JP2914555B2 - 半導体シリコンウェーハの洗浄方法 - Google Patents

半導体シリコンウェーハの洗浄方法

Info

Publication number
JP2914555B2
JP2914555B2 JP6205321A JP20532194A JP2914555B2 JP 2914555 B2 JP2914555 B2 JP 2914555B2 JP 6205321 A JP6205321 A JP 6205321A JP 20532194 A JP20532194 A JP 20532194A JP 2914555 B2 JP2914555 B2 JP 2914555B2
Authority
JP
Japan
Prior art keywords
wafer
hydrofluoric acid
cleaning
silicon wafer
semiconductor silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6205321A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0869990A (ja
Inventor
正己 中野
勇雄 内山
広行 高松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Priority to JP6205321A priority Critical patent/JP2914555B2/ja
Priority to US08/515,007 priority patent/US5665168A/en
Priority to DE69519460T priority patent/DE69519460T2/de
Priority to EP95305760A priority patent/EP0700077B1/en
Publication of JPH0869990A publication Critical patent/JPH0869990A/ja
Application granted granted Critical
Publication of JP2914555B2 publication Critical patent/JP2914555B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H10P70/15—

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
JP6205321A 1994-08-30 1994-08-30 半導体シリコンウェーハの洗浄方法 Expired - Fee Related JP2914555B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6205321A JP2914555B2 (ja) 1994-08-30 1994-08-30 半導体シリコンウェーハの洗浄方法
US08/515,007 US5665168A (en) 1994-08-30 1995-08-14 Method for cleaning semiconductor silicon wafer
DE69519460T DE69519460T2 (de) 1994-08-30 1995-08-17 Verfahren zur Reinigung eines Halbleiter-Wafers
EP95305760A EP0700077B1 (en) 1994-08-30 1995-08-17 Method of cleaning a semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6205321A JP2914555B2 (ja) 1994-08-30 1994-08-30 半導体シリコンウェーハの洗浄方法

Publications (2)

Publication Number Publication Date
JPH0869990A JPH0869990A (ja) 1996-03-12
JP2914555B2 true JP2914555B2 (ja) 1999-07-05

Family

ID=16505013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6205321A Expired - Fee Related JP2914555B2 (ja) 1994-08-30 1994-08-30 半導体シリコンウェーハの洗浄方法

Country Status (4)

