JP4183240B2 - 金および金合金の電着浴とその用法 - Google Patents

金および金合金の電着浴とその用法 Download PDF

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Publication number
JP4183240B2
JP4183240B2 JP2002568818A JP2002568818A JP4183240B2 JP 4183240 B2 JP4183240 B2 JP 4183240B2 JP 2002568818 A JP2002568818 A JP 2002568818A JP 2002568818 A JP2002568818 A JP 2002568818A JP 4183240 B2 JP4183240 B2 JP 4183240B2
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JP
Japan
Prior art keywords
bath
use according
gold
compound
bismuth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2002568818A
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English (en)
Japanese (ja)
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JP2004527653A (ja
Inventor
レーベル スザンネ
シュテュムケ マンフレッド
Original Assignee
ヴィーラント デンタル ウント テクニーク ゲーエムベーハー ウント コー カーゲー
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Priority claimed from DE2001110743 external-priority patent/DE10110743A1/de
Application filed by ヴィーラント デンタル ウント テクニーク ゲーエムベーハー ウント コー カーゲー filed Critical ヴィーラント デンタル ウント テクニーク ゲーエムベーハー ウント コー カーゲー
Publication of JP2004527653A publication Critical patent/JP2004527653A/ja
Application granted granted Critical
Publication of JP4183240B2 publication Critical patent/JP4183240B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/48Electroplating: Baths therefor from solutions of gold
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/62Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Dental Preparations (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2002568818A 2001-02-28 2002-02-28 金および金合金の電着浴とその用法 Expired - Fee Related JP4183240B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2001110743 DE10110743A1 (de) 2001-02-28 2001-02-28 Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung
EP01108448A EP1236814A1 (de) 2001-02-28 2001-04-04 Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung
PCT/EP2002/002128 WO2002068728A1 (de) 2001-02-28 2002-02-28 Bad zur galvanischen abscheidung von gold und goldlegierungen sowie dessen verwendung

Publications (2)

Publication Number Publication Date
JP2004527653A JP2004527653A (ja) 2004-09-09
JP4183240B2 true JP4183240B2 (ja) 2008-11-19

Family

ID=26008695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002568818A Expired - Fee Related JP4183240B2 (ja) 2001-02-28 2002-02-28 金および金合金の電着浴とその用法

Country Status (8)

Country Link
US (1) US20040065225A1 (zh)
EP (1) EP1366219B1 (zh)
JP (1) JP4183240B2 (zh)
CN (1) CN100392155C (zh)
AU (1) AU2002308221A1 (zh)
BR (1) BR0207724A (zh)
CA (1) CA2438207A1 (zh)
WO (1) WO2002068728A1 (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1378590A1 (fr) * 2002-07-04 2004-01-07 Metalor Technologies International S.A. Bain pour dépôts electrolytiques d'or
CA2558475A1 (en) * 2004-02-18 2005-09-01 Marianna Cooley Antimicrobial formulations and methods of using the same
CN1308493C (zh) * 2004-07-27 2007-04-04 滕先弟 硫代硫酸金铵络合物及其制备方法
JP5442400B2 (ja) * 2009-11-13 2014-03-12 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
CN101781758B (zh) * 2010-04-09 2011-12-07 厦门华弘昌科技有限公司 化学镀镍稳定剂、化学镀镍溶液及化学镀镍工艺
US11579344B2 (en) 2012-09-17 2023-02-14 Government Of The United States Of America, As Represented By The Secretary Of Commerce Metallic grating
US10889908B2 (en) * 2012-09-17 2021-01-12 Government Of The United States Of America, As Represented By The Secretary Of Commerce Superconformal filling composition and superconformally filling a recessed feature of an article
ITFI20120208A1 (it) * 2012-10-12 2014-04-13 Bluclad S R L Soluzione per l'elettrodeposizione di una lega di oro e la lega da essa derivante.
ITFI20130057A1 (it) * 2013-03-18 2014-09-19 Bluclad S R L Soluzione per l¿elettrodeposizione di una lega di oro e la lega da essa derivante.
CN103938232B (zh) * 2014-03-04 2015-04-01 深圳市联合蓝海新技术有限公司 一种无氰电镀液及其应用
CN103938231B (zh) * 2014-03-04 2015-04-01 深圳市联合蓝海科技开发有限公司 一种电镀黄金的方法和硬质黄金的制备方法
CN104047037B (zh) * 2014-06-16 2015-06-03 深圳市联合蓝海科技开发有限公司 一种硬化剂
CN104862752B (zh) * 2015-06-12 2016-02-17 深圳市联合蓝海投资控股集团有限公司 改性无氰镀金液及其应用和硬质黄金的制备方法
WO2023041972A1 (en) * 2021-09-16 2023-03-23 Galvasols P & S High-speed pure gold electroforming/electroplating bath
JP7219847B1 (ja) 2022-09-26 2023-02-08 Eeja株式会社 金電気めっき液および金電気めっき方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE754151A (fr) * 1969-08-08 1970-12-31 Sel Rex Corp Bain aqueux pour le placage electrolytique d'or ou d'alliage d'or sur un article conducteur, procede de fabrication dudit bain aqueux et utilisation de celui-ci
CH622829A5 (zh) * 1977-08-29 1981-04-30 Systemes Traitements Surfaces
JP2592246B2 (ja) * 1987-04-10 1997-03-19 株式会社ジーシー 歯冠修復用複合冠の内側冠の作製方法及び装置
DE3805627A1 (de) * 1988-02-24 1989-09-07 Wieland Edelmetalle Goldbad
US5277790A (en) * 1992-07-10 1994-01-11 Technic Incorporated Non-cyanide electroplating solution for gold or alloys thereof
DE19629658C2 (de) * 1996-07-23 1999-01-14 Degussa Cyanidfreies galvanisches Bad zur Abscheidung von Gold und Goldlegierungen
DE19845506A1 (de) * 1998-10-02 2000-04-06 Wieland Edelmetalle Verfahren zur Herstellung von prothetischen Formteilen für den Dentalbereich und prothetisches Formteil

Also Published As

Publication number Publication date
WO2002068728A1 (de) 2002-09-06
CN1494606A (zh) 2004-05-05
BR0207724A (pt) 2004-03-23
CA2438207A1 (en) 2002-09-06
CN100392155C (zh) 2008-06-04
US20040065225A1 (en) 2004-04-08
EP1366219A2 (de) 2003-12-03
AU2002308221A1 (en) 2002-09-12
EP1366219B1 (de) 2014-09-03
WO2002068728A8 (de) 2003-09-18
JP2004527653A (ja) 2004-09-09

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