JP4508354B2 - 走査露光装置および走査露光方法 - Google Patents

走査露光装置および走査露光方法 Download PDF

Info

Publication number
JP4508354B2
JP4508354B2 JP2000128714A JP2000128714A JP4508354B2 JP 4508354 B2 JP4508354 B2 JP 4508354B2 JP 2000128714 A JP2000128714 A JP 2000128714A JP 2000128714 A JP2000128714 A JP 2000128714A JP 4508354 B2 JP4508354 B2 JP 4508354B2
Authority
JP
Japan
Prior art keywords
substrate
original
region
mark
crystal panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000128714A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001312069A5 (enrdf_load_stackoverflow
JP2001312069A (ja
Inventor
浩之 高橋
誠 杉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000128714A priority Critical patent/JP4508354B2/ja
Publication of JP2001312069A publication Critical patent/JP2001312069A/ja
Publication of JP2001312069A5 publication Critical patent/JP2001312069A5/ja
Application granted granted Critical
Publication of JP4508354B2 publication Critical patent/JP4508354B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000128714A 2000-04-28 2000-04-28 走査露光装置および走査露光方法 Expired - Fee Related JP4508354B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000128714A JP4508354B2 (ja) 2000-04-28 2000-04-28 走査露光装置および走査露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000128714A JP4508354B2 (ja) 2000-04-28 2000-04-28 走査露光装置および走査露光方法

Publications (3)

Publication Number Publication Date
JP2001312069A JP2001312069A (ja) 2001-11-09
JP2001312069A5 JP2001312069A5 (enrdf_load_stackoverflow) 2007-06-21
JP4508354B2 true JP4508354B2 (ja) 2010-07-21

Family

ID=18638114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000128714A Expired - Fee Related JP4508354B2 (ja) 2000-04-28 2000-04-28 走査露光装置および走査露光方法

Country Status (1)

Country Link
JP (1) JP4508354B2 (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100997968B1 (ko) 2003-10-13 2010-12-02 삼성전자주식회사 박막 트랜지스터 표시판의 제조 방법
JP4401834B2 (ja) 2004-03-23 2010-01-20 株式会社アドテックエンジニアリング 露光装置及び位置合わせ方法
JP5133239B2 (ja) * 2006-04-05 2013-01-30 シャープ株式会社 露光方法および露光装置
WO2012073810A1 (ja) * 2010-12-03 2012-06-07 シャープ株式会社 表示パネル用基板及び基板露光方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5919318A (ja) * 1982-07-23 1984-01-31 Hitachi Ltd 転写パタ−ンの位置ずれ検査方法および転写パタ−ンマスク
JPS61201427A (ja) * 1985-03-04 1986-09-06 Nippon Kogaku Kk <Nikon> 位置ずれ検出方法
JPS61226924A (ja) * 1985-04-01 1986-10-08 Canon Inc 露光装置
JPS61242021A (ja) * 1985-04-19 1986-10-28 Canon Inc 露光装置
JPH03180017A (ja) * 1989-12-08 1991-08-06 Fujitsu Ltd 半導体装置の製造方法
JP2741114B2 (ja) * 1991-05-08 1998-04-15 日立電子エンジニアリング株式会社 カラー用液晶基板の位置合わせ方法
JPH05265027A (ja) * 1992-03-24 1993-10-15 Toshiba Corp 位置決め方法及びその装置
JP3198310B2 (ja) * 1993-01-06 2001-08-13 株式会社ニコン 露光方法及び装置
JP3259409B2 (ja) * 1993-02-16 2002-02-25 株式会社ニコン 露光装置
JPH07297106A (ja) * 1994-04-25 1995-11-10 Dainippon Screen Mfg Co Ltd 拡大投影型露光装置における投影像のアライメント方法
JP3379238B2 (ja) * 1994-09-08 2003-02-24 株式会社ニコン 走査型露光装置
JPH08293453A (ja) * 1995-04-25 1996-11-05 Canon Inc 走査型露光装置及び該装置を用いた露光方法
JPH09115820A (ja) * 1995-10-13 1997-05-02 Nikon Corp 走査型露光装置及び露光方法
AU2549899A (en) * 1998-03-02 1999-09-20 Nikon Corporation Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
JP2001296667A (ja) * 2000-04-14 2001-10-26 Nikon Corp 走査露光方法および走査型露光装置並びにマスク

Also Published As

Publication number Publication date
JP2001312069A (ja) 2001-11-09

Similar Documents

Publication Publication Date Title
USRE37361E1 (en) Scanning type exposure apparatus and exposure method
US5573877A (en) Exposure method and exposure apparatus
US5602620A (en) Scanning exposure apparatus and exposure method
JP4168665B2 (ja) 露光方法及び露光装置、デバイス製造方法
JP4214849B2 (ja) 露光方法及び露光装置
JP2550974B2 (ja) 露光装置
JP5489534B2 (ja) 露光装置及びデバイス製造方法
JP4508354B2 (ja) 走査露光装置および走査露光方法
US5523574A (en) Exposure apparatus
JP4144059B2 (ja) 走査型露光装置
KR100575230B1 (ko) 노광 장치를 이용한 노광 방법
JP2010192744A (ja) 露光装置、露光方法、及びデバイス製造方法
JP2005116779A (ja) 露光装置およびデバイス製造方法
JP3285105B2 (ja) ステージ駆動方法、及び走査露光方法
JP2000012422A (ja) 露光装置
JP2003031461A (ja) 露光装置及び露光方法
JP2005017204A (ja) 位置決め装置
KR20070049061A (ko) 기판 측정 장치
JPH09251952A (ja) 露光装置及び露光方法
JP4319800B2 (ja) 大型のフォトマスク用レーザ露光装置およびレーザ描画方法
JPH09129547A (ja) 走査型露光装置、デバイス製造方法およびデバイス
JP3460325B2 (ja) 露光装置及び露光方法
JP3472078B2 (ja) 露光方法及び露光装置
USRE37762E1 (en) Scanning exposure apparatus and exposure method
JP2009192864A (ja) 露光方法、露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070426

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070509

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20090527

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100126

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100326

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100420

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100427

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130514

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140514

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees