200946240 六、發明說明： C發明所屈^_技術領域 發明領域 5 Ο 10 15 鲁 20 本發明係有關一種使用於液晶顯示用彩色濾光片、電 漿顯示用玻璃基板、光學濾光片、印刷基板等之製造者， 且係有關將塗佈液塗佈於基板上用以形成塗膜的塗佈裝200946240 VI. INSTRUCTION DESCRIPTION: C invention is in the field of technology. Field of the invention 5 Ο 10 15 Lu 20 The present invention relates to a color filter for liquid crystal display, a glass substrate for plasma display, an optical filter, and printing. A manufacturer of a substrate or the like, and a coating device for applying a coating liquid onto a substrate to form a coating film
【先前技術:J 發明背景 該種塗佈裝置有利用移載裝置（基板移載機器人）移 載（transfer )基板之基板移載式、及利用輸送帶搬運 (convey)基板之基板連續搬運式。 作為基板移載式之塗佈裝置，在專利文獻1中記載有利 用移載裝置（基板搬運機器人）將基板搬入載置台，並使 載置台或塗佈器之任一者相對地移動以在基板上形成塗膜 後，利用移載裝置將基板搬出之塗佈裝置。 又’在專利文獻2中記載有使複數的基板可載置於工作 台上’於載置於工作台之任意位置之基板形成塗膜之間， 在其他位置利用移載裝置進行基板的排出及/或載置，藉以 縮知處理1片基板所需時間的塗佈裝置。 但是’該等基板移载式的塗佈裝置於基板更換時需要 時間，且處理一片基板所需之產距時間（takt time)長，無 法期待可提升生產性。 …、 作為基板連續搬運式之途佈裝置，在專利文獻3中記栽 3 200946240 有，於塗佈器之前後設有搬送帶，將彈性框設置在從前程 序所搬入的基板上，—面透過設在前部搬送帶上的孔而將 該彈性框真空吸附一面搬運，且使通過塗佈器而於基板塗 佈後，利用後部搬送帶排出之塗佈裝置。 5 但是’該引用文獻3之塗佈裝置在塗佈器的部分由於沒 有基板的吸引力，而有基板與塗佈器（coater)之模頭（die) 間之間隙非為一定的問題。 又，在專利文獻4中記載有，如第5圖所示，在塗佈器 101之上流側設有用以使基板p移動之驅動輸送裝置1〇2、在 10下流側设有用以使基板P互相緊靠且具旋轉阻力的驅動輸 送裝置103、及設於該等輸送裝置1〇2、1〇3間且具固定旋轉 阻力之輸送裝置104，並一面利用設於各輸送裝置1〇2、 103、104之帶子正下方的吸引台1〇5吸引複數基板p，一面 無空隙地使其連續移動，且藉由塗佈器1〇1將塗料1〇6塗佈 15 於各基板P之塗佈裝置。 但是，在該引用文獻4之塗佈裝置，由於是在驅動輸送 裝置102、103、104之帶子上進行塗佈，因此帶子的平面度 難以保持在預定的公差内（例如1〇μιη)，因此仍然有基板p 與塗佈器101之模頭之間隙非為—定的問題。又，由於連續 2〇移動之基板Ρ與鄰接之基板Ρ間未有空隙地連續塗佈，因此 具有無法進行在基板Ρ之全周留下把持用空白之所謂框塗 佈（frame coating，參照第6圖）的問題。又，由於驅動輪 送裝置102、103、104具有速度差，因此基板ρ的裏面與驅 動輸送裝置102、103、104之帶子間產生滑動，而有在基板 200946240 p發生瑕疲之虞。 又’如引用文獻5、6 ’也有一面利用輥吸引薄膜狀之被塗 佈體一面進行塗佈的方法，但是該場合無法用於玻璃基板 等。 5 【專利文獻1】特開2000-197844號公報 【專利文獻2】特開2002-102771號公報 【專利文獻3】特開2000-151074號公報 【專利文獻4】特開2002-45775號公報 ® 【專利文獻5】特開平5-277418號公報 10 【專利文獻6】特開平6-039333號公報 【發明内容3 發明概要 本發明係鑑於前述習知之問題點而提出者，且係以提 供一種可使基板與塗佈器間之間隙穩定之塗佈裝置、可一 15片—片地控制基板速度而可藉以進行框塗佈的塗佈裝置、 藝及基板之裏面不發生瑕疵之塗佈裝置為課題。 為解決前述課題，本發明包含：塗佈器，係用以將塗 佈液塗佈在基板上者，背輥，係可旋轉驅動地配置於與前 述塗佈器對向的位置，且於外周具有吸引孔，一面吸引一 20面搬運前述基板；及搬運轉，係在前述背輥之上流側與下 流側搬運前述基板者。 、前述搬運耗以可-面吸引一面搬運前述基板者為佳。 ;此It况’剛述搬運親以置於較前述背輥低的位置者為 5 200946240 前述塗佈裝置以更包含配置於前述上流測搬運輥之上 流侧，且用以將前述基板搬入至背輥之搬入輸送裝置、及 配置於前述下流側搬運輥之下流側，且用以從前述背輕將 前述基板搬出之搬出輸送裝置者為佳。 5 W述塗佈11以具有可交互切換位置地設於塗佈位置盘 清洗位置之1對塗佈頭者為佳。於此情況，以在前述上流側 搬運輥與前述搬入輸送裝置間，或前述下流側搬運輕盘前 述搬出輸送襄置間，設有用以清洗位於清洗位置之前述塗 佈頭的清洗裝置者為佳。 1〇 冑述塗佈器或前述清洗裝置以在前述清洗位置可升降 地設置者為佳。 依據由前述構件構成之本發明’由於塗佈器下方配置 有背輥，因此輸送帶背輥上搬運之基板與塗佈器間之間隙 穩定，而可提高塗佈精度。 15 又，可以背輥與搬運輸送裝置-面吸引基板，-面一 片一片地控制速度成-定。因此，基板與背輥或搬運輸送 裝置間不會滑動，在基板的裏面不發生瑕疲。 再者，於搬運之基板間設有間隔且以一片一片地搬 運，-面在塗佈的始端與終端控制速度，一面從基板的前 加端起-定距離的位置開始塗佈，且在剩下從後端起一定距 離的位置完成塗佈，而可進行所謂框塗佈。 再者’利用設置1對塗佈頭與清洗裝置，在以位於塗佈 位置之塗佈頭將塗佈液塗佈於基板之間，可藉由清掃裝置 清掃位於清掃位置之塗佈頭，藉以可更縮短產距時間。 200946240 【爽 z^- ]| 較佳實施例之詳細說明 以下’依所附圖面說明本發明之實施態樣。 第1圖係顯示本發明之塗佈裝置1。塗佈裝置丨具有可升 5降地设於支持框2之1對塗佈頭（coating head) 3a、3b。支 持框2係可以縱軸4為中心180度旋動，且成為可將丨對塗佈 頭3a、3b在以箭頭3所示之基板p搬運方向之下流側的塗佈 ©位置與上流側之清洗位置交互地切換位置。1對塗佈頭3a、 3b係分別由狹縫模頭（slit die)構成，且在塗佈位置中成 1〇為可以所希望之厚度地將塗佈液塗佈於以一定速度被搬運 的基板P上。 在下流側之塗佈頭3b下方配置有背輥（backingr〇11) 5 與配置於其上流側及下流側之搬運輥6a、6b。 背輥5之兩端的轴係可於箭頭1*方向旋轉驅動地被支持 15者，以使其軸心成為與塗佈頭3b之長度方向平行。背輥5如 φ 第2圖所示，係直徑約400〜500mm中空圓筒狀之金屬製 輥，於其外表面較佳者係規則地形成有複數〇5〜2〇111111的 吸弓丨孔7。在背輥5之兩端的軸8形成有貫通孔9，該貫通孔9 係連接於真空泵等之吸引裝置丨〇。