JP3290339B2 - フルオロケイ酸塩ガラス層を形成する方法 - Google Patents

フルオロケイ酸塩ガラス層を形成する方法

Info

Publication number
JP3290339B2
JP3290339B2 JP25535295A JP25535295A JP3290339B2 JP 3290339 B2 JP3290339 B2 JP 3290339B2 JP 25535295 A JP25535295 A JP 25535295A JP 25535295 A JP25535295 A JP 25535295A JP 3290339 B2 JP3290339 B2 JP 3290339B2
Authority
JP
Japan
Prior art keywords
fluorine
precursor gas
forming
silicon
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25535295A
Other languages
English (en)
Japanese (ja)
Other versions
JPH08213388A (ja
Inventor
デビッド・マーク・ドブジンスキー
テツオ・マツダ
サン・バン・グエン
ジェームズ・ガードナー・ライアン
マイケル・シャピロ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
International Business Machines Corp
Original Assignee
Toshiba Corp
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, International Business Machines Corp filed Critical Toshiba Corp
Publication of JPH08213388A publication Critical patent/JPH08213388A/ja
Application granted granted Critical
Publication of JP3290339B2 publication Critical patent/JP3290339B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H10P14/6924—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • H10P14/6336—
    • H10P14/6923—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
JP25535295A 1994-09-30 1995-10-02 フルオロケイ酸塩ガラス層を形成する方法 Expired - Lifetime JP3290339B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/316,302 US5563105A (en) 1994-09-30 1994-09-30 PECVD method of depositing fluorine doped oxide using a fluorine precursor containing a glass-forming element
US316302 1994-09-30

Publications (2)

Publication Number Publication Date
JPH08213388A JPH08213388A (ja) 1996-08-20
JP3290339B2 true JP3290339B2 (ja) 2002-06-10

Family

ID=23228451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25535295A Expired - Lifetime JP3290339B2 (ja) 1994-09-30 1995-10-02 フルオロケイ酸塩ガラス層を形成する方法

Country Status (5)

Country Link
US (1) US5563105A (oth)
EP (1) EP0704885B1 (oth)
JP (1) JP3290339B2 (oth)
DE (1) DE69534699T2 (oth)
TW (1) TW279245B (oth)

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