JP4290905B2 - 有機膜の平坦化方法 - Google Patents

有機膜の平坦化方法 Download PDF

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Publication number
JP4290905B2
JP4290905B2 JP2001209410A JP2001209410A JP4290905B2 JP 4290905 B2 JP4290905 B2 JP 4290905B2 JP 2001209410 A JP2001209410 A JP 2001209410A JP 2001209410 A JP2001209410 A JP 2001209410A JP 4290905 B2 JP4290905 B2 JP 4290905B2
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JP
Japan
Prior art keywords
organic
organic film
film
organic solvent
planarizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001209410A
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English (en)
Japanese (ja)
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JP2003021827A5 (enExample
JP2003021827A (ja
Inventor
秀作 城戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tianma Japan Ltd
Original Assignee
NEC LCD Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC LCD Technologies Ltd filed Critical NEC LCD Technologies Ltd
Priority to JP2001209410A priority Critical patent/JP4290905B2/ja
Priority to TW091114593A priority patent/TWI311658B/zh
Priority to US10/189,571 priority patent/US6617263B2/en
Priority to CNB2004101006641A priority patent/CN100351692C/zh
Priority to CNB021413908A priority patent/CN1198171C/zh
Priority to KR1020020039775A priority patent/KR100557455B1/ko
Publication of JP2003021827A publication Critical patent/JP2003021827A/ja
Publication of JP2003021827A5 publication Critical patent/JP2003021827A5/ja
Application granted granted Critical
Publication of JP4290905B2 publication Critical patent/JP4290905B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
    • B05D3/107—Post-treatment of applied coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/48—Flattening arrangements

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Geometry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Liquid Crystal (AREA)
  • Formation Of Insulating Films (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2001209410A 2001-07-10 2001-07-10 有機膜の平坦化方法 Expired - Fee Related JP4290905B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001209410A JP4290905B2 (ja) 2001-07-10 2001-07-10 有機膜の平坦化方法
TW091114593A TWI311658B (en) 2001-07-10 2002-07-02 Pattern forming method and method for manufacturing liquid crystal display device using the same
US10/189,571 US6617263B2 (en) 2001-07-10 2002-07-08 Pattern forming method for flattening an organic film for a liquid crystal display device
CNB021413908A CN1198171C (zh) 2001-07-10 2002-07-09 图案形成方法及使用该方法制备液晶显示器的方法
CNB2004101006641A CN100351692C (zh) 2001-07-10 2002-07-09 图案形成方法及使用该方法制备液晶显示器的方法
KR1020020039775A KR100557455B1 (ko) 2001-07-10 2002-07-09 유기막의 평탄화방법 및 이를 이용한 액정표시장치 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001209410A JP4290905B2 (ja) 2001-07-10 2001-07-10 有機膜の平坦化方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007258154A Division JP4819016B2 (ja) 2007-10-01 2007-10-01 液晶表示装置の製造方法

Publications (3)

Publication Number Publication Date
JP2003021827A JP2003021827A (ja) 2003-01-24
JP2003021827A5 JP2003021827A5 (enExample) 2004-11-11
JP4290905B2 true JP4290905B2 (ja) 2009-07-08

Family

ID=19045065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001209410A Expired - Fee Related JP4290905B2 (ja) 2001-07-10 2001-07-10 有機膜の平坦化方法

Country Status (5)

