JP3351790B2 - カラーフイルター用感光性樹脂組成物 - Google Patents

カラーフイルター用感光性樹脂組成物

Info

Publication number
JP3351790B2
JP3351790B2 JP51500894A JP51500894A JP3351790B2 JP 3351790 B2 JP3351790 B2 JP 3351790B2 JP 51500894 A JP51500894 A JP 51500894A JP 51500894 A JP51500894 A JP 51500894A JP 3351790 B2 JP3351790 B2 JP 3351790B2
Authority
JP
Japan
Prior art keywords
group
color filter
resin composition
photosensitive resin
hydrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP51500894A
Other languages
English (en)
Japanese (ja)
Inventor
良樹 日城
尚幹 竹山
茂樹 山本
Original Assignee
住友化学工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友化学工業株式会社 filed Critical 住友化学工業株式会社
Application granted granted Critical
Publication of JP3351790B2 publication Critical patent/JP3351790B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP51500894A 1992-12-24 1993-12-24 カラーフイルター用感光性樹脂組成物 Expired - Fee Related JP3351790B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP4-344337 1992-12-24
JP4-344336 1992-12-24
JP34433692 1992-12-24
JP34433792 1992-12-24
JP5-17694 1993-02-04
JP1769493 1993-02-04
JP1769393 1993-02-04
JP5-17693 1993-02-04
PCT/JP1993/001872 WO1994014892A1 (en) 1992-12-24 1993-12-24 Photosensitive resin composition for color filter

Publications (1)

Publication Number Publication Date
JP3351790B2 true JP3351790B2 (ja) 2002-12-03

Family

ID=27456822

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51500894A Expired - Fee Related JP3351790B2 (ja) 1992-12-24 1993-12-24 カラーフイルター用感光性樹脂組成物

Country Status (6)

Country Link
EP (1) EP0628599B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP3351790B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR100277054B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE69322499T2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW262542B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO1994014892A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3393919B2 (ja) * 1993-06-15 2003-04-07 住友化学工業株式会社 カラーフィルター形成用ポジ型レジスト組成物
JP3810538B2 (ja) * 1997-11-28 2006-08-16 富士写真フイルム株式会社 ポジ型画像形成材料
KR100725023B1 (ko) 2006-10-16 2007-06-07 제일모직주식회사 카도계 수지를 함유한 수지 조성물 및 그에 의한 패턴의 제조방법, 이를 이용한 컬러필터
KR100787729B1 (ko) * 2007-01-08 2007-12-24 제일모직주식회사 블랙 매트릭스용 수지 조성물, 블랙 매트릭스의 제조방법및 이를 이용한 컬러필터
KR100881860B1 (ko) 2007-01-17 2009-02-06 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터
KR100959187B1 (ko) 2007-10-18 2010-05-24 제일모직주식회사 컬러필터용 잉크 조성물, 이를 이용한 컬러필터의 제조방법, 및 이를 이용하여 제조된 컬러필터
CN101727003B (zh) 2008-10-24 2012-07-18 第一毛织株式会社 用于彩色滤光片的光敏树脂组合物以及使用其制备的彩色滤光片
KR101293787B1 (ko) 2010-07-28 2013-08-06 제일모직주식회사 난연성 및 내열성이 우수한 투명 열가소성 수지 조성물
CN102436142B (zh) 2010-09-29 2013-11-06 第一毛织株式会社 黑色光敏树脂组合物以及使用其的光阻层
KR101367253B1 (ko) 2010-10-13 2014-03-13 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR101351614B1 (ko) 2010-11-05 2014-02-17 제일모직주식회사 난연 내스크래치성 폴리카보네이트 수지 조성물
KR101443757B1 (ko) 2010-11-08 2014-09-25 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101453771B1 (ko) 2010-11-08 2014-10-23 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101486560B1 (ko) 2010-12-10 2015-01-27 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR101400193B1 (ko) 2010-12-10 2014-05-28 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101374360B1 (ko) 2010-12-14 2014-03-18 제일모직주식회사 난연 내스크래치성 폴리카보네이트 수지 조성물
KR101453769B1 (ko) 2010-12-24 2014-10-22 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 컬러 필터
KR20130002789A (ko) 2011-06-29 2013-01-08 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101400185B1 (ko) 2011-11-29 2014-06-19 제일모직 주식회사 컬러 필터용 감광성 수지 조성물 및 이를 이용하여 제조한 컬러 필터
KR101344786B1 (ko) 2011-12-02 2013-12-26 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20130072954A (ko) 2011-12-22 2013-07-02 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101674990B1 (ko) 2012-12-07 2016-11-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20140076320A (ko) 2012-12-12 2014-06-20 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 스페이서
KR101664121B1 (ko) 2012-12-13 2016-10-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20140083620A (ko) 2012-12-26 2014-07-04 제일모직주식회사 차광층용 감광성 수지 조성물 및 이를 이용한 차광층
KR101609634B1 (ko) 2012-12-26 2016-04-06 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR101656000B1 (ko) 2014-02-24 2016-09-08 제일모직 주식회사 감광성 수지 조성물, 이를 이용한 차광층 및 컬러필터
KR102154680B1 (ko) 2018-07-02 2020-09-10 삼성에스디아이 주식회사 양자점 함유 경화성 조성물, 이를 이용한 수지막 및 디스플레이 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4132553A (en) * 1977-03-24 1979-01-02 Polychrome Corporation Color proofing guide
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
EP0460416B1 (en) * 1990-06-05 1996-08-21 Sumitomo Chemical Company, Limited Positive resist composition
TW207009B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1991-01-31 1993-06-01 Sumitomo Chemical Co
CA2092774A1 (en) * 1992-04-10 1993-10-11 Yuji Ueda Positive photoresist composition

Also Published As

Publication number Publication date
TW262542B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1995-11-11
DE69322499D1 (de) 1999-01-21
EP0628599B1 (en) 1998-12-09
KR100277054B1 (ko) 2001-01-15
KR950700359A (ko) 1995-01-16
DE69322499T2 (de) 1999-04-29
EP0628599A4 (en) 1995-07-12
WO1994014892A1 (en) 1994-07-07
EP0628599A1 (en) 1994-12-14

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