Country Link
US (1) US5665168A (enExample)
EP (1) EP0700077B1 (enExample)
JP (1) JP2914555B2 (enExample)
DE (1) DE69519460T2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2760418B2 (ja) * 1994-07-29 1998-05-28 住友シチックス株式会社 半導体ウエーハの洗浄液及びこれを用いた半導体ウエーハの洗浄方法
JP3489329B2 (ja) * 1996-03-19 2004-01-19 信越半導体株式会社 シリコンウエーハ表面の処理方法
US6245155B1 (en) 1996-09-06 2001-06-12 Arch Specialty Chemicals, Inc. Method for removing photoresist and plasma etch residues
US5803980A (en) * 1996-10-04 1998-09-08 Texas Instruments Incorporated De-ionized water/ozone rinse post-hydrofluoric processing for the prevention of silicic acid residue
US6296714B1 (en) * 1997-01-16 2001-10-02 Mitsubishi Materials Silicon Corporation Washing solution of semiconductor substrate and washing method using the same
JP4001662B2 (ja) * 1997-06-27 2007-10-31 株式会社半導体エネルギー研究所 シリコンの洗浄方法および多結晶シリコンの作製方法
US5977041A (en) * 1997-09-23 1999-11-02 Olin Microelectronic Chemicals Aqueous rinsing composition
US5972802A (en) * 1997-10-07 1999-10-26 Seh America, Inc. Prevention of edge stain in silicon wafers by ozone dipping
US5837662A (en) * 1997-12-12 1998-11-17 Memc Electronic Materials, Inc. Post-lapping cleaning process for silicon wafers
AU6955698A (en) * 1998-04-06 1999-10-25 Olin Microelectronic Chemicals, Inc. Method for removing photoresist and plasma etch residues
US6277203B1 (en) 1998-09-29 2001-08-21 Lam Research Corporation Method and apparatus for cleaning low K dielectric and metal wafer surfaces
US6248704B1 (en) 1999-05-03 2001-06-19 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductors devices
DE19954356A1 (de) * 1999-11-11 2001-02-22 Wacker Siltronic Halbleitermat Verfahren zum Reinigen von Halbleiterscheiben
US6506254B1 (en) 2000-06-30 2003-01-14 Lam Research Corporation Semiconductor processing equipment having improved particle performance
US6890861B1 (en) * 2000-06-30 2005-05-10 Lam Research Corporation Semiconductor processing equipment having improved particle performance
DE10036691A1 (de) * 2000-07-27 2002-02-14 Wacker Siltronic Halbleitermat Verfahren zur chemischen Behandlung von Halbleiterscheiben
US6620743B2 (en) * 2001-03-26 2003-09-16 Asm America, Inc. Stable, oxide-free silicon surface preparation
US20050253313A1 (en) * 2004-05-14 2005-11-17 Poco Graphite, Inc. Heat treating silicon carbide articles
FR2886052B1 (fr) * 2005-05-19 2007-11-23 Soitec Silicon On Insulator Traitement de surface apres gravure selective
US7479460B2 (en) 2005-08-23 2009-01-20 Asm America, Inc. Silicon surface preparation
JP5428200B2 (ja) 2007-05-18 2014-02-26 三菱化学株式会社 半導体デバイス用基板洗浄液、半導体デバイス用基板の洗浄方法及び半導体デバイス用基板の製造方法
TWI619800B (zh) 2010-10-06 2018-04-01 恩特葛瑞斯股份有限公司 選擇性蝕刻金屬氮化物之組成物及方法
JP6686955B2 (ja) * 2017-03-29 2020-04-22 信越半導体株式会社 半導体ウェーハの洗浄方法
CN113441463A (zh) * 2021-01-21 2021-09-28 宣城睿晖宣晟企业管理中心合伙企业(有限合伙) 一种清洗方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039176A (ja) * 1983-08-10 1985-02-28 Daikin Ind Ltd エッチング剤組成物
US4711256A (en) * 1985-04-19 1987-12-08 Robert Kaiser Method and apparatus for removal of small particles from a surface
JPS6298127A (ja) 1985-10-22 1987-05-07 Matsushita Electric Works Ltd 暖房器
JPS62198127A (ja) * 1986-02-25 1987-09-01 Sanyo Electric Co Ltd 半導体ウエハの洗浄方法
US4749640A (en) * 1986-09-02 1988-06-07 Monsanto Company Integrated circuit manufacturing process
JPS63283028A (ja) * 1986-09-29 1988-11-18 Hashimoto Kasei Kogyo Kk 微細加工表面処理剤
US5181985A (en) * 1988-06-01 1993-01-26 Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh Process for the wet-chemical surface treatment of semiconductor wafers
US5277835A (en) * 1989-06-26 1994-01-11 Hashimoto Chemical Industries Co., Ltd. Surface treatment agent for fine surface treatment
DE4002327A1 (de) * 1990-01-26 1991-08-01 Wacker Chemitronic Verfahren zur nasschemischen behandlung von halbleiteroberflaechen und loesung zu seiner durchfuehrung
US5378317A (en) * 1990-10-09 1995-01-03 Chlorine Engineers Corp., Ltd. Method for removing organic film
US5397397A (en) * 1992-09-18 1995-03-14 Crestek, Inc. Method for cleaning and drying of metallic and nonmetallic surfaces
US5464480A (en) * 1993-07-16 1995-11-07 Legacy Systems, Inc. Process and apparatus for the treatment of semiconductor wafers in a fluid

Also Published As

Publication number Publication date
EP0700077A2 (en) 1996-03-06
DE69519460D1 (de) 2000-12-28
JPH0869990A (ja) 1996-03-12
EP0700077B1 (en) 2000-11-22
DE69519460T2 (de) 2001-03-29
EP0700077A3 (enExample) 1996-03-13
US5665168A (en) 1997-09-09

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