 1995-05-16 | 1996-11-26 | Nippon Paint Co Ltd | 液体現像処理工程が不要のレーザーダイレクト製版用平版刷版材およびそれを用いる印刷方法 |
| DE69710867T2 (de) * | 1997-04-18 | 2002-10-31 | Eastman Kodak Co., Rochester | Zylinder und Hülsen aus einer Zirconiumdioxidlegierung für lithografische Bilderzeugungs- und Druckverfahren |
| DE69805385T2 (de) | 1997-10-24 | 2002-09-12 | Fuji Photo Film Co., Ltd. | Vorrichtung zur Herstellung einer Druckplatte und Drucker und Drucksystem die diese Vorrichtung verwenden |
| DE19826377A1 (de) | 1998-06-12 | 1999-12-16 | Heidelberger Druckmasch Ag | Druckmaschine und Druckverfahren |
| US6162578A (en) * | 1998-12-18 | 2000-12-19 | Eastman Kodak Company | Imaging member containing heat sensitive hyperbranched polymer and methods of use |
| US6410202B1 (en) * | 1999-08-31 | 2002-06-25 | Eastman Kodak Company | Thermal switchable composition and imaging member containing cationic IR dye and methods of imaging and printing |
-
2001
- 2001-05-03 DE DE10121561A patent/DE10121561A1/de not_active Withdrawn
-
2002
- 2002-04-05 DK DK02007336T patent/DK1254768T3/da active
- 2002-04-05 EP EP02007336A patent/EP1254768B1/de not_active Expired - Lifetime
- 2002-04-05 CZ CZ20021199A patent/CZ300557B6/cs not_active IP Right Cessation
- 2002-04-05 AT AT02007336T patent/ATE288830T1/de not_active IP Right Cessation
- 2002-04-05 DE DE50202196T patent/DE50202196D1/de not_active Expired - Lifetime
- 2002-04-15 US US10/122,817 patent/US6919165B2/en not_active Expired - Fee Related
- 2002-04-27 CN CNB02118495XA patent/CN1264676C/zh not_active Expired - Fee Related
- 2002-04-30 JP JP2002127910A patent/JP4657563B2/ja not_active Expired - Fee Related
-
2003
- 2003-07-02 HK HK03104674.2A patent/HK1053087B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003011316A (ja) | 2003-01-15 |
| ATE288830T1 (de) | 2005-02-15 |
| DK1254768T3 (da) | 2005-04-11 |
| CN1387998A (zh) | 2003-01-01 |
| HK1053087A1 (en) | 2003-10-10 |
| CZ20021199A3 (cs) | 2003-01-15 |
| EP1254768A3 (de) | 2003-09-03 |
| US20020177053A1 (en) | 2002-11-28 |
| US6919165B2 (en) | 2005-07-19 |
| DE50202196D1 (de) | 2005-03-17 |
| EP1254768A2 (de) | 2002-11-06 |
| CZ300557B6 (cs) | 2009-06-17 |
| EP1254768B1 (de) | 2005-02-09 |
| DE10121561A1 (de) | 2002-11-07 |
| HK1053087B (zh) | 2007-01-12 |
| CN1264676C (zh) | 2006-07-19 |
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