JP4551251B2 - 真空コーティングプラント用のロックチャンバー装置およびその動作プロセス - Google Patents
真空コーティングプラント用のロックチャンバー装置およびその動作プロセス Download PDFInfo
- Publication number
- JP4551251B2 JP4551251B2 JP2005075753A JP2005075753A JP4551251B2 JP 4551251 B2 JP4551251 B2 JP 4551251B2 JP 2005075753 A JP2005075753 A JP 2005075753A JP 2005075753 A JP2005075753 A JP 2005075753A JP 4551251 B2 JP4551251 B2 JP 4551251B2
- Authority
- JP
- Japan
- Prior art keywords
- lock chamber
- pump
- pump set
- stage
- lock
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims description 40
- 230000008569 process Effects 0.000 title claims description 39
- 239000000872 buffer Substances 0.000 claims abstract description 52
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 238000012545 processing Methods 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 5
- 230000006835 compression Effects 0.000 claims description 4
- 238000007906 compression Methods 0.000 claims description 4
- 230000009467 reduction Effects 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims 1
- 238000005086 pumping Methods 0.000 abstract description 12
- 238000000605 extraction Methods 0.000 abstract 1
- 230000035939 shock Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 27
- 238000012546 transfer Methods 0.000 description 12
- 230000008901 benefit Effects 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 238000013022 venting Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000005328 architectural glass Substances 0.000 description 2
- CMIAIUZBKPLIOP-YZLZLFLDSA-N methyl (1r,4ar,4br,10ar)-7-(2-hydroperoxypropan-2-yl)-4a-methyl-2,3,4,4b,5,6,10,10a-octahydro-1h-phenanthrene-1-carboxylate Chemical compound C1=C(C(C)(C)OO)CC[C@@H]2[C@]3(C)CCC[C@@H](C(=O)OC)[C@H]3CC=C21 CMIAIUZBKPLIOP-YZLZLFLDSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000002463 transducing effect Effects 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Physical Vapour Deposition (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Breeding Of Plants And Reproduction By Means Of Culturing (AREA)
- Control Of Heat Treatment Processes (AREA)
- ing And Chemical Polishing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04007820.6A EP1582607B2 (de) | 2004-03-31 | 2004-03-31 | Schleusenanordnung für eine Vakuumbehandlungsanlage und Verfahren zum Betreiben von dieser |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005290558A JP2005290558A (ja) | 2005-10-20 |
JP4551251B2 true JP4551251B2 (ja) | 2010-09-22 |
Family
ID=34878226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005075753A Expired - Fee Related JP4551251B2 (ja) | 2004-03-31 | 2005-03-16 | 真空コーティングプラント用のロックチャンバー装置およびその動作プロセス |
Country Status (10)
Country | Link |
---|---|
US (1) | US20050217993A1 (ko) |
EP (1) | EP1582607B2 (ko) |
JP (1) | JP4551251B2 (ko) |
KR (1) | KR20060044866A (ko) |
CN (1) | CN100529173C (ko) |
AT (1) | ATE412789T1 (ko) |
DE (1) | DE502004008341D1 (ko) |
ES (1) | ES2316892T3 (ko) |
