JP4522024B2 - 水銀ランプ、照明装置及び露光装置 - Google Patents

水銀ランプ、照明装置及び露光装置 Download PDF

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Publication number
JP4522024B2
JP4522024B2 JP2001227187A JP2001227187A JP4522024B2 JP 4522024 B2 JP4522024 B2 JP 4522024B2 JP 2001227187 A JP2001227187 A JP 2001227187A JP 2001227187 A JP2001227187 A JP 2001227187A JP 4522024 B2 JP4522024 B2 JP 4522024B2
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JP
Japan
Prior art keywords
wafer
lamp
mercury lamp
reticle
hand
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001227187A
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English (en)
Japanese (ja)
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JP2003045219A (ja
JP2003045219A5 (enExample
Inventor
蔵 安延
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001227187A priority Critical patent/JP4522024B2/ja
Publication of JP2003045219A publication Critical patent/JP2003045219A/ja
Publication of JP2003045219A5 publication Critical patent/JP2003045219A5/ja
Application granted granted Critical
Publication of JP4522024B2 publication Critical patent/JP4522024B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
JP2001227187A 2001-07-27 2001-07-27 水銀ランプ、照明装置及び露光装置 Expired - Fee Related JP4522024B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001227187A JP4522024B2 (ja) 2001-07-27 2001-07-27 水銀ランプ、照明装置及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001227187A JP4522024B2 (ja) 2001-07-27 2001-07-27 水銀ランプ、照明装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2003045219A JP2003045219A (ja) 2003-02-14
JP2003045219A5 JP2003045219A5 (enExample) 2008-09-04
JP4522024B2 true JP4522024B2 (ja) 2010-08-11

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ID=19059889

Family Applications (1)

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JP2001227187A Expired - Fee Related JP4522024B2 (ja) 2001-07-27 2001-07-27 水銀ランプ、照明装置及び露光装置

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JP (1) JP4522024B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170018113A (ko) 2003-04-09 2017-02-15 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
TWI505329B (zh) 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
EP2660854B1 (en) 2005-05-12 2017-06-21 Nikon Corporation Projection optical system, exposure apparatus and exposure method
JP4497146B2 (ja) * 2006-02-13 2010-07-07 ウシオ電機株式会社 放電ランプ保持機構
JP4501915B2 (ja) * 2006-03-20 2010-07-14 ウシオ電機株式会社 放電ランプ保持機構
KR20160009104A (ko) * 2006-09-01 2016-01-25 가부시키가이샤 니콘 방전램프, 광원장치, 노광장치 및 노광장치의 제조방법
JP4807337B2 (ja) * 2007-08-07 2011-11-02 ウシオ電機株式会社 放電ランプ保持機構
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP6029387B2 (ja) 2012-08-30 2016-11-24 株式会社オーク製作所 放電ランプ着脱機構
CN113687574A (zh) * 2020-05-18 2021-11-23 长鑫存储技术有限公司 光刻设备及其光源位置监控方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181804U (ja) * 1984-05-14 1985-12-03 スタンレー電気株式会社 ハウジングとソケツトホルダ−との取付構造
JPH03669Y2 (enExample) * 1985-03-01 1991-01-11
JPH054684Y2 (enExample) * 1986-02-19 1993-02-05
JPH0638358Y2 (ja) * 1989-06-05 1994-10-05 ウシオ電機株式会社 放電灯
JP3377347B2 (ja) * 1995-10-05 2003-02-17 大日本スクリーン製造株式会社 基板の周辺部露光装置
JP2000031050A (ja) * 1999-06-22 2000-01-28 Nikon Corp 露光装置、リソグラフィシステム、及び半導体デバイス製造方法

Also Published As

Publication number Publication date
JP2003045219A (ja) 2003-02-14

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