JP4046269B2 - 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法 - Google Patents

有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法 Download PDF

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JP4046269B2
JP4046269B2 JP2002149634A JP2002149634A JP4046269B2 JP 4046269 B2 JP4046269 B2 JP 4046269B2 JP 2002149634 A JP2002149634 A JP 2002149634A JP 2002149634 A JP2002149634 A JP 2002149634A JP 4046269 B2 JP4046269 B2 JP 4046269B2
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vapor deposition
hole portion
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resist
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JP2003045657A5 (zh
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宏史 中川
和彦 井上
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Kyushu Hitachi Maxell Ltd
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JP2002149634A 2001-05-24 2002-05-23 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法 Expired - Fee Related JP4046269B2 (ja)

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JP2002149634A JP4046269B2 (ja) 2001-05-24 2002-05-23 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法

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JP2001-155997 2001-05-24
JP2001155997 2001-05-24
JP2002149634A JP4046269B2 (ja) 2001-05-24 2002-05-23 有機ｅｌ素子用蒸着マスクと有機ｅｌ素子用蒸着マスクの製造方法

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JP2003045657A5 JP2003045657A5 (zh) 2005-10-06
JP4046269B2 true JP4046269B2 (ja) 2008-02-13

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Families Citing this family (34)

* Cited by examiner, † Cited by third party
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JP3765314B2 (ja) 2004-03-31 2006-04-12 セイコーエプソン株式会社 マスク、マスクの製造方法、電気光学装置の製造方法および電子機器
KR100700660B1 (ko) 2005-04-06 2007-03-27 삼성에스디아이 주식회사 마스크 및 그의 제조 방법
JP4909152B2 (ja) * 2007-03-30 2012-04-04 キヤノン株式会社 蒸着装置及び蒸着方法
JP2008255449A (ja) * 2007-04-09 2008-10-23 Kyushu Hitachi Maxell Ltd 蒸着マスクとその製造方法
JP5228586B2 (ja) * 2008-04-09 2013-07-03 株式会社Ｓｕｍｃｏ 蒸着用マスク、ならびにそれを用いる蒸着パターン作製方法、半導体ウェーハ評価用試料の作製方法、半導体ウェーハの評価方法および半導体ウェーハの製造方法
JP2011074404A (ja) * 2009-09-29 2011-04-14 Nippon Seiki Co Ltd 蒸着用マスク
CN103205685A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 电铸掩模板
CN103205696A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀掩膜板
CN103205673A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀用掩模板的制备方法
CN103205709A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 有机发光显示器的蒸镀方法
CN103205675A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀用狭长沟槽掩模板的制备方法
CN103205712A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀用沟槽掩模板
CN103205678A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀用掩模板的制备方法
CN103205677A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀用沟槽掩模板的制备方法
CN103205670B (zh) * 2012-01-16 2017-03-15 昆山允升吉光电科技有限公司 用于掩模组件间接对位的系统
CN103205676A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 有机发光二极管蒸镀方法
CN103205679A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 有机电致发光二极管的蒸镀方法
KR101951029B1 (ko) * 2012-06-13 2019-04-26 삼성디스플레이 주식회사 증착용 마스크 및 이를 이용한 유기 발광 표시장치의 제조방법
KR101926580B1 (ko) * 2012-07-04 2018-12-10 엘지이노텍 주식회사 대면적 표시장치용 메탈마스크의 제조방법
CN103589996A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种掩模板
JP6409701B2 (ja) * 2013-11-14 2018-10-24 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、及び有機半導体素子の製造方法
JP5780350B2 (ja) * 2013-11-14 2015-09-16 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、及び有機半導体素子の製造方法
JP2015143375A (ja) * 2014-01-31 2015-08-06 ソニー株式会社 メタルマスクおよびその製造方法、ならびに表示装置の製造方法
JP6599103B2 (ja) * 2014-12-27 2019-10-30 マクセルホールディングス株式会社 蒸着マスク及びその製造方法
JP6688478B2 (ja) * 2015-02-10 2020-04-28 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
JP6728733B2 (ja) * 2015-02-10 2020-07-22 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
JP6425135B2 (ja) * 2015-04-07 2018-11-21 大日本印刷株式会社 蒸着マスクの製造方法
JP6624504B2 (ja) * 2015-12-03 2019-12-25 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
WO2017132907A1 (en) * 2016-02-03 2017-08-10 Applied Materials, Inc. A shadow mask with tapered openings formed by double electroforming
KR102130060B1 (ko) * 2017-10-11 2020-07-03 에이피에스홀딩스 주식회사 레이저 가공 방법
CN209210911U (zh) 2017-10-13 2019-08-06 凸版印刷株式会社 蒸镀掩模
JP7432133B2 (ja) * 2019-03-25 2024-02-16 大日本印刷株式会社 マスク
JP2019173181A (ja) * 2019-07-09 2019-10-10 大日本印刷株式会社 基板付蒸着マスク
JP6875480B2 (ja) * 2019-09-27 2021-05-26 マクセルホールディングス株式会社 蒸着マスク及びその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3295810B2 (ja) * 1993-06-03 2002-06-24 九州日立マクセル株式会社 ニッケル積層体並びにその製造方法
JPH07171965A (ja) * 1993-12-17 1995-07-11 Canon Inc インクジェットヘッドの製造方法及びそれを製造するための製造装置
JPH10298738A (ja) * 1997-04-21 1998-11-10 Mitsubishi Chem Corp シャドウマスク及び蒸着方法
JP3019095B1 (ja) * 1998-12-22 2000-03-13 日本電気株式会社 有機薄膜ｅｌデバイスの製造方法
JP2001110567A (ja) * 1999-10-08 2001-04-20 Toray Ind Inc 有機電界発光装置の製造方法

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