CA2438207A1 - Bath for the galvanic deposition of gold and gold alloys, and the use thereof - Google Patents
Bath for the galvanic deposition of gold and gold alloys, and the use thereof Download PDFInfo
- Publication number
- CA2438207A1 CA2438207A1 CA002438207A CA2438207A CA2438207A1 CA 2438207 A1 CA2438207 A1 CA 2438207A1 CA 002438207 A CA002438207 A CA 002438207A CA 2438207 A CA2438207 A CA 2438207A CA 2438207 A1 CA2438207 A1 CA 2438207A1
- Authority
- CA
- Canada
- Prior art keywords
- bath
- gold
- compound
- bismuth
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000010931 gold Substances 0.000 title claims abstract description 69
- 229910052737 gold Inorganic materials 0.000 title claims abstract description 69
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 66
- 230000008021 deposition Effects 0.000 title claims abstract description 27
- 229910001020 Au alloy Inorganic materials 0.000 title claims abstract description 23
- 239000003353 gold alloy Substances 0.000 title claims abstract description 23
- 239000000654 additive Substances 0.000 claims abstract description 51
- 150000001622 bismuth compounds Chemical class 0.000 claims abstract description 45
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 30
- 150000001875 compounds Chemical class 0.000 claims abstract description 27
- SRCZENKQCOSNAI-UHFFFAOYSA-H gold(3+);trisulfite Chemical class [Au+3].[Au+3].[O-]S([O-])=O.[O-]S([O-])=O.[O-]S([O-])=O SRCZENKQCOSNAI-UHFFFAOYSA-H 0.000 claims abstract description 25
- 150000002739 metals Chemical class 0.000 claims abstract description 13
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims abstract description 6
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 claims abstract description 5
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 claims abstract description 5
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000000465 moulding Methods 0.000 claims description 37
- 238000004070 electrodeposition Methods 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 30
- 230000008569 process Effects 0.000 claims description 28
- 238000000151 deposition Methods 0.000 claims description 25
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 20
- 239000003795 chemical substances by application Substances 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
- 229910052802 copper Inorganic materials 0.000 claims description 15
- 239000010949 copper Substances 0.000 claims description 15
- 229910052787 antimony Inorganic materials 0.000 claims description 12
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 12
- 239000004033 plastic Substances 0.000 claims description 12
- 229920003023 plastic Polymers 0.000 claims description 12
- 229910052742 iron Inorganic materials 0.000 claims description 10
- 239000000470 constituent Substances 0.000 claims description 9
- 239000000919 ceramic Substances 0.000 claims description 8
- 229910052785 arsenic Inorganic materials 0.000 claims description 7
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 7
- 239000011505 plaster Substances 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- 239000010970 precious metal Substances 0.000 claims description 7
- NHFMFALCHGVCPP-UHFFFAOYSA-M azanium;gold(1+);sulfite Chemical group [NH4+].[Au+].[O-]S([O-])=O NHFMFALCHGVCPP-UHFFFAOYSA-M 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 150000002506 iron compounds Chemical class 0.000 claims description 4
- 239000013522 chelant Substances 0.000 claims description 3
- 239000012811 non-conductive material Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 150000003476 thallium compounds Chemical class 0.000 claims description 2
- 239000005749 Copper compound Substances 0.000 claims 2
- 150000001880 copper compounds Chemical class 0.000 claims 2
- 229910052797 bismuth Inorganic materials 0.000 abstract description 22
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 abstract description 22
- 230000008901 benefit Effects 0.000 abstract description 10
- 239000008139 complexing agent Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 21
- 230000000996 additive effect Effects 0.000 description 20
- 238000005516 engineering process Methods 0.000 description 11
- 150000001463 antimony compounds Chemical class 0.000 description 9
- 238000005868 electrolysis reaction Methods 0.000 description 7
- 238000010348 incorporation Methods 0.000 description 7
- 238000007792 addition Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- -1 oxides Chemical class 0.000 description 6
- 230000002411 adverse Effects 0.000 description 5