並構成驅動吸引裝置1〇 2〇時，背輥5之外周附近的空氣通過吸引孔7而被吸引，且被 引進到背輥5的内部，經由貫通孔9而導至吸引裝置1〇。 如第2圖所示，也可利用蓋丨丨包圍基板p附近的吸引孔 7 ’以局部地吸引基板P的塗佈部分。又，為使背親5及搬運 編a、此之吸引力為一定，也可在朝吸引裝置⑺的配管途 7 200946240 中設有電磁閥l〇a、l〇b、l〇c，以使在背輥5及搬運輥6a、 6b上部無基板P時，關閉電磁閥l〇a、l〇b、l〇c而不吸引。 老輥5之上流側與下流側的搬運輥6a、6b係分別由與背 輥5平行配置之直徑約ioommti根或2根輥12構成，且成為 5以與前述背輥5相同搬運力而可朝箭頭a方向搬運基板p。在 搬運輥6a、6b的下方配設有連接於吸引裝置1〇之向上開口 的導管（duct) 13。藉此，構成搬運輥6a、6b上方的空氣從 輥12間之間隙被吸引，且與背輥5相同地被導至吸引装置 10 〇 10 背輥5外周之最上部的高度係設置成只較搬運輥6a、6b 外周之最上部的高度高〇〜5〇〇gm。該高度差可不對從上流 側搬運輥6a通過背輥5而被搬運到下流側搬運輥补的基板p 造成損傷地矯正基板p的翹曲，而且可確保基板p朝背輥5 與各輥12的密著力。 15 參照第1圖，在上流侧之塗佈頭3a的下方配置有可升降 的清洗裝置14。清洗裝置14可沿著塗佈頭3a的吐出口往覆 移動，且可採用具刮取板、清洗刷、清洗噴嘴或清洗輥之 任意形式者。 在基板P的搬運方向，於清洗裝置14之上流侧配置有搬 2〇入輪送裝置15。同樣地’基板P的搬運方向中於背輥5及搬 運輥仙之下流側配置有搬出輸送裝置16。搬入輸送裝置15 係成為將從前1序而來之基板P搬人至背輥5。搬出輸送 裝置16係成為將從背輥5來的基板p搬出並搬運至下一程 序0 200946240 其次，依第3圖說明由前述構成而成之塗佈裝置丨之動 作。 如第3 (a)圖所示，於塗佈位置（亦即背輥5之上方） 設置一塗佈頭3b，且在清洗位置（亦即清洗裝置14之上方） 5設置另一塗佈頭3a。在此狀態利用搬入輸送裝置15將基板P 搬入，且使基板P的前端位於塗佈頭3b的下方。此處，為使 可進行框塗佈，使基板P的前端相較塗佈頭3b之正下方位於 下流側。並使基板P的後端位於清洗裝置14之正上方地點之 ^ 下流側，以使不妨礙清洗裝置14的上升。 1〇 於此狀態，如第3 (b)圖所示，下降塗佈位置之塗佈 ' 頭，且驅動背輥5及搬運輥6a、6b，並且驅動吸引裝置1〇 從裏面吸引基板P，並以箭頭&所示的搬運方向搬運，從塗 佈頭3b吐出塗佈液進行塗佈，在基板p上形成塗膜。另一方 面，將清洗裝置14上升，再使之沿著位於清洗位置之塗佈 15頭％之長度方向移動’以進行塗佈頭3a的清洗。藉此，位 φ 於塗佈位置之塗佈頭3b對基板P的塗佈與位於清洗位置之 塗佈頭3 a之清洗可同時進行，以縮短產距時間（加“ time )。 而且’該塗佈及清洗之處理中，下一個要處理的基板p 搬入輪送裝置15上待命。又，也可使塗佈頭％下降以代替 20使清洗裝置14上升。 塗佈頭3b對基板P之塗佈中，由於基板p係由背如之吸 =7與«輥.此邮:所吸彡卜因此基糾的裏面係 费著於背輥5與搬運輥6a、仙而被搬運。因此，基板p與塗 佈碩3b間之間隙穩^，而可以高精度的膜壓形成塗膜。 9 200946240 又，可以背輥5與搬運輥6a、6b—面吸引基板p，—面 —片-片地控制速度成-定。因此，基板p與背輥5及搬運 輥6a、6b間不產生滑動，基板P之裏面不發生瑕疵。 基板P的後端接近塗佈頭3b的下方時，如第3 (〇圖所 5示，在剩下到後端預定距離的狀態，停止基板P的搬運，且 使塗佈頭3b上升。另-方面’使完成清洗位於清洗位置之 塗佈頭3b的清洗裝置14下降。接著，以縱軸4為中心18〇0旋 轉支持框2，藉此切換成完成清洗之塗佈頭％位於塗佈位置 且元成塗佈之塗佈頭3b位於清洗位置。於此狀態，驅動搬 ❹ 1〇出輸送裝置16將業已塗佈之基板p朝下一程序搬出，且將在 搬入輸送裝置15上待命之下一基板p搬入。藉此，成為如第 3 U)圖所示的狀態，以下反覆進行相同的程序。 而且，在$述實施態樣中，背輥5之上流側及下流側設 有面吸引一面搬運基板P之搬運輥6&、6b，但是基板p小 15而不需大吸引力時’可省略該等搬運報6a、紐，如第4圖所 不也可延長搬運輸送裝置15、16直到背親5之上流側及下 流側的附近。又’如第4圖所示，也可使塗佈頭3為單體。 〇 【圈式簡單說明】 第1圖係本發明之塗佈裝置的側面圖； 20 第2圖係、第1圖之主要部分的放大斷面圖； 第3 (a)〜（C)圖係依序顯示使用1對塗佈頭以進行 基板之塗佈的步驟之側面圖； 第4圖係顯示本發明之塗佈裝置的變形例之側面圖； 第5圖係習知塗佈裝置的侧面圖；及 10 200946240 第6圖係業已進行框塗佈之基板的立體圖。 【主要元件符號說明】[Prior Art: J Background of the Invention] The coating apparatus includes a substrate transfer type in which a substrate is transferred by a transfer device (substrate transfer robot), and a substrate continuous transfer type in which a substrate is conveyed by a conveyor. In the substrate transfer type coating apparatus, Patent Document 1 discloses that a substrate is carried into a mounting table by a transfer device (substrate transfer robot), and any one of the mounting table and the applicator is relatively moved to the substrate. After the coating film is formed thereon, the substrate is carried out by the transfer device. Further, in Patent Document 2, it is described that a plurality of substrates can be placed on a table, and between the substrate forming coating film placed at any position on the table, and the substrate is discharged by another transfer device at another position. / or placement, by which the coating device for processing the time required for one substrate is indented. However, these substrate transfer type coating apparatuses require time for substrate replacement, and the takt