JP4323414B2 - 制電性組成物の製造方法 - Google Patents
制電性組成物の製造方法 Download PDFInfo
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- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 6
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- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910003473 lithium bis(trifluoromethanesulfonyl)imide Inorganic materials 0.000 description 2
- MHCFAGZWMAWTNR-UHFFFAOYSA-M lithium perchlorate Chemical compound [Li+].[O-]Cl(=O)(=O)=O MHCFAGZWMAWTNR-UHFFFAOYSA-M 0.000 description 2
- 229910001486 lithium perchlorate Inorganic materials 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
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- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
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- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
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- UQWLFOMXECTXNQ-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F UQWLFOMXECTXNQ-UHFFFAOYSA-N 0.000 description 1
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- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
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- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
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- RJPWSGDBEHVWPP-UHFFFAOYSA-N potassium bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound [K+].FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F RJPWSGDBEHVWPP-UHFFFAOYSA-N 0.000 description 1
- GLGXXYFYZWQGEL-UHFFFAOYSA-M potassium;trifluoromethanesulfonate Chemical compound [K+].[O-]S(=O)(=O)C(F)(F)F GLGXXYFYZWQGEL-UHFFFAOYSA-M 0.000 description 1
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- YLKTWKVVQDCJFL-UHFFFAOYSA-N sodium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Na+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F YLKTWKVVQDCJFL-UHFFFAOYSA-N 0.000 description 1
- CTHCGQAFGGHQTI-UHFFFAOYSA-N sodium;bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound [Na+].FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F CTHCGQAFGGHQTI-UHFFFAOYSA-N 0.000 description 1
- XGPOMXSYOKFBHS-UHFFFAOYSA-M sodium;trifluoromethanesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C(F)(F)F XGPOMXSYOKFBHS-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
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- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
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Description
Claims (8)
- 樹脂および/またはエラストマ-を含む組成物中に、フルオロ基およびスルホニル基を有する陰イオンを備えた塩が分散されてなる制電性組成物の製造方法であって、
フルオロ基およびスルホニル基を有する陰イオンを備えた塩を溶解した水溶液(第1成分)を樹脂および/またはエラストマ-を含む組成物(第2成分)と混練し、組成物を形成する第1回目の混練工程と、
前記組成物を常圧または減圧下で加熱乾燥する工程と、
前記加熱乾燥後の前記組成物を前記第2成分と混練あるいはブレンドする第2回目の混練工程とを備えた制電性組成物の製造方法。 - 前記フルオロ基およびスルホニル基を有する陰イオンを備えた塩は、水100質量部に対して、0.1質量部以上95質量部以下の割合で水に溶解されていることを特徴とする請求項1に記載の制電性組成物の製造方法。
- 前記組成物中の樹脂および/またはエラストマー100質量部に対して、前記フルオロ基およびスルホニル基を有する陰イオンを備えた塩は、0.01質量部以上30質量部以下含まれる請求項1または2に記載の制電性組成物の製造方法。
- 前記フルオロ基およびスルホニル基を有する陰イオンは、ビス(フルオロアルキルスルホニル)イミドイオン、トリス(フルオロアルキルスルホニル)メチドイオンおよびフルオロアルキルスルホン酸イオンからなる群から選ばれた陰イオンである請求項1から3のいずれか1項に記載の制電性組成物の製造方法。
- 前記フルオロ基およびスルホニル基を有する陰イオンを備えた塩は、アルカリ金属、2A族元素、遷移金属、両性金属のいずれかの陽イオンと、前記フルオロ基およびスルホニル基を有する陰イオンとからなる塩である請求項1から4のいずれか1項に記載の制電性組成物の製造方法。
- 前記フルオロ基およびスルホニル基を有する陰イオンを備えた塩が、ビス(フルオロアルキルスルホニル)イミドのアルカリ金属塩、トリス(フルオロアルキルスルホニル)メチドのアルカリ金属塩およびトリフルオロアルキルスルホン酸のアルカリ金属塩からなる群から選ばれた塩である請求項1から5のいずれか1項に記載の制電性組成物の製造方法。
- 前記第1回目の混練工程において、重合体型帯電防止剤をさらに配合して前記混練を行なう請求項1から6のいずれか1項に記載の制電性組成物の製造方法。
- 前記樹脂および/またはエラストマー100質量部に対して、前記重合体型帯電防止剤を0.05質量部以上65質量部以下配合することを特徴とする請求項7に記載の制電性組成物の製造方法。
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JP2004326247A JP4323414B2 (ja) | 2004-11-10 | 2004-11-10 | 制電性組成物の製造方法 |
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JP2004326247A JP4323414B2 (ja) | 2004-11-10 | 2004-11-10 | 制電性組成物の製造方法 |
Publications (3)
Publication Number | Publication Date |
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JP2006137790A JP2006137790A (ja) | 2006-06-01 |
JP2006137790A5 JP2006137790A5 (ja) | 2006-07-13 |
JP4323414B2 true JP4323414B2 (ja) | 2009-09-02 |
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KR20180106818A (ko) | 2017-03-21 | 2018-10-01 | 산꼬 가가꾸 고교 가부시끼가이샤 | 제전성 조성물, 그 제조 방법, 성형품, 제전성 도료, 제전성 피복물 및 제전성 점착제 |
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EP2103647B1 (en) * | 2006-12-20 | 2012-04-11 | Kaneka Corporation | Pre-expanded noncrosslinked polypropylene resin beads and in-mold expansion moldings |
JP5033515B2 (ja) * | 2007-06-29 | 2012-09-26 | 三光化学工業株式会社 | 制電性組成物、それを用いた成形品、塗料、制電性被覆物、液晶パネル用カラーレジスト組成物およびその製造方法 |
JP5309714B2 (ja) * | 2007-07-04 | 2013-10-09 | 信越化学工業株式会社 | 帯電防止性能を有するシリコーン粘着剤組成物およびシリコーン粘着テープ |
JP2009122153A (ja) * | 2007-11-12 | 2009-06-04 | Sanko Kagaku Kogyo Kk | 有機微粒子組成物、その製造方法及びそれを用いた電子写真方式の印刷方法 |
US20090169895A1 (en) * | 2007-12-27 | 2009-07-02 | Jsp Corporation | Foamed polyolefin resin beads |
JP5456264B2 (ja) * | 2008-03-04 | 2014-03-26 | アロン化成株式会社 | 熱可塑性エラストマー組成物 |
WO2010055678A1 (ja) * | 2008-11-14 | 2010-05-20 | 三菱マテリアル株式会社 | 導電性シリカゾル組成物及びそれを用いた成形品 |
JP6821980B2 (ja) * | 2015-12-16 | 2021-01-27 | 住友ゴム工業株式会社 | 帯電防止剤を含有するゴム組成物およびその製造方法 |
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KR20180106818A (ko) | 2017-03-21 | 2018-10-01 | 산꼬 가가꾸 고교 가부시끼가이샤 | 제전성 조성물, 그 제조 방법, 성형품, 제전성 도료, 제전성 피복물 및 제전성 점착제 |
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