JP4596228B2 - マイクロエレクトロニクス基板の平坦化に使用される研磨パッドの研磨面の表面状態を調整およびモニターするための装置および方法 - Google Patents
マイクロエレクトロニクス基板の平坦化に使用される研磨パッドの研磨面の表面状態を調整およびモニターするための装置および方法 Download PDFInfo
- Publication number
- JP4596228B2 JP4596228B2 JP2001520262A JP2001520262A JP4596228B2 JP 4596228 B2 JP4596228 B2 JP 4596228B2 JP 2001520262 A JP2001520262 A JP 2001520262A JP 2001520262 A JP2001520262 A JP 2001520262A JP 4596228 B2 JP4596228 B2 JP 4596228B2
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- Prior art keywords
- polishing pad
- adjustment body
- adjustment
- polishing
- cylinder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- 238000005498 polishing Methods 0.000 title claims description 335
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/006—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the speed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/18—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the presence of dressing tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/12—Dressing tools; Holders therefor
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Lubricants (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
- Paper (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/387,063 | 1999-08-31 | ||
| US09/387,063 US6306008B1 (en) | 1999-08-31 | 1999-08-31 | Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
| PCT/US2000/024345 WO2001015865A1 (en) | 1999-08-31 | 2000-08-31 | Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003508904A JP2003508904A (ja) | 2003-03-04 |
| JP2003508904A5 JP2003508904A5 (enExample) | 2007-03-22 |
| JP4596228B2 true JP4596228B2 (ja) | 2010-12-08 |
Family
ID=23528304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001520262A Expired - Fee Related JP4596228B2 (ja) | 1999-08-31 | 2000-08-31 | マイクロエレクトロニクス基板の平坦化に使用される研磨パッドの研磨面の表面状態を調整およびモニターするための装置および方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (9) | US6306008B1 (enExample) |
| EP (1) | EP1222056B1 (enExample) |
| JP (1) | JP4596228B2 (enExample) |
| KR (1) | KR100708227B1 (enExample) |
| AT (1) | ATE380628T1 (enExample) |
| AU (1) | AU7114600A (enExample) |
| DE (2) | DE60037438D1 (enExample) |
| WO (1) | WO2001015865A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180036526A (ko) | 2016-09-30 | 2018-04-09 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판 연마 장치 |
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| US7069101B1 (en) | 1999-07-29 | 2006-06-27 | Applied Materials, Inc. | Computer integrated manufacturing techniques |
| JP3760064B2 (ja) * | 1999-08-09 | 2006-03-29 | 株式会社日立製作所 | 半導体装置の製造方法及び半導体装置の平坦化加工装置 |
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- 2000-08-31 DE DE60037438T patent/DE60037438D1/de not_active Expired - Lifetime
- 2000-08-31 AT AT00959904T patent/ATE380628T1/de not_active IP Right Cessation
- 2000-08-31 DE DE10084938T patent/DE10084938B4/de not_active Expired - Fee Related
- 2000-08-31 KR KR1020027002482A patent/KR100708227B1/ko not_active Expired - Fee Related
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20180036526A (ko) | 2016-09-30 | 2018-04-09 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판 연마 장치 |
| US10625395B2 (en) | 2016-09-30 | 2020-04-21 | Ebara Corporation | Substrate polishing apparatus |
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| AU7114600A (en) | 2001-03-26 |
| US6572440B2 (en) | 2003-06-03 |
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| DE10084938T1 (de) | 2002-09-12 |
| US20010006874A1 (en) | 2001-07-05 |
| EP1222056A1 (en) | 2002-07-17 |
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| US6840840B2 (en) | 2005-01-11 |
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| US20030060128A1 (en) | 2003-03-27 |
| KR20020041415A (ko) | 2002-06-01 |
| ATE380628T1 (de) | 2007-12-15 |
| US6969297B2 (en) | 2005-11-29 |
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