TWI311658B - Pattern forming method and method for manufacturing liquid crystal display device using the same - Google Patents
Pattern forming method and method for manufacturing liquid crystal display device using the same Download PDFInfo
- Publication number
- TWI311658B TWI311658B TW091114593A TW91114593A TWI311658B TW I311658 B TWI311658 B TW I311658B TW 091114593 A TW091114593 A TW 091114593A TW 91114593 A TW91114593 A TW 91114593A TW I311658 B TWI311658 B TW I311658B
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- organic
- substrate
- forming
- organic solvent
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 56
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 33
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000010408 film Substances 0.000 claims description 303
- 239000000758 substrate Substances 0.000 claims description 117
- 239000003960 organic solvent Substances 0.000 claims description 85
- 239000010410 layer Substances 0.000 claims description 34
- 239000004065 semiconductor Substances 0.000 claims description 26
- -1 alkoxy alcohols Chemical class 0.000 claims description 17
- 238000004090 dissolution Methods 0.000 claims description 15
- 238000002161 passivation Methods 0.000 claims description 15
- 239000011368 organic material Substances 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 229920001721 polyimide Polymers 0.000 claims description 5
- 229910052707 ruthenium Inorganic materials 0.000 claims description 5
- 229920000178 Acrylic resin Polymers 0.000 claims description 4
- 239000004925 Acrylic resin Substances 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 claims description 4
- 150000002334 glycols Chemical class 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 238000000746 purification Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 206010036790 Productive cough Diseases 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims description 2
- 150000002148 esters Chemical class 0.000 claims description 2
- 230000035515 penetration Effects 0.000 claims description 2
- 239000012466 permeate Substances 0.000 claims description 2
- 229920002401 polyacrylamide Polymers 0.000 claims description 2
- 239000002195 soluble material Substances 0.000 claims description 2
- 210000003802 sputum Anatomy 0.000 claims description 2
- 208000024794 sputum Diseases 0.000 claims description 2
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 5
- 239000007864 aqueous solution Substances 0.000 claims 4
- 238000011049 filling Methods 0.000 claims 3
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 2
- 230000003796 beauty Effects 0.000 claims 1
- 229910052797 bismuth Inorganic materials 0.000 claims 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 1
- 238000002425 crystallisation Methods 0.000 claims 1
- 230000008025 crystallization Effects 0.000 claims 1
- 150000002170 ethers Chemical class 0.000 claims 1
- 239000008187 granular material Substances 0.000 claims 1
- 210000003205 muscle Anatomy 0.000 claims 1
- 210000000496 pancreas Anatomy 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- 239000002023 wood Substances 0.000 claims 1
- 239000013039 cover film Substances 0.000 description 47
- 239000011229 interlayer Substances 0.000 description 13
- 230000008569 process Effects 0.000 description 11
- 230000001681 protective effect Effects 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052732 germanium Inorganic materials 0.000 description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000008646 thermal stress Effects 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- KXCVRJMSLWDHNJ-UHFFFAOYSA-N 1-(9H-fluoren-1-yl)pyrrolidin-2-one Chemical compound C1(=CC=CC=2C3=CC=CC=C3CC12)N1C(CCC1)=O KXCVRJMSLWDHNJ-UHFFFAOYSA-N 0.000 description 1
- GNIJLZHYBVVHMA-UHFFFAOYSA-N 1-decoxypropan-2-ol Chemical compound CCCCCCCCCCOCC(C)O GNIJLZHYBVVHMA-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- RSRYEDUTRQHWTE-UHFFFAOYSA-N 2-butoxyethanol 2-methoxyethyl acetate Chemical compound C(C)(=O)OCCOC.C(CCC)OCCO RSRYEDUTRQHWTE-UHFFFAOYSA-N 0.000 description 1