time required to process one substrate is long, and it is not expected to improve productivity. In the case of the substrate continuous transfer type, the device is described in Patent Document 3, 2009-200940. The transfer belt is provided before and after the applicator, and the elastic frame is placed on the substrate carried by the previous program. A coating device that is disposed on the front conveyor belt and that conveys the elastic frame under vacuum suction and that is applied to the substrate by the applicator and then discharged by the rear conveyor belt. 5 However, the coating apparatus of the cited document 3 has a problem that the gap between the substrate and the die of the coater is not a problem in the portion of the applicator because there is no attraction of the substrate. Further, in Patent Document 4, as shown in FIG. 5, a drive transport device 1 2 for moving the substrate p on the flow side of the applicator 101 is provided, and a substrate P is provided on the downstream side of the 10 a drive conveyor 103 that abuts against each other and has rotational resistance, and a transport device 104 that is disposed between the transport devices 1〇2 and 1〇3 and has a fixed rotational resistance, and is disposed on each transport device 1〇2 The suction stage 1〇5 directly under the tape of 103 and 104 attracts the plurality of substrates p, and continuously moves without a gap, and the coating 1〇6 is applied 15 to the respective substrates P by the applicator 1〇1. Cloth device. However, in the coating apparatus of the cited document 4, since the coating is performed on the belts that drive the conveying apparatuses 102, 103, 104, it is difficult to maintain the flatness of the belt within a predetermined tolerance (for example, 1 〇 μηη), There is still a problem that the gap between the substrate p and the die of the applicator 101 is not fixed. In addition, since the substrate Ρ which is continuously moved 2 连续 and the adjacent substrate 连续 are continuously applied without a gap, there is a so-called frame coating (frame coating) in which the blank for holding the entire circumference of the substrate 无法 is not possible. 6 figure) The problem. Further, since the drive transporting devices 102, 103, and 104 have a speed difference, the inside of the substrate ρ and the belts of the drive transporting devices 102, 103, and 104 are slid, and there is a fear of fatigue on the substrate 200946240p. Further, as described in the cited documents 5 and 6', a method of applying a film-like coated body by a roll is applied, but this case cannot be used for a glass substrate or the like. [Patent Document 1] JP-A-2000-151074 (Patent Document 3) JP-A-2002-45074 (Patent Document 4) JP-A-2002-45775 [Patent Document 5] Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. A coating device for stabilizing the gap between the substrate and the applicator, a coating device capable of controlling the substrate speed in a sheet-and-sheet manner, and capable of performing frame coating, and a coating device in which the inside of the substrate and the substrate are not generated Question. In order