JP4146709B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP4146709B2
JP4146709B2 JP2002317607A JP2002317607A JP4146709B2 JP 4146709 B2 JP4146709 B2 JP 4146709B2 JP 2002317607 A JP2002317607 A JP 2002317607A JP 2002317607 A JP2002317607 A JP 2002317607A JP 4146709 B2 JP4146709 B2 JP 4146709B2
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JP
Japan
Prior art keywords
substrate
guard
processing liquid
guide
holding means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002317607A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004153078A (ja
JP2004153078A5 (enExample
Inventor
隆 河村
一樹 梶野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2002317607A priority Critical patent/JP4146709B2/ja
Priority to US10/659,213 priority patent/US7584760B2/en
Publication of JP2004153078A publication Critical patent/JP2004153078A/ja
Publication of JP2004153078A5 publication Critical patent/JP2004153078A5/ja
Application granted granted Critical
Publication of JP4146709B2 publication Critical patent/JP4146709B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2002317607A 2002-09-13 2002-10-31 基板処理装置 Expired - Fee Related JP4146709B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002317607A JP4146709B2 (ja) 2002-10-31 2002-10-31 基板処理装置
US10/659,213 US7584760B2 (en) 2002-09-13 2003-09-10 Substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002317607A JP4146709B2 (ja) 2002-10-31 2002-10-31 基板処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005312259A Division JP4272650B2 (ja) 2005-10-27 2005-10-27 基板処理装置

Publications (3)

Publication Number Publication Date
JP2004153078A JP2004153078A (ja) 2004-05-27
JP2004153078A5 JP2004153078A5 (enExample) 2005-12-15
JP4146709B2 true JP4146709B2 (ja) 2008-09-10

Family

ID=32460959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002317607A Expired - Fee Related JP4146709B2 (ja) 2002-09-13 2002-10-31 基板処理装置

Country Status (1)

Country Link
JP (1) JP4146709B2 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4488506B2 (ja) 2004-08-30 2010-06-23 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
KR100752246B1 (ko) 2005-03-31 2007-08-29 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치 및 기판처리방법
WO2006107549A1 (en) 2005-04-01 2006-10-12 Fsi International, Inc. Compact duct system incorporating moveable and nestable baffles for use in tools used to process microelectronic workpieces with one or more treatment fluids
KR100637719B1 (ko) 2005-10-05 2006-10-25 세메스 주식회사 기판 처리 장치
CN104319249B (zh) 2006-07-07 2017-11-07 Tel Fsi股份有限公司 用于处理微电子工件的设备
KR100872877B1 (ko) 2007-03-06 2008-12-10 세메스 주식회사 기판 처리 장치
KR101060664B1 (ko) 2007-08-07 2011-08-31 에프에스아이 인터내쇼날 인크. 하나 이상의 처리유체로 전자소자를 처리하는 장비의 배리어 판 및 벤튜리 시스템의 세정방법 및 관련 장치
KR101652270B1 (ko) 2008-05-09 2016-08-30 티이엘 에프에스아이, 인코포레이티드 개방 동작 모드와 폐쇄 동작 모드사이를 용이하게 변경하는 처리실 설계를 이용하여 마이크로일렉트로닉 워크피이스를 처리하는 장치 및 방법
KR101004432B1 (ko) * 2008-06-10 2010-12-28 세메스 주식회사 매엽식 기판 처리 장치
DE202010015018U1 (de) * 2010-11-07 2011-04-14 Bohnet, Hans Anordnung zur Herstellung von strukturierten Substraten
JP6713893B2 (ja) * 2016-09-26 2020-06-24 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN112936091A (zh) * 2021-02-09 2021-06-11 华海清科(北京)科技有限公司 一种抛光液防溅装置、化学机械抛光系统及抛光方法
CN116766046B (zh) * 2023-08-04 2025-08-01 上海集成电路装备材料产业创新中心有限公司 一种升降挡圈及同心校准方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3731995B2 (ja) * 1997-12-04 2006-01-05 大日本スクリーン製造株式会社 基板処理装置
JP3929192B2 (ja) * 1998-12-21 2007-06-13 大日本スクリーン製造株式会社 基板処理装置
JP3752136B2 (ja) * 2000-08-14 2006-03-08 東京エレクトロン株式会社 現像処理装置および現像処理方法
JP2002282764A (ja) * 2001-03-27 2002-10-02 Dainippon Screen Mfg Co Ltd 基板処理装置
JP4078163B2 (ja) * 2002-09-13 2008-04-23 大日本スクリーン製造株式会社 基板処理装置

Also Published As

Publication number Publication date
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