JP3645511B2 - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法 Download PDF

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Publication number
JP3645511B2
JP3645511B2 JP2001311540A JP2001311540A JP3645511B2 JP 3645511 B2 JP3645511 B2 JP 3645511B2 JP 2001311540 A JP2001311540 A JP 2001311540A JP 2001311540 A JP2001311540 A JP 2001311540A JP 3645511 B2 JP3645511 B2 JP 3645511B2
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JP
Japan
Prior art keywords
semiconductor device
leads
manufacturing
lead
semiconductor chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2001311540A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003124262A (ja
JP2003124262A5 (Direct
Inventor
信治 東條
伸弥 金光
誠一 市原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
Hitachi Solutions Technology Ltd
Original Assignee
Renesas Technology Corp
Hitachi ULSI Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Technology Corp, Hitachi ULSI Systems Co Ltd filed Critical Renesas Technology Corp
Priority to JP2001311540A priority Critical patent/JP3645511B2/ja
Priority to US10/242,720 priority patent/US6699737B2/en
Publication of JP2003124262A publication Critical patent/JP2003124262A/ja
Priority to US10/754,545 priority patent/US7262083B2/en
Publication of JP2003124262A5 publication Critical patent/JP2003124262A5/ja
Application granted granted Critical
Publication of JP3645511B2 publication Critical patent/JP3645511B2/ja
Priority to US11/882,199 priority patent/US7470568B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13452—Conductors connecting driver circuitry and terminals of panels

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Wire Bonding (AREA)
JP2001311540A 2001-10-09 2001-10-09 半導体装置の製造方法 Expired - Lifetime JP3645511B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2001311540A JP3645511B2 (ja) 2001-10-09 2001-10-09 半導体装置の製造方法
US10/242,720 US6699737B2 (en) 2001-10-09 2002-09-13 Method of manufacturing a semiconductor device
US10/754,545 US7262083B2 (en) 2001-10-09 2004-01-12 Method of manufacturing a semiconductor device
US11/882,199 US7470568B2 (en) 2001-10-09 2007-07-31 Method of manufacturing a semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001311540A JP3645511B2 (ja) 2001-10-09 2001-10-09 半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2004060490A Division JP4053507B2 (ja) 2004-03-04 2004-03-04 半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2003124262A JP2003124262A (ja) 2003-04-25
JP2003124262A5 JP2003124262A5 (Direct) 2005-02-10
JP3645511B2 true JP3645511B2 (ja) 2005-05-11

Family

ID=19130360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001311540A Expired - Lifetime JP3645511B2 (ja) 2001-10-09 2001-10-09 半導体装置の製造方法

Country Status (2)

Country Link
US (3) US6699737B2 (Direct)
JP (1) JP3645511B2 (Direct)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4137725B2 (ja) * 2002-07-10 2008-08-20 松下電器産業株式会社 接合部材の加工寸法決定方法および装置
US8665247B2 (en) 2003-05-30 2014-03-04 Global Oled Technology Llc Flexible display
JP4206320B2 (ja) 2003-09-19 2009-01-07 株式会社ルネサステクノロジ 半導体集積回路装置の製造方法
KR101022278B1 (ko) * 2003-12-15 2011-03-21 삼성전자주식회사 구동 칩 및 이를 갖는 표시장치
JP2005223202A (ja) 2004-02-06 2005-08-18 Seiko Epson Corp 半導体装置の製造方法及びその製造装置
JP4732894B2 (ja) * 2004-12-28 2011-07-27 セイコーインスツル株式会社 ボンディング方法及びボンディング装置
JP4708090B2 (ja) * 2005-05-20 2011-06-22 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP2008072024A (ja) * 2006-09-15 2008-03-27 Fujitsu Ltd 半導体装置の実装構造
JP4796610B2 (ja) * 2008-09-05 2011-10-19 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
JP5249178B2 (ja) * 2009-11-17 2013-07-31 シャープ株式会社 電子部品および表示モジュール
KR102465556B1 (ko) * 2017-12-08 2022-11-10 엘지디스플레이 주식회사 표시장치 구동용 필름 소자와 이를 이용한 표시장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6482673B2 (en) * 1996-10-17 2002-11-19 Seiko Epson Corporation Semiconductor device, method of making the same, circuit board, flexible substrate, and method of making substrate
JP3608205B2 (ja) * 1996-10-17 2005-01-05 セイコーエプソン株式会社 半導体装置及びその製造方法並びに回路基板
SG77652A1 (en) * 1998-03-18 2001-01-16 Hitachi Cable Semiconductor device lead-patterning substrate and electronics device and method for fabricating same
JP3357296B2 (ja) 1998-10-12 2002-12-16 松下電器産業株式会社 半導体装置及びその製造方法
JP2000357711A (ja) * 1999-06-15 2000-12-26 Sony Corp 半導体装置製造用治具および半導体装置の製造方法
US6774480B1 (en) * 1999-07-30 2004-08-10 Micron Technology, Inc. Method and structure for manufacturing improved yield semiconductor packaged devices
JP2001144144A (ja) 1999-11-11 2001-05-25 Mitsui Mining & Smelting Co Ltd 電子部品実装用フィルムキャリアテープ、その製造方法、電子部品実装用フィルムキャリアテープ包装体および保存・移送方法
US6475877B1 (en) * 1999-12-22 2002-11-05 General Electric Company Method for aligning die to interconnect metal on flex substrate
JP4152574B2 (ja) * 2000-09-25 2008-09-17 株式会社半導体エネルギー研究所 薄膜の成膜方法および半導体装置の製造方法

Also Published As

Publication number Publication date
US20080032453A1 (en) 2008-02-07
US7470568B2 (en) 2008-12-30
US20040142512A1 (en) 2004-07-22
JP2003124262A (ja) 2003-04-25
US7262083B2 (en) 2007-08-28
US6699737B2 (en) 2004-03-02
US20030068842A1 (en) 2003-04-10

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