to solve the above problems, the present invention includes an applicator for applying a coating liquid onto a substrate, and a back roller rotatably disposed at a position opposed to the applicator and on the outer periphery A suction hole is provided, and the substrate is conveyed by suction on one surface, and the substrate is conveyed on the flow side and the downstream side of the back roll. It is preferable that the conveyance consumes the substrate while being able to convey the substrate. The condition of the case is as follows: the lowering position of the carrier is lower than the position of the back roller. 5 200946240 The coating device further includes a flow side disposed on the upstream side of the upstream measuring roller, and is used to carry the substrate into the back. It is preferable that the roller loading/unloading device and the transporting device disposed on the lower side of the downstream side transport roller and for carrying out the substrate from the back light are preferable. It is preferable that the coating 11 is a pair of coating heads which are provided at the coating position of the cleaning position of the coating position. In this case, it is preferable that a cleaning device for cleaning the coating head located at the cleaning position is provided between the upstream side conveying roller and the loading/unloading device or between the downstream conveying light tray and the carrying and conveying device. . 1) The applicator or the aforementioned cleaning device is preferably provided to be liftable at the aforementioned cleaning position. According to the present invention comprising the above-mentioned members, since the back roller is disposed under the applicator, the gap between the substrate conveyed on the back roll of the conveyor belt and the applicator is stabilized, and the coating accuracy can be improved. 15 Further, the back roller and the conveying conveyor-surface can be used to attract the substrate, and the surface can be controlled one by one. Therefore, there is no slip between the substrate and the back roller or the transport conveyor, and no fatigue occurs in the inside of the substrate. Further, the substrates to be transported are transported one by one between the substrates to be transported, and the surface is controlled at a distance from the front end of the substrate to the end of the coating, and the coating is started. The coating is completed at a position at a certain distance from the rear end, and so-called frame coating can be performed. Furthermore, by applying the pair of coating heads and the cleaning device, the coating liquid is applied between the substrates by the coating head at the coating position, and the coating head located at the cleaning position can be cleaned by the cleaning device. Can shorten the production time. 200946240 [Slow z^-]| DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. Fig. 1 shows a coating device 1 of the present invention. The coating device has a pair of coating heads 3a, 3b which are provided in the support frame 2 at a reduced height. The support frame 2 is rotatably