JP4404049B2 - 感光性樹脂組成物及びその塗膜硬化物 - Google Patents

感光性樹脂組成物及びその塗膜硬化物 Download PDF

Info

Publication number
JP4404049B2
JP4404049B2 JP2005503097A JP2005503097A JP4404049B2 JP 4404049 B2 JP4404049 B2 JP 4404049B2 JP 2005503097 A JP2005503097 A JP 2005503097A JP 2005503097 A JP2005503097 A JP 2005503097A JP 4404049 B2 JP4404049 B2 JP 4404049B2
Authority
JP
Japan
Prior art keywords
group
resin
photosensitive resin
resin composition
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005503097A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2004079454A1 (ja
Inventor
秀幸 高橋
健二 石関
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPWO2004079454A1 publication Critical patent/JPWO2004079454A1/ja
Application granted granted Critical
Publication of JP4404049B2 publication Critical patent/JP4404049B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2005503097A 2003-03-07 2004-03-04 感光性樹脂組成物及びその塗膜硬化物 Expired - Fee Related JP4404049B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2003061813 2003-03-07
JP2003061813 2003-03-07
JP2003385222 2003-11-14
JP2003385222 2003-11-14
PCT/JP2004/002732 WO2004079454A1 (ja) 2003-03-07 2004-03-04 感光性樹脂組成物及びその塗膜硬化物

Publications (2)

Publication Number Publication Date
JPWO2004079454A1 JPWO2004079454A1 (ja) 2006-06-08
JP4404049B2 true JP4404049B2 (ja) 2010-01-27

Family

ID=32964916

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005503097A Expired - Fee Related JP4404049B2 (ja) 2003-03-07 2004-03-04 感光性樹脂組成物及びその塗膜硬化物

Country Status (5)