PL (1) | PL1582607T3 (ko) |
TW (1) | TWI284699B (ko) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112008001620B4 (de) * | 2007-07-03 | 2021-08-26 | VON ARDENNE Asset GmbH & Co. KG | Verfahren und Vorrichtung zum Schleusen überlanger Substrate in einer Vakuumbeschichtungsanlage, Vakuumbeschichtungsanlage und Verfahren zu deren Betrieb |
CN101428973B (zh) * | 2008-11-19 | 2013-01-30 | 苏州新爱可镀膜设备有限公司 | 镀膜玻璃用真空磁控镀膜室 |
CN101428972B (zh) * | 2008-11-19 | 2013-01-30 | 苏州新爱可镀膜设备有限公司 | 镀膜玻璃用磁控镀膜真空腔室 |
AR076167A1 (es) * | 2009-03-30 | 2011-05-26 | Sumitomo Metal Ind | Aparato y metodo para la aplicacion de un lubricante a una porcion roscada de una tuberia de acero |
DE102011114852A1 (de) | 2010-10-06 | 2012-05-03 | Von Ardenne Anlagentechnik Gmbh | Einschleusvorrichtung für eine Vakuumanlage |
GB2497957B (en) * | 2011-12-23 | 2018-06-27 | Edwards Ltd | Vacuum pumping |
JP5099573B1 (ja) * | 2012-01-23 | 2012-12-19 | 有限会社スコットプランニング | 複数の真空装置の省エネルギ−化を図る真空ポンプシステム |
DE202012012359U1 (de) * | 2012-12-22 | 2014-03-24 | Oerlikon Leybold Vacuum Gmbh | Pumpstand zum Pumpen leichter Gase |
DE102013205709B4 (de) * | 2013-03-28 | 2017-03-09 | Von Ardenne Gmbh | Schleusenverfahren und Vakuumsubstratbehandlungsanlage |
US20150206741A1 (en) | 2014-01-17 | 2015-07-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for in situ steam generation |
CN104556723B (zh) * | 2014-12-23 | 2017-10-27 | 深圳达实智能股份有限公司 | 玻璃镀膜出口分锅控制方法及系统 |
DE102015116965B4 (de) * | 2015-10-06 | 2024-05-08 | VON ARDENNE Asset GmbH & Co. KG | Kammeranordnung und Verfahren |
DE102016107830B4 (de) * | 2016-04-27 | 2022-02-03 | VON ARDENNE Asset GmbH & Co. KG | Vakuumkammeranordnung und Verfahren zum Betreiben einer Vakuumkammeranordnung |
RU2651838C2 (ru) * | 2016-09-08 | 2018-04-24 | Акционерное общество "КВАРЦ" | Заслонка |
DE102018004086A1 (de) * | 2018-05-18 | 2019-11-21 | Singulus Technologies Ag | Durchlaufanlage und Verfahren zum Beschichten von Substraten |
DE102018112853A1 (de) * | 2018-05-29 | 2019-12-05 | Meyer Burger (Germany) Gmbh | Belüftungsvorrichtung und Vakuumproduktionsanlage |
EP3590551A1 (en) * | 2018-07-04 | 2020-01-08 | Koninklijke Philips N.V. | A pump arrangement, configured to be used with a breast pump device |
JP6808690B2 (ja) * | 2018-07-25 | 2021-01-06 | 株式会社Screenホールディングス | 減圧乾燥装置、基板処理装置および減圧乾燥方法 |
CN113169094A (zh) | 2018-09-28 | 2021-07-23 | 朗姆研究公司 | 避免沉积副产物积聚的真空泵保护 |
CN110964599B (zh) * | 2019-10-22 | 2022-10-28 | 江西开源香料有限公司 | 橡苔提纯装置及其使用方法和应用 |
CN110645809B (zh) * | 2019-10-23 | 2024-04-19 | 国家能源集团科学技术研究院有限公司 | 一种直接空冷机组超低背压运行的抽真空系统 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2652188A (en) * | 1948-07-08 | 1953-09-15 | Cyr Rob Roy | Automatic tank pump down |
US2823518A (en) * | 1953-11-19 | 1958-02-18 | Thompson Prod Inc | Aircraft fuel pumping system |
US4504194A (en) * | 1982-05-24 | 1985-03-12 | Varian Associates, Inc. | Air lock vacuum pumping methods and apparatus |
JPS60187485A (ja) * | 1984-03-06 | 1985-09-24 | Raifu Technol Kenkyusho | 接合装置 |
AU572375B2 (en) * | 1985-01-31 | 1988-05-05 | Boc Group, Inc., The | Transporting of workpiece to and from vacuum coating apparatus |
US4850806A (en) * | 1988-05-24 | 1989-07-25 | The Boc Group, Inc. | Controlled by-pass for a booster pump |
JPH03183767A (ja) * | 1989-12-11 | 1991-08-09 | Canon Inc | 薄膜形成装置及びこれを用いた薄膜形成方法 |
JPH04262865A (ja) * | 1991-01-22 | 1992-09-18 | Kenji Kondo | はんだ付け装置 |
JPH0598434A (ja) * | 1991-10-04 | 1993-04-20 | Matsushita Electron Corp | マルチチヤンバー型スパツタリング装置 |
DE4207525C2 (de) * | 1992-03-10 | 1999-12-16 | Leybold Ag | Hochvakuum-Beschichtungsanlage |
DE4213763B4 (de) * | 1992-04-27 | 2004-11-25 | Unaxis Deutschland Holding Gmbh | Verfahren zum Evakuieren einer Vakuumkammer und einer Hochvakuumkammer sowie Hochvakuumanlage zu seiner Durchführung |
DE4432730A1 (de) * | 1994-09-14 | 1996-03-21 | Emitec Emissionstechnologie | Verfahren zur Herstellung einer metallischen Struktur |
JP3390579B2 (ja) * | 1995-07-03 | 2003-03-24 | アネルバ株式会社 | 液晶ディスプレイ用薄膜の作成方法及び作成装置 |
KR0183912B1 (ko) * | 1996-08-08 | 1999-05-01 | 김광호 | 다중 반응 챔버에 연결된 펌핑 설비 및 이를 사용하는 방법 |
JP3763193B2 (ja) * | 1997-09-22 | 2006-04-05 | アイシン精機株式会社 | 多段式真空ポンプ |
DE19808163C1 (de) * | 1998-02-27 | 1999-07-15 | Ardenne Anlagentech Gmbh | Schleusensystem für die Überführungskammer einer Vakuumbeschichtungsanlage |
DE10048210B4 (de) * | 2000-09-28 | 2007-02-15 | Singulus Technologies Ag | Vorrichtung und Verfahren zum Einschleusen eines Werkstücks über eine Vorvakuumkammer in eine Hochvakuumkammer und deren Verwendung |
-
2004
- 2004-03-31 EP EP04007820.6A patent/EP1582607B2/de not_active Expired - Lifetime
- 2004-03-31 DE DE502004008341T patent/DE502004008341D1/de not_active Expired - Lifetime
- 2004-03-31 ES ES04007820T patent/ES2316892T3/es not_active Expired - Lifetime
- 2004-03-31 AT AT04007820T patent/ATE412789T1/de not_active IP Right Cessation
- 2004-03-31 PL PL04007820T patent/PL1582607T3/pl unknown
-
2005
- 2005-03-15 TW TW094107833A patent/TWI284699B/zh not_active IP Right Cessation
- 2005-03-16 JP JP2005075753A patent/JP4551251B2/ja not_active Expired - Fee Related
- 2005-03-28 KR KR1020050025623A patent/KR20060044866A/ko active Search and Examination
- 2005-03-29 CN CNB2005100595338A patent/CN100529173C/zh active Active
- 2005-03-30 US US11/093,799 patent/US20050217993A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
TW200537027A (en) | 2005-11-16 |
EP1582607B2 (de) | 2016-07-06 |
KR20060044866A (ko) | 2006-05-16 |
DE502004008341D1 (de) | 2008-12-11 |
ATE412789T1 (de) | 2008-11-15 |
EP1582607A1 (de) | 2005-10-05 |
CN100529173C (zh) | 2009-08-19 |
JP2005290558A (ja) | 2005-10-20 |
TWI284699B (en) | 2007-08-01 |
CN1676485A (zh) | 2005-10-05 |
PL1582607T3 (pl) | 2009-04-30 |
US20050217993A1 (en) | 2005-10-06 |
EP1582607B1 (de) | 2008-10-29 |
ES2316892T3 (es) | 2009-04-16 |
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