centered on the vertical axis 4 by 180 degrees, and is capable of coating the coating heads 3a and 3b on the flow side of the substrate p transporting direction indicated by the arrow 3 and the upstream side. The cleaning position alternately switches positions. Each of the pair of coating heads 3a and 3b is formed of a slit die, and the coating liquid is applied at a constant speed to a desired thickness in a coating position. On the substrate P. Below the coating head 3b on the downstream side, a backing roller 5 and a conveying roller 6a, 6b disposed on the upstream side and the downstream side thereof are disposed. The shaft ends of the back rolls 5 are rotatably supported in the direction of the arrow 1* so that the axis thereof is parallel to the longitudinal direction of the coating head 3b. The back roll 5 is a metal roll having a hollow cylindrical shape having a diameter of about 400 to 500 mm as shown in Fig. 2, and a suction bow having a plurality of 〇5 to 2〇111111 is preferably formed on the outer surface thereof. Hole 7. A through hole 9 is formed in the shaft 8 at both ends of the back roll 5, and the through hole 9 is connected to a suction device 等 such as a vacuum pump. When the suction device 1 is driven, the air near the outer circumference of the back roller 5 is sucked by the suction hole 7, and introduced into the back roller 5, and guided to the suction device 1 through the through hole 9. As shown in Fig. 2, the coating portion of the substrate P may be partially attracted by the cover hole surrounding the suction hole 7' in the vicinity of the substrate p. Further, in order to make the intimacy 5 and the conveyance a, the attraction force is constant, and the electromagnetic valves l〇a, l〇b, and l〇c may be provided in the piping passage 7 200946240 toward the suction device (7). When there is no substrate P in the upper portion of the back roller 5 and the conveyance rollers 6a and 6b, the solenoid valves l〇a, l〇b, and l〇c are closed without being attracted. The conveying rollers 6a and 6b on the flow side and the downstream side of the old roller 5 are respectively formed of a diameter of about 10 mm or 12 rollers 12 arranged in parallel with the back roller 5, and are 5 in the same conveying force as the back roller 5 described above. The substrate p is transported in the direction of the arrow a. Below the conveyance rollers 6a and 6b, a duct 13 connected to the upward opening of the suction device 1 is disposed. Thereby, the air constituting the upper side of the conveyance rollers 6a and 6b is sucked from the gap between the rolls 12, and is guided to the suction device 10 〇10 in the same manner as the back roll 5, and the height of the uppermost portion of the outer circumference of the back roll 5 is set to be only The height of the uppermost portion of the outer circumference of the conveyance rollers 6a and 6b is 〇5 〇〇gm. This height difference can correct the warpage of the substrate p without causing damage to the substrate p conveyed to the downstream side conveyance roller from the upstream side conveyance roller 6a by the back roller 5, and can ensure the