JP2001100417A5 - - Google Patents
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- Publication number
- JP2001100417A5 JP2001100417A5 JP1999275332A JP27533299A JP2001100417A5 JP 2001100417 A5 JP2001100417 A5 JP 2001100417A5 JP 1999275332 A JP1999275332 A JP 1999275332A JP 27533299 A JP27533299 A JP 27533299A JP 2001100417 A5 JP2001100417 A5 JP 2001100417A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- structural unit
- positive photoresist
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 polysiloxane Polymers 0.000 claims 9
- 229920002120 photoresistant polymer Polymers 0.000 claims 7
- 239000002253 acid Substances 0.000 claims 6
- 229920001296 polysiloxane Polymers 0.000 claims 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 4
- 125000005647 linker group Chemical group 0.000 claims 4
- 125000000732 arylene group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 1
- 125000000524 functional group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27533299A JP3967047B2 (ja) | 1999-09-28 | 1999-09-28 | ポジ型フォトレジスト組成物 |
| KR1020000054065A KR100707767B1 (ko) | 1999-09-28 | 2000-09-14 | 포지티브 포토레지스트 조성물 |
| US09/671,177 US6387590B1 (en) | 1999-09-28 | 2000-09-28 | Positive photoresist composition |
| TW089120118A TWI225970B (en) | 1999-09-28 | 2000-09-28 | Positive-type photoresist composition |
| US10/020,958 US6479213B2 (en) | 1999-09-28 | 2001-12-19 | Positive photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27533299A JP3967047B2 (ja) | 1999-09-28 | 1999-09-28 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001100417A JP2001100417A (ja) | 2001-04-13 |
| JP2001100417A5 true JP2001100417A5 (https=) | 2005-07-07 |
| JP3967047B2 JP3967047B2 (ja) | 2007-08-29 |
Family
ID=17553999
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27533299A Expired - Fee Related JP3967047B2 (ja) | 1999-09-28 | 1999-09-28 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3967047B2 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4141625B2 (ja) * | 2000-08-09 | 2008-08-27 | 東京応化工業株式会社 | ポジ型レジスト組成物およびそのレジスト層を設けた基材 |
| KR100801081B1 (ko) | 2006-08-14 | 2008-02-05 | 삼성전자주식회사 | 비선형 실리콘 화합물, 이를 이용하여 올리고머 프로브어레이를 제조하는 방법, 이 화합물이 결합된 올리고머프로브 어레이용 기판 및 올리고머 프로브 어레이 |
| KR101296551B1 (ko) | 2007-02-09 | 2013-08-13 | 가부시키가이샤 닛폰 쇼쿠바이 | 실란 화합물, 그 제조 방법 및 실란 화합물을 포함하는 수지 조성물 |
| CN101627043A (zh) * | 2007-02-09 | 2010-01-13 | 株式会社日本触媒 | 硅烷化合物、其生产方法以及包含硅烷化合物的树脂组合物 |
| JP2009286980A (ja) * | 2008-06-02 | 2009-12-10 | Nissan Chem Ind Ltd | アルカリ可溶性樹脂及び感光性樹脂組成物 |
| KR20160102538A (ko) * | 2014-02-13 | 2016-08-30 | 후지필름 가부시키가이샤 | 감광성 수지 조성물, 경화막의 제조 방법, 경화막, 액정 표시 장치, 유기 el 표시 장치, 터치 패널 표시 장치 |
| JP6176163B2 (ja) * | 2014-03-25 | 2017-08-09 | 信越化学工業株式会社 | 有機ケイ素化合物及び接着性組成物並びに物品 |
| JP2015182978A (ja) * | 2014-03-25 | 2015-10-22 | 信越化学工業株式会社 | 有機ケイ素化合物及び接着性組成物並びに物品 |
| KR102515739B1 (ko) * | 2022-12-07 | 2023-03-30 | 타코마테크놀러지 주식회사 | 감광성 수지 및 이를 포함하는 포토레지스트 조성물 |
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1999
- 1999-09-28 JP JP27533299A patent/JP3967047B2/ja not_active Expired - Fee Related