JP4644726B2 - 塗布装置 - Google Patents

塗布装置 Download PDF

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Publication number
JP4644726B2
JP4644726B2 JP2008122020A JP2008122020A JP4644726B2 JP 4644726 B2 JP4644726 B2 JP 4644726B2 JP 2008122020 A JP2008122020 A JP 2008122020A JP 2008122020 A JP2008122020 A JP 2008122020A JP 4644726 B2 JP4644726 B2 JP 4644726B2
Authority
JP
Japan
Prior art keywords
substrate
coating
backing roll
cleaning
conveyor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008122020A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009268973A (ja
Inventor
勤 西尾
正紀 甲田
雅一 梶谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chugai Ro Co Ltd
Original Assignee
Chugai Ro Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chugai Ro Co Ltd filed Critical Chugai Ro Co Ltd
Priority to JP2008122020A priority Critical patent/JP4644726B2/ja
Priority to TW098102021A priority patent/TWI372659B/zh
Priority to KR1020090009243A priority patent/KR101077319B1/ko
Priority to CN2009100047416A priority patent/CN101574685B/zh
Publication of JP2009268973A publication Critical patent/JP2009268973A/ja
Application granted granted Critical
Publication of JP4644726B2 publication Critical patent/JP4644726B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B05C11/1023—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to velocity of target, e.g. to web advancement rate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
JP2008122020A 2008-05-08 2008-05-08 塗布装置 Expired - Fee Related JP4644726B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008122020A JP4644726B2 (ja) 2008-05-08 2008-05-08 塗布装置
TW098102021A TWI372659B (en) 2008-05-08 2009-01-20 Coating apparatus
KR1020090009243A KR101077319B1 (ko) 2008-05-08 2009-02-05 도포 장치
CN2009100047416A CN101574685B (zh) 2008-05-08 2009-02-20 涂布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008122020A JP4644726B2 (ja) 2008-05-08 2008-05-08 塗布装置

Publications (2)

Publication Number Publication Date
JP2009268973A JP2009268973A (ja) 2009-11-19
JP4644726B2 true JP4644726B2 (ja) 2011-03-02

Family

ID=41269835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008122020A Expired - Fee Related JP4644726B2 (ja) 2008-05-08 2008-05-08 塗布装置

Country Status (4)

Country Link
JP (1) JP4644726B2 (ko)
KR (1) KR101077319B1 (ko)
CN (1) CN101574685B (ko)
TW (1) TWI372659B (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5529673B2 (ja) * 2010-08-16 2014-06-25 中外炉工業株式会社 両面塗工装置
DE202011051396U1 (de) * 2011-09-22 2013-01-08 Düspohl Maschinenbau Gmbh Profilummantelungsmaschine
JP5943855B2 (ja) 2013-02-15 2016-07-05 中外炉工業株式会社 ロール搬送式コータ
JP6062776B2 (ja) * 2013-03-14 2017-01-18 中外炉工業株式会社 バッキングロールを有するコータ
DE102016007417A1 (de) * 2016-06-20 2017-12-21 Focke & Co. (Gmbh & Co. Kg) Station zum Aufbringen von fluiden Medien auf ein Substrat und Verfahren zum Betreiben derselben
CN106346531A (zh) * 2016-08-29 2017-01-25 贵州苗仁堂制药有限责任公司 一种水凝胶涂布机的切片机构
CN116809329B (zh) * 2023-08-30 2023-11-24 河南佰嘉新型节能材料有限公司 胶水涂抹装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1076206A (ja) * 1996-08-30 1998-03-24 Tokyo Electron Ltd 薄膜形成装置
JPH11513933A (ja) * 1996-08-03 1999-11-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 写真材料の製造方法および装置
JP2001121054A (ja) * 1999-10-26 2001-05-08 Hirano Tecseed Co Ltd 単板の塗工装置
JP2004223439A (ja) * 2003-01-24 2004-08-12 Toray Ind Inc 塗布装置および塗布方法並びにディスプレイ用部材の製造方法
JP2007048929A (ja) * 2005-08-10 2007-02-22 Tokyo Electron Ltd 塗布処理装置および塗布処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY115166A (en) * 1993-12-29 2003-04-30 Faustel Inc Process for resin impregnation of a porous web

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11513933A (ja) * 1996-08-03 1999-11-30 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 写真材料の製造方法および装置
JPH1076206A (ja) * 1996-08-30 1998-03-24 Tokyo Electron Ltd 薄膜形成装置
JP2001121054A (ja) * 1999-10-26 2001-05-08 Hirano Tecseed Co Ltd 単板の塗工装置
JP2004223439A (ja) * 2003-01-24 2004-08-12 Toray Ind Inc 塗布装置および塗布方法並びにディスプレイ用部材の製造方法
JP2007048929A (ja) * 2005-08-10 2007-02-22 Tokyo Electron Ltd 塗布処理装置および塗布処理方法

Also Published As

Publication number Publication date
JP2009268973A (ja) 2009-11-19
KR101077319B1 (ko) 2011-10-26
TW200946240A (en) 2009-11-16
KR20090117598A (ko) 2009-11-12
CN101574685A (zh) 2009-11-11
CN101574685B (zh) 2012-05-09
TWI372659B (en) 2012-09-21

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