JP4170313B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP4170313B2 JP4170313B2 JP2005151624A JP2005151624A JP4170313B2 JP 4170313 B2 JP4170313 B2 JP 4170313B2 JP 2005151624 A JP2005151624 A JP 2005151624A JP 2005151624 A JP2005151624 A JP 2005151624A JP 4170313 B2 JP4170313 B2 JP 4170313B2
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Description
本発明の半導体装置の実施の一形態を、図2・3に基づいて説明すると以下の通りである。
<半導体装置の製造方法>
本発明の半導体装置の製造方法は、表面に半導体素子を備えた基板に対して、当該表面に開口部を有し、かつ内壁が導電層で覆われた凹部を形成する凹部形成工程と、上記凹部を充填材で充填する充填工程と、上記基板の裏面から上記導電材料を露出させる露出工程とを含めばよい。
2(2a,2b) 半導体素子形成領域
3(3a,3b) 第一絶縁膜
4(4a,4b) 第二絶縁膜
5(5a,5b) 導電層
7、70 フォトレジスト層
8 凹部
9(9a,9b) 充填材(芯部)
10(10a,10b) 半導体基板
11(11a,11b) 配線パターン(導電領域)
12(12a,12b) 接続用電極
13(13a,13b) 接続領域(第一接続領域)
15(15a,15b) 接続用端子(第二接続領域)
18 貫通孔
20(20a,20b) 半導体チップ(半導体装置)
21 マルチチップ半導体装置(積層型半導体装置)
Claims (3)
- その表面に半導体素子が設けられた基板に、該半導体素子と外部電極とを電気的に接続するための接続用電極を形成する接続用電極形成工程を含む半導体装置の製造方法であって、
上記接続用電極形成工程は、
基板表面に開口部を形成し、当該開口部周辺の当該基板表面を覆うことにより外部電極と接触する配線パターンとなり、該開口部の内壁を覆うことにより凹部となる導電層を形成する凹部形成工程と、
上記凹部形成工程の後、上記凹部に、非導電性材料を充填し、上記基板表面を覆っている上記導電層の表面を露出させた状態であって、且つ当該非導電性材料によって当該凹部が充填された状態を実現する充填工程と、
上記基板の裏面から、上記凹部の上記導電層を露出させる露出工程とを含み、
上記充填工程では、上記凹部に、当該凹部の空隙に合うように成型された固体の上記非導電性材料をはめ込むことを特徴とする半導体装置の製造方法。 - 上記露出工程は、上記基板の裏面を表面に向かって後退させることにより導電層を露出させることを特徴とする請求項1に記載の半導体装置の製造方法。
- 上記凹部形成工程は、メッキ法、CVD法、およびPVD法の少なくとも1つによって導電層を形成することを特徴とする請求項1または2に記載の半導体装置の製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005151624A JP4170313B2 (ja) | 2005-05-24 | 2005-05-24 | 半導体装置の製造方法 |
KR1020060044716A KR100815098B1 (ko) | 2005-05-24 | 2006-05-18 | 반도체 장치, 적층형 반도체 장치, 및 반도체 장치의 제조방법 |
US11/438,281 US20060267190A1 (en) | 2005-05-24 | 2006-05-23 | Semiconductor device, laminated semiconductor device, and method for producing semiconductor device |
TW095118360A TW200742030A (en) | 2005-05-24 | 2006-05-24 | Semiconductor device, laminated semiconductor device, and method for producing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005151624A JP4170313B2 (ja) | 2005-05-24 | 2005-05-24 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006332210A JP2006332210A (ja) | 2006-12-07 |
JP4170313B2 true JP4170313B2 (ja) | 2008-10-22 |
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JP2005151624A Expired - Fee Related JP4170313B2 (ja) | 2005-05-24 | 2005-05-24 | 半導体装置の製造方法 |
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Country | Link |
---|---|
US (1) | US20060267190A1 (ja) |
JP (1) | JP4170313B2 (ja) |
KR (1) | KR100815098B1 (ja) |
TW (1) | TW200742030A (ja) |
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CN100580911C (zh) * | 2005-10-20 | 2010-01-13 | 株式会社村田制作所 | 电路模块和使用该电路模块的电路装置 |
US7566657B2 (en) * | 2007-01-17 | 2009-07-28 | Hewlett-Packard Development Company, L.P. | Methods of forming through-substrate interconnects |
EP2096115A1 (en) * | 2008-02-26 | 2009-09-02 | Nestec S.A. | Oligosaccharide ingredient |
KR100984729B1 (ko) * | 2008-06-25 | 2010-10-01 | 앰코 테크놀로지 코리아 주식회사 | 반도체 장치 및 그 제조 방법 |
JP5331427B2 (ja) | 2008-09-29 | 2013-10-30 | 株式会社日立製作所 | 半導体装置 |
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US6809421B1 (en) * | 1996-12-02 | 2004-10-26 | Kabushiki Kaisha Toshiba | Multichip semiconductor device, chip therefor and method of formation thereof |
JP3920399B2 (ja) * | 1997-04-25 | 2007-05-30 | 株式会社東芝 | マルチチップ半導体装置用チップの位置合わせ方法、およびマルチチップ半導体装置の製造方法・製造装置 |
US6724638B1 (en) * | 1999-09-02 | 2004-04-20 | Ibiden Co., Ltd. | Printed wiring board and method of producing the same |
KR100512817B1 (ko) * | 2002-03-19 | 2005-09-06 | 세이코 엡슨 가부시키가이샤 | 반도체 장치와 그 제조방법, 회로 기판 및 전자 기기 |
TWI239629B (en) * | 2003-03-17 | 2005-09-11 | Seiko Epson Corp | Method of manufacturing semiconductor device, semiconductor device, circuit substrate and electronic apparatus |
TWI251313B (en) * | 2003-09-26 | 2006-03-11 | Seiko Epson Corp | Intermediate chip module, semiconductor device, circuit board, and electronic device |
JP3990347B2 (ja) * | 2003-12-04 | 2007-10-10 | ローム株式会社 | 半導体チップおよびその製造方法、ならびに半導体装置 |
US20060252262A1 (en) * | 2005-05-03 | 2006-11-09 | Rockwell Scientific Licensing, Llc | Semiconductor structures having via structures between planar frontside and backside surfaces and methods of fabricating the same |
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2005
- 2005-05-24 JP JP2005151624A patent/JP4170313B2/ja not_active Expired - Fee Related
-
2006
- 2006-05-18 KR KR1020060044716A patent/KR100815098B1/ko not_active IP Right Cessation
- 2006-05-23 US US11/438,281 patent/US20060267190A1/en not_active Abandoned
- 2006-05-24 TW TW095118360A patent/TW200742030A/zh unknown
Also Published As
Publication number | Publication date |
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US20060267190A1 (en) | 2006-11-30 |
JP2006332210A (ja) | 2006-12-07 |
KR100815098B1 (ko) | 2008-03-20 |
TW200742030A (en) | 2007-11-01 |
KR20060121687A (ko) | 2006-11-29 |
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