Country Link
US (1) US7232648B2 (enExample)
JP (1) JP4404049B2 (enExample)
KR (1) KR101011656B1 (enExample)
TW (1) TW200428167A (enExample)
WO (1) WO2004079454A1 (enExample)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7569166B2 (en) * 2003-06-26 2009-08-04 Sekisui Chemical Co., Ltd. Binder resin for coating paste
JP2006133378A (ja) * 2004-11-04 2006-05-25 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
JP4611724B2 (ja) * 2004-12-03 2011-01-12 東京応化工業株式会社 遮光膜形成用感光性組成物、該遮光膜形成用感光性組成物で形成されたブラックマトリクス
US8052828B2 (en) 2005-01-21 2011-11-08 Tokyo Okha Kogyo Co., Ltd. Photosensitive laminate film for forming top plate portion of precision fine space and method of forming precision fine space
TW200735700A (en) * 2005-11-28 2007-09-16 Asahi Glass Co Ltd Process for producing organic el, color filter and diaphragm
JP5008300B2 (ja) * 2005-12-01 2012-08-22 富士フイルム株式会社 離画壁及びその製造方法、カラーフィルタ及びその製造方法並びに液晶表示装置
EP1961775A4 (en) * 2005-12-15 2010-09-01 Asahi Glass Co Ltd FLUOROUS POLYMER, NEGATIVE LIGHT-SENSITIVE COMPOSITION AND INTERMEDIATE WALL
JP4692314B2 (ja) * 2006-02-14 2011-06-01 住友電気工業株式会社 半導体デバイスの製造方法
WO2007102487A1 (ja) * 2006-03-06 2007-09-13 Asahi Glass Company, Limited 親水性領域と撥水性領域を有する処理基材およびその製造方法
WO2008021500A2 (en) 2006-08-17 2008-02-21 University Of Pittsburgh-Of The Commonwealth System Of Higher Education Modification of surfaces with polymers
KR100894274B1 (ko) * 2006-12-13 2009-04-21 제일모직주식회사 저유전성 감광성 수지 조성물 및 이를 이용한 유기절연막
JP5669396B2 (ja) * 2006-12-13 2015-02-12 ノバルティス アーゲー 化学線硬化性シリコーンヒドロゲルコポリマーおよびその使用
WO2008072766A1 (ja) * 2006-12-15 2008-06-19 Chisso Corporation フッ素系重合体および樹脂組成物
JPWO2008078707A1 (ja) * 2006-12-26 2010-04-22 旭化成イーマテリアルズ株式会社 光重合性樹脂積層体及びブラックマトリックスパターン付き基板の製造方法
JP5083568B2 (ja) * 2007-01-22 2012-11-28 日産化学工業株式会社 ポジ型感光性樹脂組成物
JP4798021B2 (ja) * 2007-02-27 2011-10-19 Ｊｎｃ株式会社 ポリシロキサンを用いた感光性組成物、それからなる樹脂膜、及びその樹脂膜を有する表示素子
KR101506535B1 (ko) * 2007-02-28 2015-03-27 제이엔씨 주식회사 포지티브형 감광성 수지 조성물
WO2008105503A1 (ja) * 2007-03-01 2008-09-04 Asahi Glass Company, Limited 撥水性領域のパターンを有する処理基材、その製造方法、および機能性材料の膜からなるパターンが形成された部材の製造方法
KR101412857B1 (ko) 2007-04-25 2014-06-26 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 블랙 매트릭스, 컬러 필터의 제조 방법
JP2008298859A (ja) * 2007-05-29 2008-12-11 Asahi Glass Co Ltd 感光性組成物、それを用いた隔壁、隔壁の製造方法、カラーフィルタの製造方法、有機ｅｌ表示素子の製造方法および有機ｔｆｔアレイの製造方法
KR101420470B1 (ko) 2007-05-29 2014-07-16 아사히 가라스 가부시키가이샤 감광성 조성물, 격벽, 블랙 매트릭스
EP2149803A1 (en) * 2007-05-30 2010-02-03 Asahi Glass Company, Limited Method for producing substrate with partition wall and pixel formed thereon
JP2009053415A (ja) * 2007-08-27 2009-03-12 Nippon Steel Chem Co Ltd インクジェット印刷法によるカラーフィルターの製造方法及びカラーフィルター
US20090073356A1 (en) * 2007-09-19 2009-03-19 Seiko Epson Corporation Color filter ink, color filter, image display device, and electronic device
US20090073355A1 (en) * 2007-09-19 2009-03-19 Seiko Epson Corporation Color filter ink, color filter, image display device, and electronic device
JP2009127027A (ja) * 2007-11-28 2009-06-11 Seiko Epson Corp カラーフィルター用インク、カラーフィルター用インクセット、カラーフィルター、画像表示装置、および、電子機器
JP4466725B2 (ja) * 2007-11-28 2010-05-26 セイコーエプソン株式会社 カラーフィルター用インク、カラーフィルター用インクセット、カラーフィルター、画像表示装置、および、電子機器
JP2009128862A (ja) * 2007-11-28 2009-06-11 Seiko Epson Corp カラーフィルター用インク、カラーフィルター用インクセット、カラーフィルター、画像表示装置、および、電子機器
US9464172B2 (en) 2007-12-10 2016-10-11 Kaneka Corporation Alkali-developable curable composition, insulating thin film using the same, and thin film transistor
JP2009145643A (ja) * 2007-12-14 2009-07-02 Seiko Epson Corp カラーフィルター用インク、カラーフィルター用インクセット、カラーフィルター、画像表示装置、および、電子機器
JP2009145722A (ja) * 2007-12-17 2009-07-02 Seiko Epson Corp カラーフィルター用インク、カラーフィルター、画像表示装置、および、電子機器
JP2009144087A (ja) * 2007-12-17 2009-07-02 Seiko Epson Corp カラーフィルター用インク、カラーフィルター用インクセット、カラーフィルター、画像表示装置、および、電子機器
JP5212063B2 (ja) * 2007-12-27 2013-06-19 住友化学株式会社 感光性樹脂組成物
JP2009169214A (ja) * 2008-01-18 2009-07-30 Seiko Epson Corp カラーフィルター用インクセット、カラーフィルター、画像表示装置、および、電子機器
JP5152332B2 (ja) * 2008-07-03 2013-02-27 旭硝子株式会社 感光性組成物、隔壁、カラーフィルタ及び有機ｅｌ素子
WO2010013816A1 (ja) 2008-08-01 2010-02-04 旭硝子株式会社 ネガ型感光性組成物、それを用いた光学素子用隔壁および該隔壁を有する光学素子
JP5121644B2 (ja) * 2008-09-24 2013-01-16 富士フイルム株式会社 感光性樹脂組成物、カラーフィルタ及びその製造方法、並びに、固体撮像素子
JP5617275B2 (ja) * 2009-02-26 2014-11-05 日本ゼオン株式会社 感放射線性樹脂組成物、樹脂膜、積層体及び電子部品
KR101225126B1 (ko) * 2009-03-19 2013-01-22 주식회사 엘지화학 머켑토 화합물을 포함하는 감광성 실리콘 수지 조성물 및 이를 이용한 반도체 소자 및 디스플레이 소자
JP5682573B2 (ja) * 2009-12-28 2015-03-11 旭硝子株式会社 感光性組成物、隔壁、カラーフィルタおよび有機ｅｌ素子
TW201144335A (en) * 2010-06-01 2011-12-16 Everlight Chem Ind Corp Photosensitive resin composition
CN103109234A (zh) * 2010-09-16 2013-05-15 株式会社Lg化学 光敏树脂组合物、干膜阻焊膜以及电路板
CN103238111B (zh) * 2010-12-10 2016-12-07 旭硝子株式会社 负型感光性树脂组合物、光学元件用间隔壁及其制造方法、具有该间隔壁的光学元件的制造方法以及拒油墨剂溶液
TWI486259B (zh) 2010-12-27 2015-06-01 Au Optronics Corp 可撓式基板結構及其製作方法
JP5981167B2 (ja) * 2011-03-24 2016-08-31 東京応化工業株式会社 感光性樹脂組成物
CN102199263B (zh) * 2011-04-12 2013-04-10 中科院广州化学有限公司 一种双疏性含氟可交联嵌段共聚物及其制备方法与应用
KR20160138058A (ko) * 2014-03-31 2016-12-02 스미또모 가가꾸 가부시키가이샤 격벽을 갖는 기판
TWI561325B (en) * 2014-08-01 2016-12-11 Au Optronics Corp Display module manufacturing method and display module
WO2016129324A1 (ja) * 2015-02-09 2016-08-18 富士フイルム株式会社 硬化性組成物、遮光膜付き赤外光カットフィルタ、及び、固体撮像装置
WO2017078272A1 (en) * 2015-11-06 2017-05-11 Rohm And Haas Electronic Materials Korea Ltd. Photosensitive resin composition and cured film prepared therefrom
JP7108390B2 (ja) * 2017-09-30 2022-07-28 株式会社ネオス 硬化性樹脂組成物
JP7532855B2 (ja) * 2020-03-31 2024-08-14 三菱ケミカル株式会社 活性エネルギー線硬化性組成物、その硬化物、及び積層体

