JP5033515B2 - 制電性組成物、それを用いた成形品、塗料、制電性被覆物、液晶パネル用カラーレジスト組成物およびその製造方法 - Google Patents
制電性組成物、それを用いた成形品、塗料、制電性被覆物、液晶パネル用カラーレジスト組成物およびその製造方法 Download PDFInfo
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- JP5033515B2 JP5033515B2 JP2007172018A JP2007172018A JP5033515B2 JP 5033515 B2 JP5033515 B2 JP 5033515B2 JP 2007172018 A JP2007172018 A JP 2007172018A JP 2007172018 A JP2007172018 A JP 2007172018A JP 5033515 B2 JP5033515 B2 JP 5033515B2
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- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- MHCFAGZWMAWTNR-UHFFFAOYSA-M lithium perchlorate Chemical compound [Li+].[O-]Cl(=O)(=O)=O MHCFAGZWMAWTNR-UHFFFAOYSA-M 0.000 description 1
- 229910001486 lithium perchlorate Inorganic materials 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- MQYNNGIYNLJMAP-UHFFFAOYSA-M lithium;fluoromethanesulfonate Chemical compound [Li+].[O-]S(=O)(=O)CF MQYNNGIYNLJMAP-UHFFFAOYSA-M 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- AYLRODJJLADBOB-QMMMGPOBSA-N methyl (2s)-2,6-diisocyanatohexanoate Chemical compound COC(=O)[C@@H](N=C=O)CCCCN=C=O AYLRODJJLADBOB-QMMMGPOBSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000747 poly(lactic acid) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004626 polylactic acid Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- RJPWSGDBEHVWPP-UHFFFAOYSA-N potassium bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound [K+].FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F RJPWSGDBEHVWPP-UHFFFAOYSA-N 0.000 description 1
- GLGXXYFYZWQGEL-UHFFFAOYSA-M potassium;trifluoromethanesulfonate Chemical compound [K+].[O-]S(=O)(=O)C(F)(F)F GLGXXYFYZWQGEL-UHFFFAOYSA-M 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000001175 rotational moulding Methods 0.000 description 1
- YLKTWKVVQDCJFL-UHFFFAOYSA-N sodium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Na+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F YLKTWKVVQDCJFL-UHFFFAOYSA-N 0.000 description 1
- CTHCGQAFGGHQTI-UHFFFAOYSA-N sodium;bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane Chemical compound [Na+].FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F CTHCGQAFGGHQTI-UHFFFAOYSA-N 0.000 description 1
- XGPOMXSYOKFBHS-UHFFFAOYSA-M sodium;trifluoromethanesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C(F)(F)F XGPOMXSYOKFBHS-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Paints Or Removers (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
