JP4563733B2 - 走査透過電子顕微鏡及びそれを用いた電子線エネルギー分光方法 - Google Patents

走査透過電子顕微鏡及びそれを用いた電子線エネルギー分光方法 Download PDF

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Publication number
JP4563733B2
JP4563733B2 JP2004187570A JP2004187570A JP4563733B2 JP 4563733 B2 JP4563733 B2 JP 4563733B2 JP 2004187570 A JP2004187570 A JP 2004187570A JP 2004187570 A JP2004187570 A JP 2004187570A JP 4563733 B2 JP4563733 B2 JP 4563733B2
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Japan
Prior art keywords
electron beam
scattered
energy
detector
transmission electron
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JP2004187570A
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English (en)
Japanese (ja)
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JP2006012583A (ja
JP2006012583A5 (enExample
Inventor
邦康 中村
俊一 渡辺
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2004187570A priority Critical patent/JP4563733B2/ja
Priority to US11/157,817 priority patent/US7285776B2/en
Publication of JP2006012583A publication Critical patent/JP2006012583A/ja
Publication of JP2006012583A5 publication Critical patent/JP2006012583A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04922—Lens systems electromagnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/057—Energy or mass filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2802—Transmission microscopes

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2004187570A 2004-06-25 2004-06-25 走査透過電子顕微鏡及びそれを用いた電子線エネルギー分光方法 Expired - Fee Related JP4563733B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004187570A JP4563733B2 (ja) 2004-06-25 2004-06-25 走査透過電子顕微鏡及びそれを用いた電子線エネルギー分光方法
US11/157,817 US7285776B2 (en) 2004-06-25 2005-06-22 Scanning transmission electron microscope and electron energy loss spectroscopy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004187570A JP4563733B2 (ja) 2004-06-25 2004-06-25 走査透過電子顕微鏡及びそれを用いた電子線エネルギー分光方法

Publications (3)

Publication Number Publication Date
JP2006012583A JP2006012583A (ja) 2006-01-12
JP2006012583A5 JP2006012583A5 (enExample) 2007-07-12
JP4563733B2 true JP4563733B2 (ja) 2010-10-13

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004187570A Expired - Fee Related JP4563733B2 (ja) 2004-06-25 2004-06-25 走査透過電子顕微鏡及びそれを用いた電子線エネルギー分光方法

Country Status (2)

Country Link
US (1) US7285776B2 (enExample)
JP (1) JP4563733B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0225791D0 (en) * 2002-11-05 2002-12-11 Kratos Analytical Ltd Charged particle spectrometer and detector therefor
JP4997013B2 (ja) * 2007-07-31 2012-08-08 株式会社日立ハイテクノロジーズ 電子分光器を備えた電子顕微鏡
JP5855836B2 (ja) * 2010-03-01 2016-02-09 カール ツァイス マイクロスコーピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ ＧｍｂＨ 透過電子顕微鏡
JP2013057638A (ja) * 2011-09-09 2013-03-28 Sumitomo Rubber Ind Ltd ゴム材料のシミュレーション方法
JP5934513B2 (ja) * 2012-02-09 2016-06-15 日本電子株式会社 透過電子顕微鏡
CN104246966B (zh) * 2012-04-03 2017-03-01 株式会社日立高新技术 带电粒子线装置
DE102012007868A1 (de) 2012-04-19 2013-10-24 Carl Zeiss Microscopy Gmbh Transmissionselektronenmikroskopiesystem
JP2014041734A (ja) * 2012-08-22 2014-03-06 Hitachi High-Technologies Corp 複合荷電粒子線装置
WO2014181026A1 (en) * 2013-05-06 2014-11-13 Fenno-Aurum Oy Semiconductor radiation detector with lowered background noise level
DE102013019855A1 (de) 2013-11-25 2015-05-28 Carl Zeiss Microscopy Gmbh Elektronenmikroskop
DE112015006826B4 (de) 2015-09-29 2023-12-28 Hitachi High-Tech Corporation Transmissionsrastermikroskopie unter Einbeziehung von Elektronenenergieverlustspektroskopie und Beobachtungsverfahren hierfür
US9613779B2 (en) 2015-11-12 2017-04-04 Ningbo Focus-ebeam Instruments Inc. Scanning transmission electron microscope with variable axis objective lens and detective system
JP2017198588A (ja) * 2016-04-28 2017-11-02 株式会社ニューフレアテクノロジー パターン検査装置
CN111095473B (zh) * 2017-08-04 2022-11-18 加坦公司 用于高速光谱采集的方法
EP3889995A1 (en) * 2020-03-31 2021-10-06 FEI Company Transmission charged particle microscope with an electron energy loss spectroscopy detector

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09167591A (ja) * 1995-12-15 1997-06-24 Hitachi Ltd 走査透過電子顕微鏡
JPH11250850A (ja) 1998-03-02 1999-09-17 Hitachi Ltd 走査電子顕微鏡及び顕微方法並びに対話型入力装置
JP3849353B2 (ja) * 1999-06-21 2006-11-22 株式会社日立製作所 透過型電子顕微鏡
JP2001266783A (ja) 2000-03-22 2001-09-28 Hitachi Ltd 元素マッピング装置、走査透過型電子顕微鏡及び元素マッピング方法
JP4006165B2 (ja) * 2000-04-21 2007-11-14 株式会社日立製作所 元素分析装置及び走査透過型電子顕微鏡並びに元素分析方法
JP2003249186A (ja) * 2002-02-22 2003-09-05 Fujitsu Ltd 走査透過型電子顕微鏡に依る観察方法及び観察装置
JP2003331773A (ja) * 2002-05-13 2003-11-21 Jeol Ltd 電子顕微鏡

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Publication number Publication date
JP2006012583A (ja) 2006-01-12
US7285776B2 (en) 2007-10-23
US20050285037A1 (en) 2005-12-29

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