JP4225728B2 - 不揮発性半導体記憶装置の製造方法 - Google Patents

不揮発性半導体記憶装置の製造方法 Download PDF

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Publication number
JP4225728B2
JP4225728B2 JP2002001138A JP2002001138A JP4225728B2 JP 4225728 B2 JP4225728 B2 JP 4225728B2 JP 2002001138 A JP2002001138 A JP 2002001138A JP 2002001138 A JP2002001138 A JP 2002001138A JP 4225728 B2 JP4225728 B2 JP 4225728B2
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Japan
Prior art keywords
insulating film
gate
transistor
film
peripheral circuit
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Expired - Fee Related
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JP2002001138A
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English (en)
Japanese (ja)
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JP2003203999A (ja
JP2003203999A5 (enExample
Inventor
奈保 西岡
直樹 辻
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Renesas Technology Corp
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Renesas Technology Corp
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Publication date
Application filed by Renesas Technology Corp filed Critical Renesas Technology Corp
Priority to JP2002001138A priority Critical patent/JP4225728B2/ja
Priority to TW091114152A priority patent/TWI267981B/zh
Priority to US10/189,575 priority patent/US6657249B2/en
Priority to KR10-2002-0054046A priority patent/KR100479399B1/ko
Publication of JP2003203999A publication Critical patent/JP2003203999A/ja
Publication of JP2003203999A5 publication Critical patent/JP2003203999A5/ja
Application granted granted Critical
Publication of JP4225728B2 publication Critical patent/JP4225728B2/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/40—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the peripheral circuit region
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/40—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the peripheral circuit region
    • H10B41/42—Simultaneous manufacture of periphery and memory cells
    • H10B41/49—Simultaneous manufacture of periphery and memory cells comprising different types of peripheral transistor

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
JP2002001138A 2002-01-08 2002-01-08 不揮発性半導体記憶装置の製造方法 Expired - Fee Related JP4225728B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002001138A JP4225728B2 (ja) 2002-01-08 2002-01-08 不揮発性半導体記憶装置の製造方法
TW091114152A TWI267981B (en) 2002-01-08 2002-06-27 Nonvolatile semiconductor memory device
US10/189,575 US6657249B2 (en) 2002-01-08 2002-07-08 Nonvolatile semiconductor memory device with peripheral circuit part comprising at least one of two transistors having lower conductive layer same perpendicular structure as a floating gate
KR10-2002-0054046A KR100479399B1 (ko) 2002-01-08 2002-09-07 불휘발성 반도체 기억 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002001138A JP4225728B2 (ja) 2002-01-08 2002-01-08 不揮発性半導体記憶装置の製造方法

Publications (3)

Publication Number Publication Date
JP2003203999A JP2003203999A (ja) 2003-07-18
JP2003203999A5 JP2003203999A5 (enExample) 2005-08-04
JP4225728B2 true JP4225728B2 (ja) 2009-02-18

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Family Applications (1)

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JP2002001138A Expired - Fee Related JP4225728B2 (ja) 2002-01-08 2002-01-08 不揮発性半導体記憶装置の製造方法

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Country Link
US (1) US6657249B2 (enExample)
JP (1) JP4225728B2 (enExample)
KR (1) KR100479399B1 (enExample)
TW (1) TWI267981B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005026380A (ja) * 2003-06-30 2005-01-27 Toshiba Corp 不揮発性メモリを含む半導体装置及びその製造方法
KR100549591B1 (ko) * 2003-11-05 2006-02-08 매그나칩 반도체 유한회사 비휘발성 메모리 소자 및 그의 제조 방법
US7229880B2 (en) * 2003-11-19 2007-06-12 Promos Technologies Inc. Precision creation of inter-gates insulator
KR100564629B1 (ko) * 2004-07-06 2006-03-28 삼성전자주식회사 이이피롬 소자 및 그 제조 방법
JP4583878B2 (ja) * 2004-10-29 2010-11-17 富士通セミコンダクター株式会社 半導体装置の製造方法
JP2006294751A (ja) * 2005-04-07 2006-10-26 Toshiba Corp 半導体集積回路及びその製造方法
JP4718894B2 (ja) 2005-05-19 2011-07-06 株式会社東芝 半導体装置の製造方法
US7450431B1 (en) 2005-08-24 2008-11-11 Xilinx, Inc. PMOS three-terminal non-volatile memory element and method of programming
US7687797B1 (en) 2005-08-24 2010-03-30 Xilinx, Inc. Three-terminal non-volatile memory element with hybrid gate dielectric
US7544968B1 (en) 2005-08-24 2009-06-09 Xilinx, Inc. Non-volatile memory cell with charge storage element and method of programming
US7420842B1 (en) 2005-08-24 2008-09-02 Xilinx, Inc. Method of programming a three-terminal non-volatile memory element using source-drain bias
KR100702029B1 (ko) * 2005-09-22 2007-03-30 삼성전자주식회사 플로팅된 드레인측 보조 게이트를 갖는 고전압 모스트랜지스터를 구비하는 비휘발성 메모리 소자들 및 그제조방법들
JP4810392B2 (ja) 2005-11-15 2011-11-09 株式会社東芝 不揮発性半導体記憶装置およびその製造方法
JP5367755B2 (ja) * 2005-11-15 2013-12-11 株式会社東芝 不揮発性半導体記憶装置の製造方法
US20080150005A1 (en) * 2006-12-21 2008-06-26 Spansion Llc Memory system with depletion gate
JP2007201494A (ja) * 2007-03-26 2007-08-09 Toshiba Corp 不揮発性半導体記憶装置
JP2008244009A (ja) * 2007-03-26 2008-10-09 Fujitsu Ltd 半導体装置およびその製造方法
JP4564511B2 (ja) * 2007-04-16 2010-10-20 株式会社東芝 半導体装置及びその製造方法
US7897514B2 (en) * 2008-01-24 2011-03-01 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor contact barrier
US8068370B2 (en) * 2008-04-18 2011-11-29 Macronix International Co., Ltd. Floating gate memory device with interpoly charge trapping structure
US20140048888A1 (en) 2012-08-17 2014-02-20 Taiwan Semiconductor Manufacturing Company, Ltd. Strained Structure of a Semiconductor Device
US9117525B2 (en) 2012-09-12 2015-08-25 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device and method of manufacturing the same
JP2015177187A (ja) * 2014-03-12 2015-10-05 株式会社東芝 不揮発性半導体記憶装置
US9698147B2 (en) 2015-02-25 2017-07-04 Sii Semiconductor Corporation Semiconductor integrated circuit device having low and high withstanding-voltage MOS transistors

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03283570A (ja) 1990-03-30 1991-12-13 Fujitsu Ltd 半導体装置及びその製造方法
GB9107952D0 (en) 1991-04-15 1991-05-29 Dow Rheinmuenster Surface crosslinked and surfactant coated absorbent resin particles and method of preparation
KR940009644B1 (ko) * 1991-11-19 1994-10-15 삼성전자 주식회사 불휘발성 반도체메모리장치 및 그 제조방법
KR960012303B1 (ko) * 1992-08-18 1996-09-18 삼성전자 주식회사 불휘발성 반도체메모리장치 및 그 제조방법
US5793081A (en) * 1994-03-25 1998-08-11 Nippon Steel Corporation Nonvolatile semiconductor storage device and method of manufacturing
KR970054103A (ko) * 1995-12-29 1997-07-31 김주용 플래쉬 이이피롬 셀 제조 방법
JP2001210809A (ja) * 2000-01-28 2001-08-03 Toshiba Microelectronics Corp 半導体装置の製造方法
JP4068781B2 (ja) * 2000-02-28 2008-03-26 株式会社ルネサステクノロジ 半導体集積回路装置および半導体集積回路装置の製造方法

Also Published As

Publication number Publication date
KR20030060748A (ko) 2003-07-16
JP2003203999A (ja) 2003-07-18
TWI267981B (en) 2006-12-01
US20030127681A1 (en) 2003-07-10
KR100479399B1 (ko) 2005-03-30
US6657249B2 (en) 2003-12-02

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