- YVVVNAZSGGAAPW-UHFFFAOYSA-N 2-methyltetradecan-4-one Chemical compound CCCCCCCCCCC(=O)CC(C)C YVVVNAZSGGAAPW-UHFFFAOYSA-N 0.000 description 1
- KSIXGGVLGGQSRY-UHFFFAOYSA-N C(C)OC(C)COC(C)COC(C)CO.C(C)OC(C)COC(C)CO Chemical compound C(C)OC(C)COC(C)COC(C)CO.C(C)OC(C)COC(C)CO KSIXGGVLGGQSRY-UHFFFAOYSA-N 0.000 description 1
- 241000283070 Equus zebra Species 0.000 description 1
- 235000019687 Lamb Nutrition 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 241000157491 Morinda Species 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical compound NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N gamma-butyrolactone Natural products O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 235000017524 noni Nutrition 0.000 description 1
- VQSLYBNAHOGNCE-UHFFFAOYSA-N pentan-3-yl propanoate Chemical compound CCC(CC)OC(=O)CC VQSLYBNAHOGNCE-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical group 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/107—Post-treatment of applied coatings
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/48—Flattening arrangements
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geometry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Liquid Crystal (AREA)
- Formation Of Insulating Films (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Thin Film Transistor (AREA)
- Optical Filters (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001209410A JP4290905B2 (ja) | 2001-07-10 | 2001-07-10 | 有機膜の平坦化方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWI311658B true TWI311658B (en) | 2009-07-01 |
Family
ID=19045065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091114593A TWI311658B (en) | 2001-07-10 | 2002-07-02 | Pattern forming method and method for manufacturing liquid crystal display device using the same |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6617263B2 (enExample) |
| JP (1) | JP4290905B2 (enExample) |
| KR (1) | KR100557455B1 (enExample) |
| CN (2) | CN100351692C (enExample) |
| TW (1) | TWI311658B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI664677B (zh) * | 2015-03-30 | 2019-07-01 | 日商三井化學股份有限公司 | 埋入式平坦化膜的製造方法及電子元件的製造方法 |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1665346A4 (en) * | 2003-09-09 | 2006-11-15 | Csg Solar Ag | IMPROVED METHOD FOR FORMING OPENINGS IN AN ORGANIC RESIN MATERIAL |
| JP2007505486A (ja) * | 2003-09-09 | 2007-03-08 | シーエスジー ソーラー アクチェンゲゼルシャフト | リフローによるマスクの調整 |
| JP2005159293A (ja) | 2003-09-18 | 2005-06-16 | Nec Kagoshima Ltd | 基板処理装置及び処理方法 |
| JP4419119B2 (ja) * | 2003-12-03 | 2010-02-24 | 日本電気株式会社 | 電気光学装置及び投射型表示装置 |
| JP2005340802A (ja) * | 2004-04-28 | 2005-12-08 | Semiconductor Energy Lab Co Ltd | 半導体装置及び表示装置の作製方法 |
| US20050276910A1 (en) * | 2004-06-09 | 2005-12-15 | Osram Opto Semiconductors Gmbh | Post processing of films to improve film quality |
| JP4367347B2 (ja) * | 2005-01-21 | 2009-11-18 | セイコーエプソン株式会社 | 膜形成方法及び電気光学装置の製造方法並びに電子機器 |
| KR101108148B1 (ko) * | 2005-02-03 | 2012-02-09 | 삼성모바일디스플레이주식회사 | 유기 전계 발광 소자 및 이의 제조 방법 |
| JP4876415B2 (ja) * | 2005-03-29 | 2012-02-15 | セイコーエプソン株式会社 | 有機ｅｌ装置の製造方法、デバイスの製造方法 |
| JP4520355B2 (ja) | 2005-04-19 | 2010-08-04 | パナソニック株式会社 | 半導体モジュール |
| JP4720984B2 (ja) * | 2005-05-18 | 2011-07-13 | 日産化学工業株式会社 | 段差を有する基板上に被覆膜を形成する方法 |
| JP4929432B2 (ja) * | 2005-07-29 | 2012-05-09 | Ｎｌｔテクノロジー株式会社 | 液晶表示装置及びその製造方法 |
| KR100738103B1 (ko) * | 2006-02-04 | 2007-07-12 | 삼성전자주식회사 | 컬러 필터의 제조방법 |
| JP5145654B2 (ja) * | 2006-05-29 | 2013-02-20 | 日本電気株式会社 | 基板処理装置及び基板処理方法 |
| JP5162952B2 (ja) * | 2007-04-26 | 2013-03-13 | 日本電気株式会社 | 液晶表示装置用反射板の製造方法、液晶表示装置及び液晶表示装置用アレイ基板 |
| JP2009090637A (ja) * | 2007-09-18 | 2009-04-30 | Toppan Printing Co Ltd | 有機機能層及び有機機能性素子の製造方法並びに有機機能性素子製造装置 |
| JP2009139568A (ja) * | 2007-12-05 | 2009-06-25 | Tokyo Electron Ltd | 塗布装置 |
| JP4601079B2 (ja) | 2007-12-17 | 2010-12-22 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| JP2010050231A (ja) * | 2008-08-20 | 2010-03-04 | Nec Lcd Technologies Ltd | 溶解変形用薬液及び有機膜パターンの溶解変形処理方法 |