[配合割合]
[重合体型帯電防止剤]
[他の添加剤]
[製造方法]
℃、相対湿度90%の雰囲気下で7日間放置し、7日間経過後の試験片の状態を下記の標準により、目視評価した。
PMMA: ポリメチルメタクリレ−ト ( 三菱レイヨン( 株 )製、 IRK 304 )
(実施例2)
(比較例8)
Claims (14)
- オキシエチレン単位が6以上のポリエチレングリコールジ(メタ)アクリレートを含む組成物中に、フルオロ基及びスルホニル基を有する陰イオンを備えた塩が分散されてなる制電性組成物であって、
前記フルオロ基及びスルホニル基を有する陰イオンを備えた塩は、メタノール、エタノール、イソプロパノール、1−ブタノール、2−ブタノール、シクロヘキサノール、アセトン、メチルエチルケトン、メチルブチルケトン、メチルイソブチルケトン、シクロヘキサノン、テトラヒドロフラン、エチレングリコールモノエチルエーテル、プロピレングリコールモノエチルエーテル、酢酸メチル、酢酸エチル及び酢酸ブチルからなる群から選ばれた揮発性有機溶媒に溶解された状態で分散されていることを特徴とする制電性組成物。 - 前記フルオロ基及びスルホニル基を有する陰イオンを備えた塩は、前記揮発性有機溶媒100質量部に対して、0.1質量部以上200質量部以下の割合で、前記揮発性有機溶媒に溶解されていることを特徴とする請求項1に記載の制電性組成物。
- 前記組成物中の前記ポリエチレングリコールジ(メタ)アクリレート100質量部に対して、前記フルオロ基及びスルホニル基を有する陰イオンを備えた塩は、0.01質量部以上30質量部以下含まれる請求項1または2に記載の制電性組成物。
- 前記フルオロ基及びスルホニル基を有する陰イオンは、ビス(フルオロアルキルスルホニル)イミドイオン、トリス(フルオロアルキルスルホニル)メチドイオン及びフルオロアルキルスルホン酸イオンからなる群から選ばれた陰イオンである請求項1から3のいずれか1項に記載の制電性組成物。
- 前記フルオロ基及びスルホニル基を有する陰イオンを備えた塩は、アルカリ金属、2A族元素、遷移金属、両性金属のいずれかの陽イオンと、前記フルオロ基及びスルホニル基を有する陰イオンとからなる塩である請求項1から4のいずれか1項に記載の制電性組成物。
- 前記フルオロ基及びスルホニル基を有する陰イオンを備えた塩が、ビス(フルオロアルキルスルホニル)イミドのアルカリ金属塩、トリス(フルオロアルキルスルホニル)メチドのアルカリ金属塩及びトリフルオロアルキルスルホン酸のアルカリ金属塩からなる群から選ばれた塩である請求項1から5のいずれか1項に記載の制電性組成物。
- 重合体型帯電防止剤がさらに配合されている請求項1から6のいずれか1項に記載の制電性組成物。
- 前記ポリエチレングリコールジ(メタ)アクリレート100質量部に対して、前記重合体型帯電防止剤が0.05質量部以上65質量部以下配合されていることを特徴とする請求項7に記載の制電性組成物。
- オキシエチレン単位が6以上のポリエチレングリコールジ(メタ)アクリレートを含む組成物中に、フルオロ基及びスルホニル基を有する陰イオンを備えた塩が分散されてなる制電性組成物の製造方法であって、
メタノール、エタノール、イソプロパノール、1−ブタノール、2−ブタノール、シクロヘキサノール、アセトン、メチルエチルケトン、メチルブチルケトン、メチルイソブチルケトン、シクロヘキサノン、テトラヒドロフラン、エチレングリコールモノエチルエーテル、プロピレングリコールモノエチルエーテル、酢酸メチル、酢酸エチル及び酢酸ブチルからなる群から選ばれた揮発性有機溶媒中に、フルオロ基及びスルホニル基を有する陰イオンを備えた塩を溶解してなる塩溶液を準備する工程と、
前記塩溶液と、前記ポリエチレングリコールジ(メタ)アクリレートとを一度に配合し、混練し、組成物を形成する工程とを備えた制電性組成物の製造方法。 - オキシエチレン単位が6以上のポリエチレングリコールジ(メタ)アクリレートを含む組成物中に、フルオロ基及びスルホニル基を有する陰イオンを備えた塩が分散されてなる制電性組成物の製造方法であって、
メタノール、エタノール、イソプロパノール、1−ブタノール、2−ブタノール、シクロヘキサノール、アセトン、メチルエチルケトン、メチルブチルケトン、メチルイソブチルケトン、シクロヘキサノン、テトラヒドロフラン、エチレングリコールモノエチルエーテル、プロピレングリコールモノエチルエーテル、酢酸メチル、酢酸エチル及び酢酸ブチルからなる群から選ばれた揮発性有機溶媒中に、フルオロ基及びスルホニル基を有する陰イオンを備えた塩を溶解してなる塩溶液を準備する工程と、
前記塩溶液(第1成分)と、前記ポリエチレングリコールジ(メタ)アクリレート(第2成分)とを混練し、組成物を形成する工程と、
前記組成物中の前記揮発性有機溶媒の量を減らすために、前記組成物を常圧または減圧下で乾燥させる工程と、
前記乾燥後の前記組成物を、さらに前記ポリエチレングリコールジ(メタ)アクリレートと混練あるいはブレンドする工程とを備えた制電性組成物の製造方法。 - 請求項1から8のいずれか1項に記載の制電性組成物を含む材料を成形してなる成形品。
- 請求項1から8のいずれか1項に記載の制電性組成物を含む塗料。
- 請求項1から8のいずれか1項に記載の制電性組成物を成形品表面で硬化させた制電性被覆物。
- 請求項1から8のいずれか1項に記載の制電性組成物を含む液晶パネル用カラーレジスト組成物。
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