JP4532545B2 - 光学素子のための位置決めユニット及び調節デバイス - Google Patents

光学素子のための位置決めユニット及び調節デバイス Download PDF

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Publication number
JP4532545B2
JP4532545B2 JP2007518496A JP2007518496A JP4532545B2 JP 4532545 B2 JP4532545 B2 JP 4532545B2 JP 2007518496 A JP2007518496 A JP 2007518496A JP 2007518496 A JP2007518496 A JP 2007518496A JP 4532545 B2 JP4532545 B2 JP 4532545B2
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axis
adjusting
leaf spring
respect
joints
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JP2008504579A5 (enExample
JP2008504579A (ja
Inventor
ウルリッヒ ヴェーバー
イェンス クグラー
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カール・ツァイス・エスエムティー・アーゲー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/004—Manual alignment, e.g. micromanipulators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007518496A 2004-06-29 2005-06-18 光学素子のための位置決めユニット及び調節デバイス Expired - Fee Related JP4532545B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58409504P 2004-06-29 2004-06-29
PCT/EP2005/006583 WO2006000352A1 (de) 2004-06-29 2005-06-18 Positioniereinheit und vorrichtung zur justage für ein optisches element

Related Child Applications (1)

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JP2010076382A Division JP4851608B2 (ja) 2004-06-29 2010-03-29 光学素子の位置決めユニット

Publications (3)

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JP2008504579A JP2008504579A (ja) 2008-02-14
JP2008504579A5 JP2008504579A5 (enExample) 2008-09-11
JP4532545B2 true JP4532545B2 (ja) 2010-08-25

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JP2007518496A Expired - Fee Related JP4532545B2 (ja) 2004-06-29 2005-06-18 光学素子のための位置決めユニット及び調節デバイス
JP2010076382A Expired - Fee Related JP4851608B2 (ja) 2004-06-29 2010-03-29 光学素子の位置決めユニット

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US (8) US7738193B2 (enExample)
JP (2) JP4532545B2 (enExample)
WO (1) WO2006000352A1 (enExample)

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JP5043468B2 (ja) 2007-02-23 2012-10-10 キヤノン株式会社 保持装置
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Also Published As

Publication number Publication date
US8035903B2 (en) 2011-10-11
US10133021B2 (en) 2018-11-20
JP2008504579A (ja) 2008-02-14
US8493674B2 (en) 2013-07-23
US9664873B2 (en) 2017-05-30
US8760777B2 (en) 2014-06-24
US7738193B2 (en) 2010-06-15
US9075174B2 (en) 2015-07-07
US20130135760A1 (en) 2013-05-30
US20100245847A1 (en) 2010-09-30
US20170351047A1 (en) 2017-12-07
US20160041360A1 (en) 2016-02-11
US8416515B2 (en) 2013-04-09
US20130286490A1 (en) 2013-10-31
US20120019798A1 (en) 2012-01-26
US20140368933A1 (en) 2014-12-18
WO2006000352A1 (de) 2006-01-05
US20070206297A1 (en) 2007-09-06
JP2010183097A (ja) 2010-08-19
JP4851608B2 (ja) 2012-01-11

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