KR950700359A - 칼라 필터용 감광성 수지 조성물(photosensitive resin composition for color filter) - Google Patents

칼라 필터용 감광성 수지 조성물(photosensitive resin composition for color filter)

Info

Publication number
KR950700359A
KR950700359A KR1019940702938A KR19940702938A KR950700359A KR 950700359 A KR950700359 A KR 950700359A KR 1019940702938 A KR1019940702938 A KR 1019940702938A KR 19940702938 A KR19940702938 A KR 19940702938A KR 950700359 A KR950700359 A KR 950700359A
Authority
KR
South Korea
Prior art keywords
resin composition
photosensitive resin
color filter
color
color filters
Prior art date
Application number
KR1019940702938A
Other languages
English (en)
Other versions
KR100277054B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR950700359A publication Critical patent/KR950700359A/ko
Application granted granted Critical
Publication of KR100277054B1 publication Critical patent/KR100277054B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1019940702938A 1992-12-24 1993-12-24 칼라 필터용 감광성 수지 조성물 KR100277054B1 (ko)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP34433692 1992-12-24
JP92-344337 1992-12-24
JP34433792 1992-12-24
JP92-344336 1992-12-24
JP93-17693 1993-02-04
JP1769393 1993-02-04
JP1769493 1993-02-04
JP93-17694 1993-02-04
PCT/JP1993/001872 WO1994014892A1 (en) 1992-12-24 1993-12-24 Photosensitive resin composition for color filter

Publications (2)

Publication Number Publication Date
KR950700359A true KR950700359A (ko) 1995-01-16
KR100277054B1 KR100277054B1 (ko) 2001-01-15

Family

ID=27456822

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940702938A KR100277054B1 (ko) 1992-12-24 1993-12-24 칼라 필터용 감광성 수지 조성물

Country Status (6)

Country Link
EP (1) EP0628599B1 (ko)
JP (1) JP3351790B2 (ko)
KR (1) KR100277054B1 (ko)
DE (1) DE69322499T2 (ko)
TW (1) TW262542B (ko)
WO (1) WO1994014892A1 (ko)

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100787729B1 (ko) * 2007-01-08 2007-12-24 제일모직주식회사 블랙 매트릭스용 수지 조성물, 블랙 매트릭스의 제조방법및 이를 이용한 컬러필터
US8216770B2 (en) 2006-10-16 2012-07-10 Cheil Industries Inc. Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
US8273270B2 (en) 2010-10-13 2012-09-25 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8277701B2 (en) 2010-11-08 2012-10-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using same
US8293149B2 (en) 2010-12-10 2012-10-23 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US8298454B2 (en) 2010-12-10 2012-10-30 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8303862B2 (en) 2010-11-08 2012-11-06 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using same
US8318053B2 (en) 2010-12-24 2012-11-27 Cheil Industries Inc. Photosensitive resin composition and color filter using the same
US8486591B2 (en) 2008-10-24 2013-07-16 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
US8513332B2 (en) 2007-10-18 2013-08-20 Cheil Industries Inc. Ink composition for color filter, method for preparing a color filter using the same, and color filter
US8715895B2 (en) 2011-12-22 2014-05-06 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US8735025B2 (en) 2007-01-17 2014-05-27 Cheil Industries Inc. Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition
US8758966B2 (en) 2011-11-29 2014-06-24 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
US8758654B1 (en) 2012-12-13 2014-06-24 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US8822110B2 (en) 2011-12-02 2014-09-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter including the same
US9005491B2 (en) 2011-06-29 2015-04-14 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US9017583B2 (en) 2012-12-26 2015-04-28 Cheil Industries Inc. Photosensitive resin composition, and light blocking layer and liquid crystal display using the same
US9069132B2 (en) 2012-12-26 2015-06-30 Cheil Industries Inc. Photosensitive resin composition for light blocking layer and light blocking layer using the same
US9127157B2 (en) 2010-11-05 2015-09-08 Cheil Industries Inc. Flame-retardant and scratch-resistant polycarbonate resin composition
US9340670B2 (en) 2010-12-14 2016-05-17 Cheil Industries Inc. Flame-retardant polycarbonate resin composition with scratch resistance
US9541675B2 (en) 2014-02-24 2017-01-10 Samsung Sdi Co., Ltd. Photosensitive resin composition, light blocking layer using the same, and color filter
US9587058B2 (en) 2010-07-28 2017-03-07 Samsung Sdi Co., Ltd. Transparent thermoplastic resin composition
US9864272B2 (en) 2012-12-07 2018-01-09 Samsung Sdi Co., Ltd. Photosensitive resin composition for color filter, and color filter using the same
US10876046B2 (en) 2018-07-02 2020-12-29 Samsung Sdi Co., Ltd. Curable composition including quantum dot, resin layer using the same and display device

