JP2004153078A5 - - Google Patents

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Publication number
JP2004153078A5
JP2004153078A5 JP2002317607A JP2002317607A JP2004153078A5 JP 2004153078 A5 JP2004153078 A5 JP 2004153078A5 JP 2002317607 A JP2002317607 A JP 2002317607A JP 2002317607 A JP2002317607 A JP 2002317607A JP 2004153078 A5 JP2004153078 A5 JP 2004153078A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002317607A
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JP2004153078A (ja
JP4146709B2 (ja
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Application filed filed Critical
Priority to JP2002317607A priority Critical patent/JP4146709B2/ja
Priority claimed from JP2002317607A external-priority patent/JP4146709B2/ja
Priority to US10/659,213 priority patent/US7584760B2/en
Publication of JP2004153078A publication Critical patent/JP2004153078A/ja
Publication of JP2004153078A5 publication Critical patent/JP2004153078A5/ja
Application granted granted Critical
Publication of JP4146709B2 publication Critical patent/JP4146709B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002317607A 2002-09-13 2002-10-31 基板処理装置 Expired - Fee Related JP4146709B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002317607A JP4146709B2 (ja) 2002-10-31 2002-10-31 基板処理装置
US10/659,213 US7584760B2 (en) 2002-09-13 2003-09-10 Substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002317607A JP4146709B2 (ja) 2002-10-31 2002-10-31 基板処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005312259A Division JP4272650B2 (ja) 2005-10-27 2005-10-27 基板処理装置

Publications (3)

Publication Number Publication Date
JP2004153078A JP2004153078A (ja) 2004-05-27
JP2004153078A5 true JP2004153078A5 (ja) 2005-12-15
JP4146709B2 JP4146709B2 (ja) 2008-09-10

Family

ID=32460959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002317607A Expired - Fee Related JP4146709B2 (ja) 2002-09-13 2002-10-31 基板処理装置

Country Status (1)

Country Link
JP (1) JP4146709B2 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7913706B2 (en) 2007-08-07 2011-03-29 Fsi International, Inc. Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses
US8656936B2 (en) 2005-04-01 2014-02-25 Tel Fsi, Inc. Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids
US8978675B2 (en) 2006-07-07 2015-03-17 Tel Fsi, Inc. Method and apparatus for treating a workpiece with arrays of nozzles

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4488506B2 (ja) 2004-08-30 2010-06-23 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
KR100752246B1 (ko) 2005-03-31 2007-08-29 다이닛뽕스크린 세이조오 가부시키가이샤 기판처리장치 및 기판처리방법
KR100637719B1 (ko) 2005-10-05 2006-10-25 세메스 주식회사 기판 처리 장치
KR100872877B1 (ko) 2007-03-06 2008-12-10 세메스 주식회사 기판 처리 장치
KR101690047B1 (ko) 2008-05-09 2016-12-27 티이엘 에프에스아이, 인코포레이티드 개방 동작 모드와 폐쇄 동작 모드사이를 용이하게 변경하는 처리실 설계를 이용하여 마이크로일렉트로닉 워크피이스를 처리하는 장치 및 방법
KR101004432B1 (ko) 2008-06-10 2010-12-28 세메스 주식회사 매엽식 기판 처리 장치
DE202010015018U1 (de) * 2010-11-07 2011-04-14 Bohnet, Hans Anordnung zur Herstellung von strukturierten Substraten
JP6713893B2 (ja) * 2016-09-26 2020-06-24 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN112936091A (zh) * 2021-02-09 2021-06-11 华海清科(北京)科技有限公司 一种抛光液防溅装置、化学机械抛光系统及抛光方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3731995B2 (ja) * 1997-12-04 2006-01-05 大日本スクリーン製造株式会社 基板処理装置
JP3929192B2 (ja) * 1998-12-21 2007-06-13 大日本スクリーン製造株式会社 基板処理装置
JP3752136B2 (ja) * 2000-08-14 2006-03-08 東京エレクトロン株式会社 現像処理装置および現像処理方法
JP2002282764A (ja) * 2001-03-27 2002-10-02 Dainippon Screen Mfg Co Ltd 基板処理装置
JP4078163B2 (ja) * 2002-09-13 2008-04-23 大日本スクリーン製造株式会社 基板処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8656936B2 (en) 2005-04-01 2014-02-25 Tel Fsi, Inc. Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids
US8899248B2 (en) 2005-04-01 2014-12-02 Tel Fsi, Inc. Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluids
US8978675B2 (en) 2006-07-07 2015-03-17 Tel Fsi, Inc. Method and apparatus for treating a workpiece with arrays of nozzles
US7913706B2 (en) 2007-08-07 2011-03-29 Fsi International, Inc. Rinsing methodologies for barrier plate and venturi containment systems in tools used to process microelectronic workpieces with one or more treatment fluids, and related apparatuses

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