substrate p toward the back roller 5 and the respective rollers 12. The strength of the close. Referring to Fig. 1, a cleaning device 14 that can be lifted and lowered is disposed below the coating head 3a on the upstream side. The cleaning device 14 can be moved over the discharge port of the coating head 3a, and any form having a scraping plate, a washing brush, a washing nozzle or a washing roller can be employed. In the transport direction of the substrate P, a transporting device 15 is disposed on the flow side of the cleaning device 14. Similarly, in the conveyance direction of the substrate P, the carry-out conveyor 16 is disposed on the downstream side of the back roller 5 and the transport roller. The loading/unloading device 15 moves the substrate P from the previous order to the back roller 5. The unloading and transporting device 16 transports the substrate p from the back roll 5 and transports it to the next step 0 200946240. Next, the operation of the coating device 前述 configured as described above will be described with reference to Fig. 3 . As shown in Fig. 3(a), a coating head 3b is disposed at the coating position (i.e., above the backing roller 5), and another coating head is disposed at the cleaning position (i.e., above the cleaning device 14). 3a. In this state, the substrate P is carried in by the loading/unloading device 15, and the front end of the substrate P is positioned below the coating head 3b. Here, in order to enable the frame coating, the front end of the substrate P is positioned on the downstream side directly below the coating head 3b. The rear end of the substrate P is placed on the downstream side of the position directly above the cleaning device 14 so as not to impede the rise of the cleaning device 14. In this state, as shown in FIG. 3(b), the coating head of the coating position is lowered, and the back roller 5 and the conveying rollers 6a, 6b are driven, and the suction device 1 is driven to suck the substrate P from the inside. The film is conveyed in the conveyance direction indicated by the arrow & the coating liquid is discharged from the coating head 3b, and a coating film is formed on the substrate p. On the other hand, the cleaning device 14 is raised and moved along the length direction of 15% of the coating at the cleaning position to perform cleaning of the coating head 3a. Thereby, the coating of the substrate P by the coating head 3b at the coating position and the cleaning of the coating head 3a at the cleaning position can be simultaneously performed to shorten the production time (plus "time". In the coating and cleaning process, the next substrate to be processed p is carried into the transfer device 15 for standby. Further, the coating head % can be lowered to replace the 20 to raise the cleaning device 14. The coating head 3b is opposite to the substrate P. In the coating, since the substrate p is sucked by the back = 7 and «roller. This post is sucked, so the inside of the base is charged by the back roll 5 and the conveyance roller 6a, and the fairy. Therefore, The gap between the substrate p and the coating master 3b is stabilized, and the coating film can be formed by high-precision film pressing. 9 200946240 Further, the backing roller 5 and the conveying rollers 6a, 6b can be used to attract the substrate p, the surface-sheet-piece The ground control speed is set to be constant. Therefore, no slip occurs between the substrate p and the back roller 5 and the conveyance rollers 6a and 6b, and no flaw occurs in the inside of the substrate P. When the rear end of the substrate P approaches the lower side of the coating head 3b, 3 (In the state shown in Fig. 5, the conveyance of the substrate P is stopped and the coating head 3b is raised in a state where the predetermined distance to the rear end is left. The surface 'to lower the cleaning device 14 that cleans the coating head 3b at the cleaning position. Then, the support frame 2 is rotated 18 〇0 around the vertical axis 4, thereby switching the coating head % to complete the cleaning at the coating position The coated coating head 3b is placed in the cleaning position. In this state, the transporting device 16 drives the coated substrate 16 to the next program, and will be placed on the loading and unloading device 15. The next substrate p is carried in. This is in the state shown in Fig. 3 U), and the same procedure is repeated in the following. Further, in the above-described embodiment, the back side roller 5 has a surface on the flow side and the downstream side. When the conveyance rollers 6 & 6b of the substrate P are conveyed, the substrate p is small 15 and does not require a large attraction force. The conveyance reports 6a and 纽 can be omitted, and the conveyance and conveyance device 15 can be extended as shown in FIG. 16 Until the vicinity of the flow side and the downstream side of the backing member 5. Further, as shown in Fig. 4, the coating head 3 can also be made into a single unit. 〇 [Circle type simple description] Fig. 1 is a coating of the present invention Side view of the device; 20 Fig. 2 is an enlarged sectional view of the main part of Fig. 1; 3(a) to 3(C) are side views showing, in order, a step of applying a pair of coating heads to apply a substrate; and FIG. 4 is a side view showing a modification of the coating apparatus of the present invention; Fig. 5 is a side view of a conventional coating device; and 10 200946240 Fig. 6 is a perspective view of a substrate which has been subjected to frame coating. [Description of main component symbols]
1 塗佈裝置 12 輥 2 支持框 13 導管 3a 塗佈頭 14 清洗裝置 3b 塗佈頭 15 輸送裝置 4 縱軸 16 輸送裝置 5 背輥 101 塗佈器 6a 搬運輥 102 輸送裝置 6b 搬運輥 103 輸送裝置 7 吸引孔 104 輸送裝置 8 軸 105 吸引台 9 貫通孔 106 塗料 10 吸引裝置 a 搬運方向 10a 電磁閥 P 基板 10b 電磁閥 Γ 方向 10c 電磁闊 11 蓋 111 Coating device 12 Roller 2 Support frame 13 Pipe 3a Coating head 14 Cleaning device 3b Coating head 15 Conveying device 4 Vertical axis 16 Conveying device 5 Back roller 101 Applicator 6a Transport roller 102 Transport device 6b Transport roller 103 Transport device 7 suction hole 104 conveying device 8 shaft 105 suction table 9 through hole 106 paint 10 suction device a conveying direction 10a solenoid valve P substrate 10b solenoid valve 方向 direction 10c electromagnetic width 11 cover 11