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3393919B2 (ja) * 1993-06-15 2003-04-07 住友化学工業株式会社 カラーフィルター形成用ポジ型レジスト組成物
JP3810538B2 (ja) * 1997-11-28 2006-08-16 富士写真フイルム株式会社 ポジ型画像形成材料
CN102436142B (zh) 2010-09-29 2013-11-06 第一毛织株式会社 黑色光敏树脂组合物以及使用其的光阻层
KR20140076320A (ko) 2012-12-12 2014-06-20 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 스페이서

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4132553A (en) * 1977-03-24 1979-01-02 Polychrome Corporation Color proofing guide
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
DE69121475T2 (de) * 1990-06-05 1997-01-23 Sumitomo Chemical Co Positivresistzusammensetzung
TW207009B (ko) * 1991-01-31 1993-06-01 Sumitomo Chemical Co
CA2092774A1 (en) * 1992-04-10 1993-10-11 Yuji Ueda Positive photoresist composition

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216770B2 (en) 2006-10-16 2012-07-10 Cheil Industries Inc. Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
KR100787729B1 (ko) * 2007-01-08 2007-12-24 제일모직주식회사 블랙 매트릭스용 수지 조성물, 블랙 매트릭스의 제조방법및 이를 이용한 컬러필터
US8735025B2 (en) 2007-01-17 2014-05-27 Cheil Industries Inc. Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition
US8513332B2 (en) 2007-10-18 2013-08-20 Cheil Industries Inc. Ink composition for color filter, method for preparing a color filter using the same, and color filter
US8486591B2 (en) 2008-10-24 2013-07-16 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
US9587058B2 (en) 2010-07-28 2017-03-07 Samsung Sdi Co., Ltd. Transparent thermoplastic resin composition
US8273270B2 (en) 2010-10-13 2012-09-25 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US9127157B2 (en) 2010-11-05 2015-09-08 Cheil Industries Inc. Flame-retardant and scratch-resistant polycarbonate resin composition
US8303862B2 (en) 2010-11-08 2012-11-06 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using same
US8277701B2 (en) 2010-11-08 2012-10-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using same
US8298454B2 (en) 2010-12-10 2012-10-30 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8293149B2 (en) 2010-12-10 2012-10-23 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US9340670B2 (en) 2010-12-14 2016-05-17 Cheil Industries Inc. Flame-retardant polycarbonate resin composition with scratch resistance
US8318053B2 (en) 2010-12-24 2012-11-27 Cheil Industries Inc. Photosensitive resin composition and color filter using the same
US9005491B2 (en) 2011-06-29 2015-04-14 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US8758966B2 (en) 2011-11-29 2014-06-24 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter prepared using the same
US8822110B2 (en) 2011-12-02 2014-09-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter including the same
US8715895B2 (en) 2011-12-22 2014-05-06 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US9864272B2 (en) 2012-12-07 2018-01-09 Samsung Sdi Co., Ltd. Photosensitive resin composition for color filter, and color filter using the same
US8758654B1 (en) 2012-12-13 2014-06-24 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter using the same
US9017583B2 (en) 2012-12-26 2015-04-28 Cheil Industries Inc. Photosensitive resin composition, and light blocking layer and liquid crystal display using the same
US9069132B2 (en) 2012-12-26 2015-06-30 Cheil Industries Inc. Photosensitive resin composition for light blocking layer and light blocking layer using the same
US9541675B2 (en) 2014-02-24 2017-01-10 Samsung Sdi Co., Ltd. Photosensitive resin composition, light blocking layer using the same, and color filter
US10876046B2 (en) 2018-07-02 2020-12-29 Samsung Sdi Co., Ltd. Curable composition including quantum dot, resin layer using the same and display device

Also Published As

Publication number Publication date
KR100277054B1 (ko) 2001-01-15
TW262542B (ko) 1995-11-11
DE69322499D1 (de) 1999-01-21
EP0628599A1 (en) 1994-12-14
EP0628599B1 (en) 1998-12-09
EP0628599A4 (en) 1995-07-12
WO1994014892A1 (en) 1994-07-07
DE69322499T2 (de) 1999-04-29
JP3351790B2 (ja) 2002-12-03

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