Country Link
US (1) US6617263B2 (enExample)
JP (1) JP4290905B2 (enExample)
KR (1) KR100557455B1 (enExample)
CN (2) CN100351692C (enExample)
TW (1) TWI311658B (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1665346A4 (en) * 2003-09-09 2006-11-15 Csg Solar Ag IMPROVED METHOD FOR FORMING OPENINGS IN AN ORGANIC RESIN MATERIAL
JP2007505486A (ja) * 2003-09-09 2007-03-08 シーエスジー ソーラー アクチェンゲゼルシャフト リフローによるマスクの調整
JP2005159293A (ja) 2003-09-18 2005-06-16 Nec Kagoshima Ltd 基板処理装置及び処理方法
JP4419119B2 (ja) * 2003-12-03 2010-02-24 日本電気株式会社 電気光学装置及び投射型表示装置
JP2005340802A (ja) * 2004-04-28 2005-12-08 Semiconductor Energy Lab Co Ltd 半導体装置及び表示装置の作製方法
US20050276910A1 (en) * 2004-06-09 2005-12-15 Osram Opto Semiconductors Gmbh Post processing of films to improve film quality
JP4367347B2 (ja) * 2005-01-21 2009-11-18 セイコーエプソン株式会社 膜形成方法及び電気光学装置の製造方法並びに電子機器
KR101108148B1 (ko) * 2005-02-03 2012-02-09 삼성모바일디스플레이주식회사 유기 전계 발광 소자 및 이의 제조 방법
JP4876415B2 (ja) * 2005-03-29 2012-02-15 セイコーエプソン株式会社 有機ｅｌ装置の製造方法、デバイスの製造方法
JP4520355B2 (ja) 2005-04-19 2010-08-04 パナソニック株式会社 半導体モジュール
JP4720984B2 (ja) * 2005-05-18 2011-07-13 日産化学工業株式会社 段差を有する基板上に被覆膜を形成する方法
JP4929432B2 (ja) * 2005-07-29 2012-05-09 Ｎｌｔテクノロジー株式会社 液晶表示装置及びその製造方法
KR100738103B1 (ko) * 2006-02-04 2007-07-12 삼성전자주식회사 컬러 필터의 제조방법
JP5145654B2 (ja) * 2006-05-29 2013-02-20 日本電気株式会社 基板処理装置及び基板処理方法
JP5162952B2 (ja) * 2007-04-26 2013-03-13 日本電気株式会社 液晶表示装置用反射板の製造方法、液晶表示装置及び液晶表示装置用アレイ基板
JP2009090637A (ja) * 2007-09-18 2009-04-30 Toppan Printing Co Ltd 有機機能層及び有機機能性素子の製造方法並びに有機機能性素子製造装置
JP2009139568A (ja) * 2007-12-05 2009-06-25 Tokyo Electron Ltd 塗布装置
JP4601079B2 (ja) 2007-12-17 2010-12-22 東京エレクトロン株式会社 基板処理方法及び基板処理装置
JP2010050231A (ja) * 2008-08-20 2010-03-04 Nec Lcd Technologies Ltd 溶解変形用薬液及び有機膜パターンの溶解変形処理方法
DE102014113928B4 (de) * 2014-09-25 2023-10-05 Suss Microtec Lithography Gmbh Verfahren zum Beschichten eines Substrats mit einem Lack sowie Vorrichtung zum Planarisieren einer Lackschicht
US10043677B2 (en) 2015-03-30 2018-08-07 Mitsui Chemicals, Inc. Method for manufacturing filling planarization film and method for manufacturing electronic device
CN105762154B (zh) * 2016-02-24 2018-12-18 京东方科技集团股份有限公司 一种阵列基板及其制备方法、显示面板、显示装置
GB2583126A (en) * 2019-04-18 2020-10-21 Flexenable Ltd LCD device production

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07120784A (ja) 1993-10-22 1995-05-12 Rohm Co Ltd 液晶表示装置およびその製法
KR970002410A (ko) * 1995-06-20 1997-01-24 김주용 액정 표시 소자의 제조 방법
KR100438247B1 (ko) * 1995-09-29 2004-08-16 다우 글로벌 테크놀로지스 인크. 가교결합된폴리올레핀계발포체및이들의제조방법
JPH09134909A (ja) * 1995-11-10 1997-05-20 Hitachi Ltd 薄膜形成用回転塗布装置、半導体装置、及び薄膜の形成方法
JPH1174261A (ja) * 1997-08-29 1999-03-16 Hitachi Chem Co Ltd ポリシロキサン塗布膜の製造法及び半導体装置の製造法
EP1018163A1 (de) * 1997-09-10 2000-07-12 Infineon Technologies AG Halbleiterbauelement mit einer driftzone
JPH11202122A (ja) * 1998-01-16 1999-07-30 Mitsumura Printing Co Ltd カラ−フィルター作製法
TW556357B (en) * 1999-06-28 2003-10-01 Semiconductor Energy Lab Method of manufacturing an electro-optical device
JP3636641B2 (ja) * 1999-08-20 2005-04-06 セイコーエプソン株式会社 電気光学装置

Also Published As

Publication number Publication date
CN100351692C (zh) 2007-11-28
US20030012869A1 (en) 2003-01-16
CN1624553A (zh) 2005-06-08
KR20030007085A (ko) 2003-01-23
CN1198171C (zh) 2005-04-20
CN1396487A (zh) 2003-02-12
TWI311658B (en) 2009-07-01
US6617263B2 (en) 2003-09-09
KR100557455B1 (ko) 2006-03-07
JP2003021827A (ja) 2003-01-24

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