CN100351692C - 图案形成方法及使用该方法制备液晶显示器的方法 - Google Patents

图案形成方法及使用该方法制备液晶显示器的方法 Download PDF

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Publication number
CN100351692C
CN100351692C CNB2004101006641A CN200410100664A CN100351692C CN 100351692 C CN100351692 C CN 100351692C CN B2004101006641 A CNB2004101006641 A CN B2004101006641A CN 200410100664 A CN200410100664 A CN 200410100664A CN 100351692 C CN100351692 C CN 100351692C
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CN
China
Prior art keywords
organic film
film
planarization
organic solvent
organic
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Expired - Fee Related
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CNB2004101006641A
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English (en)
Chinese (zh)
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CN1624553A (zh
Inventor
城户秀作
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NEC Corp
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NEC LCD Technologies Ltd
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Publication of CN1624553A publication Critical patent/CN1624553A/zh
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Publication of CN100351692C publication Critical patent/CN100351692C/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
    • B05D3/107—Post-treatment of applied coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/48—Flattening arrangements

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Geometry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Liquid Crystal (AREA)
  • Formation Of Insulating Films (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CNB2004101006641A 2001-07-10 2002-07-09 图案形成方法及使用该方法制备液晶显示器的方法 Expired - Fee Related CN100351692C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001209410 2001-07-10
JP2001209410A JP4290905B2 (ja) 2001-07-10 2001-07-10 有機膜の平坦化方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNB021413908A Division CN1198171C (zh) 2001-07-10 2002-07-09 图案形成方法及使用该方法制备液晶显示器的方法

Publications (2)

Publication Number Publication Date
CN1624553A CN1624553A (zh) 2005-06-08
CN100351692C true CN100351692C (zh) 2007-11-28

Family

ID=19045065

Family Applications (2)

Application Number Title Priority Date Filing Date
CNB2004101006641A Expired - Fee Related CN100351692C (zh) 2001-07-10 2002-07-09 图案形成方法及使用该方法制备液晶显示器的方法
CNB021413908A Expired - Fee Related CN1198171C (zh) 2001-07-10 2002-07-09 图案形成方法及使用该方法制备液晶显示器的方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNB021413908A Expired - Fee Related CN1198171C (zh) 2001-07-10 2002-07-09 图案形成方法及使用该方法制备液晶显示器的方法

Country Status (5)

Country Link
US (1) US6617263B2 (enExample)
JP (1) JP4290905B2 (enExample)
KR (1) KR100557455B1 (enExample)
CN (2) CN100351692C (enExample)
TW (1) TWI311658B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105762154A (zh) * 2016-02-24 2016-07-13 京东方科技集团股份有限公司 一种阵列基板及其制备方法、显示面板、显示装置

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EP1665346A4 (en) * 2003-09-09 2006-11-15 Csg Solar Ag IMPROVED METHOD FOR FORMING OPENINGS IN AN ORGANIC RESIN MATERIAL
JP2007505486A (ja) * 2003-09-09 2007-03-08 シーエスジー ソーラー アクチェンゲゼルシャフト リフローによるマスクの調整
JP2005159293A (ja) 2003-09-18 2005-06-16 Nec Kagoshima Ltd 基板処理装置及び処理方法
JP4419119B2 (ja) * 2003-12-03 2010-02-24 日本電気株式会社 電気光学装置及び投射型表示装置
JP2005340802A (ja) * 2004-04-28 2005-12-08 Semiconductor Energy Lab Co Ltd 半導体装置及び表示装置の作製方法
US20050276910A1 (en) * 2004-06-09 2005-12-15 Osram Opto Semiconductors Gmbh Post processing of films to improve film quality
JP4367347B2 (ja) * 2005-01-21 2009-11-18 セイコーエプソン株式会社 膜形成方法及び電気光学装置の製造方法並びに電子機器
KR101108148B1 (ko) * 2005-02-03 2012-02-09 삼성모바일디스플레이주식회사 유기 전계 발광 소자 및 이의 제조 방법
JP4876415B2 (ja) * 2005-03-29 2012-02-15 セイコーエプソン株式会社 有機ｅｌ装置の製造方法、デバイスの製造方法
JP4520355B2 (ja) 2005-04-19 2010-08-04 パナソニック株式会社 半導体モジュール
JP4720984B2 (ja) * 2005-05-18 2011-07-13 日産化学工業株式会社 段差を有する基板上に被覆膜を形成する方法
JP4929432B2 (ja) * 2005-07-29 2012-05-09 Ｎｌｔテクノロジー株式会社 液晶表示装置及びその製造方法
KR100738103B1 (ko) * 2006-02-04 2007-07-12 삼성전자주식회사 컬러 필터의 제조방법
JP5145654B2 (ja) * 2006-05-29 2013-02-20 日本電気株式会社 基板処理装置及び基板処理方法
JP5162952B2 (ja) * 2007-04-26 2013-03-13 日本電気株式会社 液晶表示装置用反射板の製造方法、液晶表示装置及び液晶表示装置用アレイ基板
JP2009090637A (ja) * 2007-09-18 2009-04-30 Toppan Printing Co Ltd 有機機能層及び有機機能性素子の製造方法並びに有機機能性素子製造装置
JP2009139568A (ja) * 2007-12-05 2009-06-25 Tokyo Electron Ltd 塗布装置
JP4601079B2 (ja) 2007-12-17 2010-12-22 東京エレクトロン株式会社 基板処理方法及び基板処理装置
JP2010050231A (ja) * 2008-08-20 2010-03-04 Nec Lcd Technologies Ltd 溶解変形用薬液及び有機膜パターンの溶解変形処理方法
DE102014113928B4 (de) * 2014-09-25 2023-10-05 Suss Microtec Lithography Gmbh Verfahren zum Beschichten eines Substrats mit einem Lack sowie Vorrichtung zum Planarisieren einer Lackschicht
US10043677B2 (en) 2015-03-30 2018-08-07 Mitsui Chemicals, Inc. Method for manufacturing filling planarization film and method for manufacturing electronic device
GB2583126A (en) * 2019-04-18 2020-10-21 Flexenable Ltd LCD device production

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07120784A (ja) * 1993-10-22 1995-05-12 Rohm Co Ltd 液晶表示装置およびその製法
CN1198171A (zh) * 1995-09-29 1998-11-04 陶氏化学公司 交联的聚烯烃泡沫及其生产方法
WO1999013512A1 (de) * 1997-09-10 1999-03-18 Infineon Technologies Ag Halbleiterbauelement mit einer driftzone
EP1079260A2 (en) * 1999-08-20 2001-02-28 Seiko Epson Corporation Electro-optical device

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KR970002410A (ko) * 1995-06-20 1997-01-24 김주용 액정 표시 소자의 제조 방법
JPH09134909A (ja) * 1995-11-10 1997-05-20 Hitachi Ltd 薄膜形成用回転塗布装置、半導体装置、及び薄膜の形成方法
JPH1174261A (ja) * 1997-08-29 1999-03-16 Hitachi Chem Co Ltd ポリシロキサン塗布膜の製造法及び半導体装置の製造法
JPH11202122A (ja) * 1998-01-16 1999-07-30 Mitsumura Printing Co Ltd カラ−フィルター作製法
TW556357B (en) * 1999-06-28 2003-10-01 Semiconductor Energy Lab Method of manufacturing an electro-optical device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07120784A (ja) * 1993-10-22 1995-05-12 Rohm Co Ltd 液晶表示装置およびその製法
CN1198171A (zh) * 1995-09-29 1998-11-04 陶氏化学公司 交联的聚烯烃泡沫及其生产方法
WO1999013512A1 (de) * 1997-09-10 1999-03-18 Infineon Technologies Ag Halbleiterbauelement mit einer driftzone
EP1079260A2 (en) * 1999-08-20 2001-02-28 Seiko Epson Corporation Electro-optical device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105762154A (zh) * 2016-02-24 2016-07-13 京东方科技集团股份有限公司 一种阵列基板及其制备方法、显示面板、显示装置
US10026758B2 (en) 2016-02-24 2018-07-17 Boe Technology Group Co., Ltd. Array substrate, manufacturing method thereof, display panel, and display device
CN105762154B (zh) * 2016-02-24 2018-12-18 京东方科技集团股份有限公司 一种阵列基板及其制备方法、显示面板、显示装置

Also Published As

Publication number Publication date
US20030012869A1 (en) 2003-01-16
CN1624553A (zh) 2005-06-08
KR20030007085A (ko) 2003-01-23
JP4290905B2 (ja) 2009-07-08
CN1198171C (zh) 2005-04-20
CN1396487A (zh) 2003-02-12
TWI311658B (en) 2009-07-01
US6617263B2 (en) 2003-09-09
KR100557455B1 (ko) 2006-03-07
JP2003021827A (ja) 2003-01-24

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Patentee after: NEC Corp.

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Patentee before: NEC LCD Technologies, Ltd.

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