JP4585661B2 - 電子光学系アレイ、荷電粒子線露光装置およびデバイス製造方法 - Google Patents

電子光学系アレイ、荷電粒子線露光装置およびデバイス製造方法 Download PDF

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JP4585661B2
JP4585661B2 JP2000233145A JP2000233145A JP4585661B2 JP 4585661 B2 JP4585661 B2 JP 4585661B2 JP 2000233145 A JP2000233145 A JP 2000233145A JP 2000233145 A JP2000233145 A JP 2000233145A JP 4585661 B2 JP4585661 B2 JP 4585661B2
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electrode
optical system
charged particle
system array
shield
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Expired - Fee Related
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JP2000233145A
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Japanese (ja)
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JP2001345259A (ja
JP2001345259A5 (enExample
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治人 小野
真人 村木
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Canon Inc
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Canon Inc
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Priority to JP2000233145A priority Critical patent/JP4585661B2/ja
Priority to US09/819,737 priority patent/US6965153B1/en
Publication of JP2001345259A publication Critical patent/JP2001345259A/ja
Priority to US10/454,576 priority patent/US7038226B2/en
Priority to US11/168,425 priority patent/US7126141B2/en
Publication of JP2001345259A5 publication Critical patent/JP2001345259A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/18—Assembling together the component parts of electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/1205—Microlenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31774—Multi-beam

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000233145A 2000-03-31 2000-08-01 電子光学系アレイ、荷電粒子線露光装置およびデバイス製造方法 Expired - Fee Related JP4585661B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000233145A JP4585661B2 (ja) 2000-03-31 2000-08-01 電子光学系アレイ、荷電粒子線露光装置およびデバイス製造方法
US09/819,737 US6965153B1 (en) 2000-03-31 2001-03-29 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
US10/454,576 US7038226B2 (en) 2000-03-31 2003-06-05 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
US11/168,425 US7126141B2 (en) 2000-03-31 2005-06-29 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000097069 2000-03-31
JP2000-97069 2000-03-31
JP2000233145A JP4585661B2 (ja) 2000-03-31 2000-08-01 電子光学系アレイ、荷電粒子線露光装置およびデバイス製造方法

Publications (3)

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JP2001345259A JP2001345259A (ja) 2001-12-14
JP2001345259A5 JP2001345259A5 (enExample) 2007-09-13
JP4585661B2 true JP4585661B2 (ja) 2010-11-24

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JP (1) JP4585661B2 (enExample)

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