JP3967047B2 - ポジ型フォトレジスト組成物 - Google Patents

ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3967047B2
JP3967047B2 JP27533299A JP27533299A JP3967047B2 JP 3967047 B2 JP3967047 B2 JP 3967047B2 JP 27533299 A JP27533299 A JP 27533299A JP 27533299 A JP27533299 A JP 27533299A JP 3967047 B2 JP3967047 B2 JP 3967047B2
Authority
JP
Japan
Prior art keywords
group
acid
polysiloxane
structural unit
positive photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP27533299A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001100417A (ja
JP2001100417A5 (https=
Inventor
一良 水谷
昭一郎 安波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP27533299A priority Critical patent/JP3967047B2/ja
Priority to KR1020000054065A priority patent/KR100707767B1/ko
Priority to US09/671,177 priority patent/US6387590B1/en
Priority to TW089120118A priority patent/TWI225970B/zh
Publication of JP2001100417A publication Critical patent/JP2001100417A/ja
Priority to US10/020,958 priority patent/US6479213B2/en
Publication of JP2001100417A5 publication Critical patent/JP2001100417A5/ja
Application granted granted Critical
Publication of JP3967047B2 publication Critical patent/JP3967047B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP27533299A 1999-09-28 1999-09-28 ポジ型フォトレジスト組成物 Expired - Fee Related JP3967047B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP27533299A JP3967047B2 (ja) 1999-09-28 1999-09-28 ポジ型フォトレジスト組成物
KR1020000054065A KR100707767B1 (ko) 1999-09-28 2000-09-14 포지티브 포토레지스트 조성물
US09/671,177 US6387590B1 (en) 1999-09-28 2000-09-28 Positive photoresist composition
TW089120118A TWI225970B (en) 1999-09-28 2000-09-28 Positive-type photoresist composition
US10/020,958 US6479213B2 (en) 1999-09-28 2001-12-19 Positive photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27533299A JP3967047B2 (ja) 1999-09-28 1999-09-28 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001100417A JP2001100417A (ja) 2001-04-13
JP2001100417A5 JP2001100417A5 (https=) 2005-07-07
JP3967047B2 true JP3967047B2 (ja) 2007-08-29

Family

ID=17553999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27533299A Expired - Fee Related JP3967047B2 (ja) 1999-09-28 1999-09-28 ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3967047B2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4141625B2 (ja) * 2000-08-09 2008-08-27 東京応化工業株式会社 ポジ型レジスト組成物およびそのレジスト層を設けた基材
KR100801081B1 (ko) 2006-08-14 2008-02-05 삼성전자주식회사 비선형 실리콘 화합물, 이를 이용하여 올리고머 프로브어레이를 제조하는 방법, 이 화합물이 결합된 올리고머프로브 어레이용 기판 및 올리고머 프로브 어레이
KR101296551B1 (ko) 2007-02-09 2013-08-13 가부시키가이샤 닛폰 쇼쿠바이 실란 화합물, 그 제조 방법 및 실란 화합물을 포함하는 수지 조성물
CN101627043A (zh) * 2007-02-09 2010-01-13 株式会社日本触媒 硅烷化合物、其生产方法以及包含硅烷化合物的树脂组合物
JP2009286980A (ja) * 2008-06-02 2009-12-10 Nissan Chem Ind Ltd アルカリ可溶性樹脂及び感光性樹脂組成物
KR20160102538A (ko) * 2014-02-13 2016-08-30 후지필름 가부시키가이샤 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 액정 표시 장치, 유기 el 표시 장치, 터치 패널 표시 장치
JP6176163B2 (ja) * 2014-03-25 2017-08-09 信越化学工業株式会社 有機ケイ素化合物及び接着性組成物並びに物品
JP2015182978A (ja) * 2014-03-25 2015-10-22 信越化学工業株式会社 有機ケイ素化合物及び接着性組成物並びに物品
KR102515739B1 (ko) * 2022-12-07 2023-03-30 타코마테크놀러지 주식회사 감광성 수지 및 이를 포함하는 포토레지스트 조성물

Also Published As

Publication number Publication date
JP2001100417A (ja) 2001-04-13

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