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 239000007943 implant Substances 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 150000002736 metal compounds Chemical class 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 229910052716 thallium Inorganic materials 0.000 description 4
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 4
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 230000036541 health Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002828 nitro derivatives Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 241000403354 Microplus Species 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- RDQSSKKUSGYZQB-UHFFFAOYSA-N bismuthanylidyneiron Chemical compound [Fe].[Bi] RDQSSKKUSGYZQB-UHFFFAOYSA-N 0.000 description 2
- 238000003889 chemical engineering Methods 0.000 description 2
- 210000003298 dental enamel Anatomy 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 229960001484 edetic acid Drugs 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 150000002343 gold Chemical class 0.000 description 2
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 2
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 2
- 239000006259 organic additive Substances 0.000 description 2
- UNKOHCAZUXZPIQ-UHFFFAOYSA-N oxoantimony;hydrate Chemical compound O.[Sb]=O UNKOHCAZUXZPIQ-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- IIQJBVZYLIIMND-UHFFFAOYSA-J potassium;antimony(3+);2,3-dihydroxybutanedioate Chemical compound [K+].[Sb+3].[O-]C(=O)C(O)C(O)C([O-])=O.[O-]C(=O)C(O)C(O)C([O-])=O IIQJBVZYLIIMND-UHFFFAOYSA-J 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000000080 wetting agent Substances 0.000 description 2
- FFRBMBIXVSCUFS-UHFFFAOYSA-N 2,4-dinitro-1-naphthol Chemical compound C1=CC=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FFRBMBIXVSCUFS-UHFFFAOYSA-N 0.000 description 1
- HTUCIKZVQXLMEZ-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetic acid;bismuth Chemical compound [Bi].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O HTUCIKZVQXLMEZ-UHFFFAOYSA-N 0.000 description 1
- LMSDCGXQALIMLM-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetic acid;iron Chemical compound [Fe].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O LMSDCGXQALIMLM-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229910001152 Bi alloy Inorganic materials 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 206010034960 Photophobia Diseases 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- QAAXRTPGRLVPFH-UHFFFAOYSA-N [Bi].[Cu] Chemical compound [Bi].[Cu] QAAXRTPGRLVPFH-UHFFFAOYSA-N 0.000 description 1
- QQRGDAKLEODQNU-UHFFFAOYSA-N [Bi].[Cu].[Au] Chemical group [Bi].[Cu].[Au] QQRGDAKLEODQNU-UHFFFAOYSA-N 0.000 description 1
- NCCQHYICMZBROO-UHFFFAOYSA-N [Fe].[Cu].[Bi] Chemical compound [Fe].[Cu].[Bi] NCCQHYICMZBROO-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000007815 allergy Effects 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- AUJJPYKPIQVRDH-UHFFFAOYSA-N antimony potassium Chemical compound [K].[Sb] AUJJPYKPIQVRDH-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- GABPAXJCPQEORA-UHFFFAOYSA-K azanium;gold(3+);disulfite Chemical class [NH4+].[Au+3].[O-]S([O-])=O.[O-]S([O-])=O GABPAXJCPQEORA-UHFFFAOYSA-K 0.000 description 1
- 150000001621 bismuth Chemical class 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 150000001923 cyclic compounds Chemical class 0.000 description 1
- 239000003564 dental alloy Substances 0.000 description 1
- 239000011351 dental ceramic Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical class [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 231100000086 high toxicity Toxicity 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- NPFOYSMITVOQOS-UHFFFAOYSA-K iron(III) citrate Chemical compound [Fe+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NPFOYSMITVOQOS-UHFFFAOYSA-K 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 208000013469 light sensitivity Diseases 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- KRZKNIQKJHKHPL-UHFFFAOYSA-J tripotassium;gold(1+);disulfite Chemical compound [K+].[K+].[K+].[Au+].[O-]S([O-])=O.[O-]S([O-])=O KRZKNIQKJHKHPL-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/48—Electroplating: Baths therefor from solutions of gold
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Dental Preparations (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2001110743 DE10110743A1 (de) | 2001-02-28 | 2001-02-28 | Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung |
DE10110743.9 | 2001-02-28 | ||
EP01108448A EP1236814A1 (de) | 2001-02-28 | 2001-04-04 | Bad zur galvanischen Abscheidung von Gold und Goldlegierungen sowie dessen Verwendung |
EP01108448.0 | 2001-04-04 | ||
PCT/EP2002/002128 WO2002068728A1 (de) | 2001-02-28 | 2002-02-28 | Bad zur galvanischen abscheidung von gold und goldlegierungen sowie dessen verwendung |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2438207A1 true CA2438207A1 (en) | 2002-09-06 |
Family
ID=26008695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002438207A Abandoned CA2438207A1 (en) | 2001-02-28 | 2002-02-28 | Bath for the galvanic deposition of gold and gold alloys, and the use thereof |
Country Status (8)
Country | Link |
---|---|
US (1) | US20040065225A1 (zh) |
EP (1) | EP1366219B1 (zh) |
JP (1) | JP4183240B2 (zh) |
CN (1) | CN100392155C (zh) |
AU (1) | AU2002308221A1 (zh) |
BR (1) | BR0207724A (zh) |
CA (1) | CA2438207A1 (zh) |
WO (1) | WO2002068728A1 (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1378590A1 (fr) * | 2002-07-04 | 2004-01-07 | Metalor Technologies International S.A. | Bain pour dépôts electrolytiques d'or |
WO2005079738A1 (en) * | 2004-02-18 | 2005-09-01 | Marianna Cooley | Antimicrobial formulations and methods of using the same |
CN1308493C (zh) * | 2004-07-27 | 2007-04-04 | 滕先弟 | 硫代硫酸金铵络合物及其制备方法 |
JP5442400B2 (ja) * | 2009-11-13 | 2014-03-12 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置の製造方法 |
CN101781758B (zh) * | 2010-04-09 | 2011-12-07 | 厦门华弘昌科技有限公司 | 化学镀镍稳定剂、化学镀镍溶液及化学镀镍工艺 |
US11579344B2 (en) | 2012-09-17 | 2023-02-14 | Government Of The United States Of America, As Represented By The Secretary Of Commerce | Metallic grating |
US10889908B2 (en) * | 2012-09-17 | 2021-01-12 | Government Of The United States Of America, As Represented By The Secretary Of Commerce | Superconformal filling composition and superconformally filling a recessed feature of an article |
ITFI20120208A1 (it) * | 2012-10-12 | 2014-04-13 | Bluclad S R L | Soluzione per l'elettrodeposizione di una lega di oro e la lega da essa derivante. |
ITFI20130057A1 (it) * | 2013-03-18 | 2014-09-19 | Bluclad S R L | Soluzione per l¿elettrodeposizione di una lega di oro e la lega da essa derivante. |
CN103938232B (zh) * | 2014-03-04 | 2015-04-01 | 深圳市联合蓝海新技术有限公司 | 一种无氰电镀液及其应用 |
CN103938231B (zh) * | 2014-03-04 | 2015-04-01 | 深圳市联合蓝海科技开发有限公司 | 一种电镀黄金的方法和硬质黄金的制备方法 |
CN104047037B (zh) * | 2014-06-16 | 2015-06-03 | 深圳市联合蓝海科技开发有限公司 | 一种硬化剂 |
CN104862752B (zh) * | 2015-06-12 | 2016-02-17 | 深圳市联合蓝海投资控股集团有限公司 | 改性无氰镀金液及其应用和硬质黄金的制备方法 |
DE112021008234T5 (de) * | 2021-09-16 | 2024-07-11 | P & S, Galvasols | Hochgeschwindigkeits-elektroformungs- /elektroplattierungsbad für reines gold |
JP7219847B1 (ja) | 2022-09-26 | 2023-02-08 | Eeja株式会社 | 金電気めっき液および金電気めっき方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE754151A (fr) * | 1969-08-08 | 1970-12-31 | Sel Rex Corp | Bain aqueux pour le placage electrolytique d'or ou d'alliage d'or sur un article conducteur, procede de fabrication dudit bain aqueux et utilisation de celui-ci |
CH622829A5 (zh) * | 1977-08-29 | 1981-04-30 | Systemes Traitements Surfaces | |
JP2592246B2 (ja) * | 1987-04-10 | 1997-03-19 | 株式会社ジーシー | 歯冠修復用複合冠の内側冠の作製方法及び装置 |
DE3805627A1 (de) * | 1988-02-24 | 1989-09-07 | Wieland Edelmetalle | Goldbad |
US5277790A (en) * | 1992-07-10 | 1994-01-11 | Technic Incorporated | Non-cyanide electroplating solution for gold or alloys thereof |
DE19629658C2 (de) * | 1996-07-23 | 1999-01-14 | Degussa | Cyanidfreies galvanisches Bad zur Abscheidung von Gold und Goldlegierungen |
DE19845506A1 (de) * | 1998-10-02 | 2000-04-06 | Wieland Edelmetalle | Verfahren zur Herstellung von prothetischen Formteilen für den Dentalbereich und prothetisches Formteil |
-
2002
- 2002-02-28 US US10/469,146 patent/US20040065225A1/en not_active Abandoned
- 2002-02-28 WO PCT/EP2002/002128 patent/WO2002068728A1/de active Application Filing
- 2002-02-28 AU AU2002308221A patent/AU2002308221A1/en not_active Abandoned
- 2002-02-28 EP EP02744906.5A patent/EP1366219B1/de not_active Expired - Lifetime
- 2002-02-28 CN CNB028056736A patent/CN100392155C/zh not_active Expired - Lifetime
- 2002-02-28 BR BR0207724-8A patent/BR0207724A/pt not_active Application Discontinuation
- 2002-02-28 JP JP2002568818A patent/JP4183240B2/ja not_active Expired - Fee Related
- 2002-02-28 CA CA002438207A patent/CA2438207A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20040065225A1 (en) | 2004-04-08 |
WO2002068728A1 (de) | 2002-09-06 |
EP1366219B1 (de) | 2014-09-03 |
BR0207724A (pt) | 2004-03-23 |
CN100392155C (zh) | 2008-06-04 |
EP1366219A2 (de) | 2003-12-03 |
JP4183240B2 (ja) | 2008-11-19 |
JP2004527653A (ja) | 2004-09-09 |
WO2002068728A8 (de) | 2003-09-18 |
CN1494606A (zh) | 2004-05-05 |
AU2002308221A1 (en) | 2002-09-12 |
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Legal Events
Date | Code | Title | Description |
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FZDE | Discontinued |