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04194941A (ja) * 1990-11-27 1992-07-14 Sanyo Chem Ind Ltd 着色画像形成用材料および着色画像の形成法
JP3470352B2 (ja) * 1993-07-23 2003-11-25 東レ株式会社 カラーフィルタ
JP2996150B2 (ja) * 1995-09-11 1999-12-27 大日本インキ化学工業株式会社 被覆剤
JP3771711B2 (ja) 1998-03-31 2006-04-26 互応化学工業株式会社 フォトソルダーレジストインクの製造方法
JP3644243B2 (ja) 1998-03-31 2005-04-27 Ｊｓｒ株式会社 感放射線性樹脂組成物、カラーフィルタおよび液晶表示素子
JP2000298339A (ja) * 1999-04-14 2000-10-24 Dainippon Printing Co Ltd 感光性樹脂組成物
JP4068786B2 (ja) 2000-04-06 2008-03-26 関東電化工業株式会社 硬化塗膜の形成方法
AU2003280695A1 (en) * 2002-11-06 2004-06-07 Asahi Glass Company, Limited Negative type photosensitive resin composition

Also Published As

Publication number Publication date
TW200428167A (en) 2004-12-16
TWI334966B (enExample) 2010-12-21
KR101011656B1 (ko) 2011-01-28
KR20050112097A (ko) 2005-11-29
US20060003256A1 (en) 2006-01-05
US7232648B2 (en) 2007-06-19
JPWO2004079454A1 (ja) 2006-06-08
WO2004079454A1 (ja) 2004-09-16

Similar Documents

Publication Publication Date Title
JP4404049B2 (ja) 感光性樹脂組成物及びその塗膜硬化物
JP4609587B2 (ja) 隔壁形成用ネガ型感光性樹脂組成物
JP5126222B2 (ja) 感光性組成物、隔壁、ブラックマトリックス、カラーフィルタの製造方法
JP4474991B2 (ja) レジスト組成物及びその塗膜
JP5266760B2 (ja) 含フッ素重合体、ネガ型感光性組成物及び隔壁
JP5045747B2 (ja) 感光性組成物、隔壁、ブラックマトリックス
JP6115471B2 (ja) ネガ型感光性樹脂組成物、隔壁、ブラックマトリックス及び光学素子
JP5682573B2 (ja) 感光性組成物、隔壁、カラーフィルタおよび有機ｅｌ素子
JP2013050549A (ja) ネガ型感光性樹脂組成物、隔壁、光学素子
JP2008298859A (ja) 感光性組成物、それを用いた隔壁、隔壁の製造方法、カラーフィルタの製造方法、有機ｅｌ表示素子の製造方法および有機ｔｆｔアレイの製造方法
JP4513399B2 (ja) 感光性樹脂組成物及びその塗膜硬化物
JPWO2008149776A1 (ja) 隔壁と画素が形成された基板を製造する方法
JP4543886B2 (ja) 画像表示素子の隔壁の形成方法
JP5682572B2 (ja) 感光性組成物、隔壁および有機ｅｌ素子
JP4466183B2 (ja) 感光性樹脂組成物及びその塗膜硬化物
JP4905563B2 (ja) レジスト組成物及びその塗膜
CN100524021C (zh) 感光性树脂组合物及其涂膜固化物
JP4415737B2 (ja) 感光性樹脂組成物及びその塗膜硬化物
JP4466184B2 (ja) 感光性樹脂組成物及びその塗膜硬化物

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061227

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20071031

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20091013

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20091026

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121113

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 4404049

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121113

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121113

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121113

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131113

Year of fee payment: 4

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees