JP4248695B2 - ウェハ移載装置の緊急停止装置 - Google Patents

ウェハ移載装置の緊急停止装置 Download PDF

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Publication number
JP4248695B2
JP4248695B2 JP21001799A JP21001799A JP4248695B2 JP 4248695 B2 JP4248695 B2 JP 4248695B2 JP 21001799 A JP21001799 A JP 21001799A JP 21001799 A JP21001799 A JP 21001799A JP 4248695 B2 JP4248695 B2 JP 4248695B2
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JP
Japan
Prior art keywords
wafer
wafer transfer
linear motor
power supply
movable body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP21001799A
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English (en)
Japanese (ja)
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JP2001035899A (ja
JP2001035899A5 (enExample
Inventor
正樹 成島
弘明 佐伯
哲 大沢
育志 谷山
修士 萩原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP21001799A priority Critical patent/JP4248695B2/ja
Priority to TW089114956A priority patent/TW465011B/zh
Priority to US10/048,012 priority patent/US7393172B1/en
Priority to PCT/JP2000/004987 priority patent/WO2001008211A1/ja
Publication of JP2001035899A publication Critical patent/JP2001035899A/ja
Publication of JP2001035899A5 publication Critical patent/JP2001035899A5/ja
Application granted granted Critical
Publication of JP4248695B2 publication Critical patent/JP4248695B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

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  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
  • Non-Mechanical Conveyors (AREA)
JP21001799A 1999-07-26 1999-07-26 ウェハ移載装置の緊急停止装置 Expired - Fee Related JP4248695B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP21001799A JP4248695B2 (ja) 1999-07-26 1999-07-26 ウェハ移載装置の緊急停止装置
TW089114956A TW465011B (en) 1999-07-26 2000-07-26 Transfer device for subjects to be processed and semiconductor manufacturing apparatus with the device
US10/048,012 US7393172B1 (en) 1999-07-26 2000-07-26 Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device
PCT/JP2000/004987 WO2001008211A1 (en) 1999-07-26 2000-07-26 Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21001799A JP4248695B2 (ja) 1999-07-26 1999-07-26 ウェハ移載装置の緊急停止装置

Publications (3)

Publication Number Publication Date
JP2001035899A JP2001035899A (ja) 2001-02-09
JP2001035899A5 JP2001035899A5 (enExample) 2005-10-06
JP4248695B2 true JP4248695B2 (ja) 2009-04-02

Family

ID=16582455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21001799A Expired - Fee Related JP4248695B2 (ja) 1999-07-26 1999-07-26 ウェハ移載装置の緊急停止装置

Country Status (4)

Country Link
US (1) US7393172B1 (enExample)
JP (1) JP4248695B2 (enExample)
TW (1) TW465011B (enExample)
WO (1) WO2001008211A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4021125B2 (ja) 2000-06-02 2007-12-12 東京エレクトロン株式会社 ウェハ移載装置の装置ユニット接続時に用いられるレールの真直性保持装置
JP4298136B2 (ja) 2000-06-02 2009-07-15 東京エレクトロン株式会社 ウェハ移載ロボット着脱用台車
US7066707B1 (en) * 2001-08-31 2006-06-27 Asyst Technologies, Inc. Wafer engine
DE102006029003A1 (de) * 2006-06-24 2008-01-03 Vistec Semiconductor Systems Gmbh Waferhandhabungsvorrichtung
JP5194776B2 (ja) * 2007-12-21 2013-05-08 株式会社リコー 情報表示システム、情報表示方法およびプログラム
JP2015076590A (ja) * 2013-10-11 2015-04-20 株式会社ディスコ ウェーハ搬送ロボット着脱治具
US10853524B2 (en) * 2018-01-23 2020-12-01 Wipro Limited System and method for providing security for robots
CN112840447B (zh) * 2018-10-04 2025-11-21 应用材料公司 运输系统
CN111099049B (zh) * 2019-12-11 2021-06-15 范建华 一种使用方便的高效水泥灌装设备

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61293740A (ja) * 1985-06-21 1986-12-24 Hiroshi Teramachi テ−ブル移送装置
US4904153A (en) * 1986-11-20 1990-02-27 Shimizu Construction Co., Ltd. Transporting robot for semiconductor wafers
JP2560371B2 (ja) * 1988-01-05 1996-12-04 株式会社ニコン 基板処理システム
US5040431A (en) * 1988-01-22 1991-08-20 Canon Kabushiki Kaisha Movement guiding mechanism
US5170714A (en) * 1988-06-13 1992-12-15 Asahi Glass Company, Ltd. Vacuum processing apparatus and transportation system thereof
US5679059A (en) * 1994-11-29 1997-10-21 Ebara Corporation Polishing aparatus and method
JPH08162797A (ja) * 1994-12-08 1996-06-21 Matsushita Electric Ind Co Ltd 電子部品実装装置
JPH0923679A (ja) 1995-07-05 1997-01-21 Fanuc Ltd リニアモータを用いたロボット駆動機構
JP3069945B2 (ja) * 1995-07-28 2000-07-24 東京エレクトロン株式会社 処理装置
US5733096A (en) * 1995-09-13 1998-03-31 Silicon Valley Group, Inc. Multi-stage telescoping structure
US5773951A (en) * 1996-03-25 1998-06-30 Digital Test Corporation Wafer prober having sub-micron alignment accuracy
US6203582B1 (en) * 1996-07-15 2001-03-20 Semitool, Inc. Modular semiconductor workpiece processing tool
JPH1089357A (ja) * 1996-09-10 1998-04-07 Nippon Thompson Co Ltd 直動案内装置用の制動装置
JP3360001B2 (ja) * 1996-10-30 2002-12-24 芝浦メカトロニクス株式会社 処理装置
US5833426A (en) 1996-12-11 1998-11-10 Applied Materials, Inc. Magnetically coupled wafer extraction platform
US5933902A (en) * 1997-11-18 1999-08-10 Frey; Bernhard M. Wafer cleaning system
US6257827B1 (en) * 1997-12-01 2001-07-10 Brooks Automation Inc. Apparatus and method for transporting substrates
WO1999046084A1 (en) * 1998-03-09 1999-09-16 Ebara Corporation Polishing apparatus
JP3869938B2 (ja) * 1998-06-05 2007-01-17 キヤノン株式会社 ステージ装置、露光装置、およびデバイス製造方法
US6379096B1 (en) * 1999-02-22 2002-04-30 Scp Global Technologies, Inc. Buffer storage system
US6252705B1 (en) * 1999-05-25 2001-06-26 Schlumberger Technologies, Inc. Stage for charged particle microscopy system
US6428262B1 (en) * 1999-08-11 2002-08-06 Proteros, Llc Compact load lock system for ion beam processing of foups

Also Published As

Publication number Publication date
JP2001035899A (ja) 2001-02-09
WO2001008211A1 (en) 2001-02-01
US7393172B1 (en) 2008-07-01
TW465011B (en) 2001-11-21

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