JP2004153078A5 - - Google Patents
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- JP2004153078A5 JP2004153078A5 JP2002317607A JP2002317607A JP2004153078A5 JP 2004153078 A5 JP2004153078 A5 JP 2004153078A5 JP 2002317607 A JP2002317607 A JP 2002317607A JP 2002317607 A JP2002317607 A JP 2002317607A JP 2004153078 A5 JP2004153078 A5 JP 2004153078A5
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Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002317607A JP4146709B2 (ja) | 2002-10-31 | 2002-10-31 | 基板処理装置 |
| US10/659,213 US7584760B2 (en) | 2002-09-13 | 2003-09-10 | Substrate processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002317607A JP4146709B2 (ja) | 2002-10-31 | 2002-10-31 | 基板処理装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005312259A Division JP4272650B2 (ja) | 2005-10-27 | 2005-10-27 | 基板処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004153078A JP2004153078A (ja) | 2004-05-27 |
| JP2004153078A5 true JP2004153078A5 (enExample) | 2005-12-15 |
| JP4146709B2 JP4146709B2 (ja) | 2008-09-10 |
Family
ID=32460959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002317607A Expired - Fee Related JP4146709B2 (ja) | 2002-09-13 | 2002-10-31 | 基板処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4146709B2 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7913706B2 (en) | 2007-08-07 | 2011-03-29 | Fsi International, Inc. | Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses |
| US8387635B2 (en) | 2006-07-07 | 2013-03-05 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
| US8656936B2 (en) | 2005-04-01 | 2014-02-25 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
| US8684015B2 (en) | 2008-05-09 | 2014-04-01 | Tel Fsi, Inc. | Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4488506B2 (ja) | 2004-08-30 | 2010-06-23 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
| KR100752246B1 (ko) | 2005-03-31 | 2007-08-29 | 다이닛뽕스크린 세이조오 가부시키가이샤 | 기판처리장치 및 기판처리방법 |
| KR100637719B1 (ko) | 2005-10-05 | 2006-10-25 | 세메스 주식회사 | 기판 처리 장치 |
| KR100872877B1 (ko) | 2007-03-06 | 2008-12-10 | 세메스 주식회사 | 기판 처리 장치 |
| KR101004432B1 (ko) * | 2008-06-10 | 2010-12-28 | 세메스 주식회사 | 매엽식 기판 처리 장치 |
| DE202010015018U1 (de) * | 2010-11-07 | 2011-04-14 | Bohnet, Hans | Anordnung zur Herstellung von strukturierten Substraten |
| JP6713893B2 (ja) * | 2016-09-26 | 2020-06-24 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
| CN112936091A (zh) * | 2021-02-09 | 2021-06-11 | 华海清科(北京)科技有限公司 | 一种抛光液防溅装置、化学机械抛光系统及抛光方法 |
| CN116766046B (zh) * | 2023-08-04 | 2025-08-01 | 上海集成电路装备材料产业创新中心有限公司 | 一种升降挡圈及同心校准方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3731995B2 (ja) * | 1997-12-04 | 2006-01-05 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP3929192B2 (ja) * | 1998-12-21 | 2007-06-13 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP3752136B2 (ja) * | 2000-08-14 | 2006-03-08 | 東京エレクトロン株式会社 | 現像処理装置および現像処理方法 |
| JP2002282764A (ja) * | 2001-03-27 | 2002-10-02 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JP4078163B2 (ja) * | 2002-09-13 | 2008-04-23 | 大日本スクリーン製造株式会社 | 基板処理装置 |
-
2002
- 2002-10-31 JP JP2002317607A patent/JP4146709B2/ja not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8656936B2 (en) | 2005-04-01 | 2014-02-25 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
| US8899248B2 (en) | 2005-04-01 | 2014-12-02 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
| US8387635B2 (en) | 2006-07-07 | 2013-03-05 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
| US8967167B2 (en) | 2006-07-07 | 2015-03-03 | Tel Fsi, Inc. | Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids |
| US8978675B2 (en) | 2006-07-07 | 2015-03-17 | Tel Fsi, Inc. | Method and apparatus for treating a workpiece with arrays of nozzles |
| US7913706B2 (en) | 2007-08-07 | 2011-03-29 | Fsi International, Inc. | Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses |
| US8684015B2 (en) | 2008-05-09 | 2014-04-01 | Tel Fsi, Inc. | Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation |
| US9039840B2 (en) | 2008-05-09 | 2015-05-26 | Tel Fsi, Inc. | Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation |