JP3884887B2 - 描画用探針及びその製作方法 - Google Patents

描画用探針及びその製作方法 Download PDF

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Publication number
JP3884887B2
JP3884887B2 JP24133099A JP24133099A JP3884887B2 JP 3884887 B2 JP3884887 B2 JP 3884887B2 JP 24133099 A JP24133099 A JP 24133099A JP 24133099 A JP24133099 A JP 24133099A JP 3884887 B2 JP3884887 B2 JP 3884887B2
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JP
Japan
Prior art keywords
probe
conductive
layer
tip
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP24133099A
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English (en)
Japanese (ja)
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JP2001062791A5 (enExample
JP2001062791A (ja
Inventor
雅義 石橋
富博 橋詰
博司 梶山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
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Renesas Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Technology Corp filed Critical Renesas Technology Corp
Priority to JP24133099A priority Critical patent/JP3884887B2/ja
Priority to US09/616,076 priority patent/US7115863B1/en
Publication of JP2001062791A publication Critical patent/JP2001062791A/ja
Publication of JP2001062791A5 publication Critical patent/JP2001062791A5/ja
Application granted granted Critical
Publication of JP3884887B2 publication Critical patent/JP3884887B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2049—Exposure; Apparatus therefor using a cantilever
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00—Applications, other than SPM, of scanning-probe techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31752—Lithography using particular beams or near-field effects, e.g. STM-like techniques
    • H01J2237/31759—Lithography using particular beams or near-field effects, e.g. STM-like techniques using near-field effects, e.g. STM

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Micromachines (AREA)
  • Electron Beam Exposure (AREA)
  • Measuring Leads Or Probes (AREA)
JP24133099A 1999-08-27 1999-08-27 描画用探針及びその製作方法 Expired - Fee Related JP3884887B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP24133099A JP3884887B2 (ja) 1999-08-27 1999-08-27 描画用探針及びその製作方法
US09/616,076 US7115863B1 (en) 1999-08-27 2000-07-13 Probe for scanning probe lithography and making method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24133099A JP3884887B2 (ja) 1999-08-27 1999-08-27 描画用探針及びその製作方法

Publications (3)

Publication Number Publication Date
JP2001062791A JP2001062791A (ja) 2001-03-13
JP2001062791A5 JP2001062791A5 (enExample) 2004-11-11
JP3884887B2 true JP3884887B2 (ja) 2007-02-21

Family

ID=17072704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24133099A Expired - Fee Related JP3884887B2 (ja) 1999-08-27 1999-08-27 描画用探針及びその製作方法

Country Status (2)

Country Link
US (1) US7115863B1 (enExample)
JP (1) JP3884887B2 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4148517B2 (ja) * 2002-01-15 2008-09-10 インターナショナル・ビジネス・マシーンズ・コーポレーション 微細構造
US6975124B2 (en) * 2003-09-22 2005-12-13 International Business Machines Corp. Multipoint nanoprobe
FR2862156B1 (fr) * 2003-11-06 2007-01-05 Commissariat Energie Atomique Dispositif d'enregistrement de donnees a micro-pointes conductrices et procede de fabrication d'un tel dispositif
KR100612595B1 (ko) * 2004-01-05 2006-08-17 한국기계연구원 나노 압입 시험 기능을 갖는 ａｆｍ 캔틸레버
CN100389344C (zh) * 2004-03-27 2008-05-21 鸿富锦精密工业（深圳）有限公司 导光板模仁制造方法
US7602170B2 (en) * 2004-08-27 2009-10-13 Pioneer Corporation Probe, manufacturing method of the probe, recording apparatus, and reproducing apparatus
JP2007114033A (ja) * 2005-10-20 2007-05-10 Seiko Instruments Inc プローブ及び走査型プローブ顕微鏡並びにプローブの製造方法
US20070291623A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Cantilever with control of vertical and lateral position of contact probe tip
US20070290282A1 (en) * 2006-06-15 2007-12-20 Nanochip, Inc. Bonded chip assembly with a micro-mover for microelectromechanical systems
JP4680868B2 (ja) * 2006-11-20 2011-05-11 日本電信電話株式会社 走査型プローブ顕微鏡用探針
KR100869046B1 (ko) 2007-02-09 2008-11-18 한국기계연구원 Ａｆｍ 프로브
JP4798454B2 (ja) * 2007-02-19 2011-10-19 オリンパス株式会社 細胞内及び細胞間の微小空間計測用カンチレバーシステム
EP2077249A1 (en) * 2008-01-06 2009-07-08 Universiteit Twente A method for making a 3D nanostructure having a nanosubstructure, and an insulating pyramid having a metallic tip, a pyramid having a nano-apertures and horizontal and/or vertical nanowires obtainable by this method
JP5548914B2 (ja) * 2008-09-03 2014-07-16 株式会社リコー 加工用カンチレバー
JP5667350B2 (ja) * 2009-08-07 2015-02-12 株式会社神戸製鋼所 コンタクトプローブピン
JP5007383B2 (ja) 2010-01-29 2012-08-22 株式会社東芝 Ｍｅｍｓメモリ用マイクロプローブ
EP2754176A4 (en) * 2011-09-08 2015-04-15 Univ California SENSOR FOR DETECTING LOW NOISE IN LIQUIDS
CN102785209B (zh) * 2012-08-17 2015-07-08 上海齐迈五金有限公司 一种棘轮手柄
EP2835654A1 (en) * 2013-08-09 2015-02-11 Université de Genève Insulator coated conductive probe and method of production thereof
JP6448594B2 (ja) * 2016-09-13 2019-01-09 株式会社東芝 導電性プローブ、電気特性評価システム、走査型プローブ顕微鏡、導電性プローブ製造方法、及び、電気特性測定方法
WO2020240179A1 (en) * 2019-05-27 2020-12-03 Oxford University Innovation Limited Scanning probe lithography

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3010318B2 (ja) * 1991-02-26 2000-02-21 キヤノン株式会社 微小プローブ、その製造方法、該プローブを用いた表面観察装置及び情報処理装置
DE69114492T2 (de) * 1991-09-05 1996-06-20 International Business Machines Corp., Armonk, N.Y. Einheit mit mehreren Spitzen für ein Rastertunnelmikroskop, Verfahren für deren Herstellung und Anwendung derselben in einer Speichereinheit mit direktem Zugriff.
US5537863A (en) * 1993-07-15 1996-07-23 Nikon Corporation Scanning probe microscope having a cantilever used therein
JPH0854403A (ja) 1994-08-09 1996-02-27 Nissin Electric Co Ltd 複合顕微鏡の導電性カンチレバ−構造
JPH08129875A (ja) 1994-10-28 1996-05-21 Hewlett Packard Co <Hp> 導電性針の位置ずれを低減したプローブ装置
US5936237A (en) * 1995-07-05 1999-08-10 Van Der Weide; Daniel Warren Combined topography and electromagnetic field scanning probe microscope
DE69618627T2 (de) * 1996-03-13 2002-09-12 International Business Machines Corp., Armonk Auslegerstrukturen
JPH09251947A (ja) 1996-03-18 1997-09-22 Nikon Corp 微細加工装置
US6088320A (en) * 1997-02-19 2000-07-11 International Business Machines Corporation Micro-mechanically fabricated read/write head with a strengthening shell on the tip shaft
US5886922A (en) * 1997-05-07 1999-03-23 Hewlett-Packard Company Probe device for memory device having multiple cantilever probes
JP3643480B2 (ja) 1997-06-10 2005-04-27 株式会社日立製作所 描画装置
JPH1194863A (ja) 1997-09-12 1999-04-09 Nikon Corp カンチレバー及びその製造方法
US6014032A (en) * 1997-09-30 2000-01-11 International Business Machines Corporation Micro probe ring assembly and method of fabrication

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Publication number Publication date
US7115863B1 (en) 2006-10-03
JP2001062791A (ja) 2001-03-13

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