JP3832099B2 - バンプ形成用材料および配線形成用材料 - Google Patents

バンプ形成用材料および配線形成用材料 Download PDF

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Publication number
JP3832099B2
JP3832099B2 JP20923598A JP20923598A JP3832099B2 JP 3832099 B2 JP3832099 B2 JP 3832099B2 JP 20923598 A JP20923598 A JP 20923598A JP 20923598 A JP20923598 A JP 20923598A JP 3832099 B2 JP3832099 B2 JP 3832099B2
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Japan
Prior art keywords
meth
polymerizable compound
acrylate
radiation
methyl
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JP20923598A
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Japanese (ja)
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JP2000039709A (ja
JP2000039709A5 (enExample
Inventor
浩一 廣瀬
善行 道野
徹 木村
信吾 板井
利幸 大田
泰明 横山
穂積 佐藤
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JSR Corp
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JSR Corp
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Priority to JP20923598A priority Critical patent/JP3832099B2/ja
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Publication of JP2000039709A5 publication Critical patent/JP2000039709A5/ja
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  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP20923598A 1998-07-24 1998-07-24 バンプ形成用材料および配線形成用材料 Expired - Lifetime JP3832099B2 (ja)

Priority Applications (1)

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JP20923598A JP3832099B2 (ja) 1998-07-24 1998-07-24 バンプ形成用材料および配線形成用材料

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Application Number Priority Date Filing Date Title
JP20923598A JP3832099B2 (ja) 1998-07-24 1998-07-24 バンプ形成用材料および配線形成用材料

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JP2000039709A JP2000039709A (ja) 2000-02-08
JP2000039709A5 JP2000039709A5 (enExample) 2005-10-27
JP3832099B2 true JP3832099B2 (ja) 2006-10-11

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JP20923598A Expired - Lifetime JP3832099B2 (ja) 1998-07-24 1998-07-24 バンプ形成用材料および配線形成用材料

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Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3710717B2 (ja) 2001-03-06 2005-10-26 東京応化工業株式会社 厚膜用ポジ型ホトレジスト組成物、ホトレジスト膜およびこれを用いたバンプ形成方法
TWI242689B (en) * 2001-07-30 2005-11-01 Tokyo Ohka Kogyo Co Ltd Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same
JP4048791B2 (ja) * 2002-02-18 2008-02-20 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4300847B2 (ja) * 2003-04-01 2009-07-22 Ｊｓｒ株式会社 感光性樹脂膜およびこれからなる硬化膜
WO2005008338A1 (ja) * 2003-07-17 2005-01-27 Hitachi Chemical Co., Ltd. ネガ型感光性樹脂組成物及びネガ型感光性エレメント
JP4384570B2 (ja) 2003-12-01 2009-12-16 東京応化工業株式会社 厚膜用ホトレジスト組成物及びレジストパターンの形成方法
WO2005081064A1 (ja) * 2004-02-20 2005-09-01 Jsr Corporation バンプ形成用二層積層膜、およびバンプ形成方法
JP4539364B2 (ja) * 2004-02-20 2010-09-08 Ｊｓｒ株式会社 バンプ形成用樹脂組成物、バンプ形成用二層積層膜、およびバンプ形成方法
JP4360242B2 (ja) * 2004-03-24 2009-11-11 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物
JP4655840B2 (ja) * 2004-10-07 2011-03-23 Ｊｓｒ株式会社 マイクロレンズ形成用感放射線性樹脂組成物、マイクロレンズとその形成方法および液晶表示素子
CN1757670B (zh) * 2004-10-07 2011-07-06 Jsr株式会社 射线敏感性树脂组合物、微型透镜及其制造方法以及液晶显示元件
EP2202579A3 (en) 2004-12-03 2010-10-27 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified photoresist composition, photoresist laminated product, manufacturing method for photoresist composition, manufacturing method for photoresist pattern, and manufacturing method for connection element
JP2008020662A (ja) * 2006-07-13 2008-01-31 Jsr Corp 感放射線性ドライフィルム、それから形成される表示素子用レンズとその形成方法
JP4677967B2 (ja) * 2006-09-21 2011-04-27 Ｊｓｒ株式会社 ガラスエッチング用放射線硬化性レジスト樹脂組成物およびこれを用いたガラス基板の製造方法
JP5093226B2 (ja) * 2007-03-20 2012-12-12 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP2009244295A (ja) * 2008-03-28 2009-10-22 Jsr Corp プリント配線基板用感放射線性樹脂組成物
JP2013079292A (ja) * 2010-02-12 2013-05-02 Mitsui Chemicals Inc フェノール樹脂組成物、その硬化物および摩擦材
JP5742213B2 (ja) * 2010-12-27 2015-07-01 Jsr株式会社 隔壁形成用感光性組成物、電子ペーパー用隔壁の形成方法、電子ペーパー用隔壁及び電子ペーパー。
JP7470409B2 (ja) * 2020-08-31 2024-04-18 フジコピアン株式会社 ウェーハ加工用積層体、それを用いた薄型ウェーハの製造方法及び薄型ウェーハ個片化の製造方法
JP7470411B2 (ja) * 2020-09-30 2024-04-18 フジコピアン株式会社 ウェーハ加工用積層体、それを用いた薄型ウェーハの製造方法及び薄型ウェーハ個片化の製造方法
CN116400572A (zh) * 2023-04-11 2023-07-07 西陇科学股份有限公司 水系剥离液及制备方法和应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4106357A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit 2-diazo-1,3-dicarbonyl-gruppen, verfahren zu deren herstellung und verwendung in einem positiv arbeitenden aufzeichnungsmaterial
DE4112974A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JPH0643638A (ja) * 1992-03-17 1994-02-18 Fuji Photo Film Co Ltd 光重合性組成物
JPH0829980A (ja) * 1994-07-14 1996-02-02 Japan Synthetic Rubber Co Ltd 回路基板形成用アルカリ現像型フォトレジスト組成物
JPH0878318A (ja) * 1994-09-08 1996-03-22 Japan Synthetic Rubber Co Ltd アルカリ現像型フォトレジスト組成物
JPH0954435A (ja) * 1995-08-18 1997-02-25 Konica Corp 感光性組成物、感光性平版印刷版及びその製版方法
JPH0968801A (ja) * 1995-08-30 1997-03-11 Osaka Organic Chem Ind Ltd 感光性樹脂組成物
JPH10148937A (ja) * 1996-11-18 1998-06-02 Hitachi Chem Co Ltd 着色画像形成用感光液、これを用いたカラーフィルターの製造法及びカラーフィルター
JPH10161309A (ja) * 1996-11-26 1998-06-19 Fuji Photo Film Co Ltd 感光性樹脂組成物、感光性シート及び金属配線基板の製造方法
JP3541136B2 (ja) * 1997-12-19 2004-07-07 太陽インキ製造株式会社 アルカリ現像可能な光硬化性・熱硬化性組成物及びそれから得られる硬化皮膜
JP3659825B2 (ja) * 1997-12-19 2005-06-15 太陽インキ製造株式会社 アルカリ現像可能な光硬化性・熱硬化性組成物及びそれから得られる硬化皮膜

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