| DE102014113928B4 (de) * | 2014-09-25 | 2023-10-05 | Suss Microtec Lithography Gmbh | Verfahren zum Beschichten eines Substrats mit einem Lack sowie Vorrichtung zum Planarisieren einer Lackschicht |
| CN105762154B (zh) * | 2016-02-24 | 2018-12-18 | 京东方科技集团股份有限公司 | 一种阵列基板及其制备方法、显示面板、显示装置 |
| GB2583126A (en) * | 2019-04-18 | 2020-10-21 | Flexenable Ltd | LCD device production |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07120784A (ja) | 1993-10-22 | 1995-05-12 | Rohm Co Ltd | 液晶表示装置およびその製法 |
| KR970002410A (ko) * | 1995-06-20 | 1997-01-24 | 김주용 | 액정 표시 소자의 제조 방법 |
| KR100438247B1 (ko) * | 1995-09-29 | 2004-08-16 | 다우 글로벌 테크놀로지스 인크. | 가교결합된폴리올레핀계발포체및이들의제조방법 |
| JPH09134909A (ja) * | 1995-11-10 | 1997-05-20 | Hitachi Ltd | 薄膜形成用回転塗布装置、半導体装置、及び薄膜の形成方法 |
| JPH1174261A (ja) * | 1997-08-29 | 1999-03-16 | Hitachi Chem Co Ltd | ポリシロキサン塗布膜の製造法及び半導体装置の製造法 |
| EP1018163A1 (de) * | 1997-09-10 | 2000-07-12 | Infineon Technologies AG | Halbleiterbauelement mit einer driftzone |
| JPH11202122A (ja) * | 1998-01-16 | 1999-07-30 | Mitsumura Printing Co Ltd | カラ−フィルター作製法 |
| TW556357B (en) * | 1999-06-28 | 2003-10-01 | Semiconductor Energy Lab | Method of manufacturing an electro-optical device |
| JP3636641B2 (ja) * | 1999-08-20 | 2005-04-06 | セイコーエプソン株式会社 | 電気光学装置 |
-
2001
- 2001-07-10 JP JP2001209410A patent/JP4290905B2/ja not_active Expired - Fee Related
-
2002
- 2002-07-02 TW TW091114593A patent/TWI311658B/zh not_active IP Right Cessation
- 2002-07-08 US US10/189,571 patent/US6617263B2/en not_active Expired - Lifetime
- 2002-07-09 CN CNB2004101006641A patent/CN100351692C/zh not_active Expired - Fee Related
- 2002-07-09 CN CNB021413908A patent/CN1198171C/zh not_active Expired - Fee Related
- 2002-07-09 KR KR1020020039775A patent/KR100557455B1/ko not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI664677B (zh) * | 2015-03-30 | 2019-07-01 | 日商三井化學股份有限公司 | 埋入式平坦化膜的製造方法及電子元件的製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100351692C (zh) | 2007-11-28 |
| US20030012869A1 (en) | 2003-01-16 |
| CN1624553A (zh) | 2005-06-08 |
| KR20030007085A (ko) | 2003-01-23 |
| JP4290905B2 (ja) | 2009-07-08 |
| CN1198171C (zh) | 2005-04-20 |
| CN1396487A (zh) | 2003-02-12 |
| US6617263B2 (en) | 2003-09-09 |
| KR100557455B1 (ko) | 2006-03-07 |
| JP2003021827A (ja) | 2003-01-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI311658B (en) | Pattern forming method and method for manufacturing liquid crystal display device using the same | |
| CN100336168C (zh) | 制造薄膜晶体管阵列基板的方法 | |
| KR101186740B1 (ko) | 뱅크형성 방법 및 이에 의해 형성된 뱅크를 함유하는 유기박막 트랜지스터 | |
| JP2951504B2 (ja) | シリル化平坦化レジスト及び平坦化方法並びに集積回路デバイスの製造方法 | |
| JP3696939B2 (ja) | シリカ系被膜の形成方法 | |
| US20100044696A1 (en) | Thin film transistor and liquid crystal display | |
| TW201336943A (zh) | 可固化且可圖案化之墨水以及印製方法 | |
| CN108389784B (zh) | 图案化的金属层的制备方法 | |
| JP2006179905A (ja) | 相分離複合膜およびその調製方法 | |
| JP3921917B2 (ja) | 微細構造体の製造方法 | |
| CN112234155B (zh) | 一种量子点图案化方法、显示面板的制作方法和显示面板 | |
| US10014483B2 (en) | Organic thin film transistor having patterned interface modification layer, display substrate and display apparatus having the same, and fabricating method thereof | |
| US20150079279A1 (en) | Method for manufacturing color filter | |
| JP2001110802A (ja) | 絶縁膜の形成方法 | |
| US8673545B2 (en) | Method for manufacturing liquid crystal display device | |
| TW201107907A (en) | Composition for stripping color filter and regeneration method of color filter using the same | |
| WO2013143309A1 (zh) | 黑矩阵的制作方法、彩色滤光片及显示装置 | |
| JP3871923B2 (ja) | パターン形成方法及びそれを用いたアクティブマトリクス基板の製造方法 | |
| CN111223911B (zh) | 一种显示面板及其制备方法、显示装置 | |
| CN109360839A (zh) | 显示基板及其制备方法、显示面板、纳米微粒的制备方法 | |
| JP4819016B2 (ja) | 液晶表示装置の製造方法 | |
| JP2007027525A (ja) | 半導体装置の製造方法、および半導体装置、ならびに絶縁膜の形成方法 | |
| Jang et al. | Control of doctor‐blade coated poly (3, 4‐ethylenedioxythiophene)/poly (styrenesulfonate) electrodes shape on prepatterned substrates via microflow control in a drying droplet | |
| JP2009086685A (ja) | 液晶表示装置の製造方法 | |
| CN107731679B (zh) | 显示面板的制造方法、显示面板和显示装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |