JP2025185145A5 - - Google Patents
Info
- Publication number
- JP2025185145A5 JP2025185145A5 JP2025172364A JP2025172364A JP2025185145A5 JP 2025185145 A5 JP2025185145 A5 JP 2025185145A5 JP 2025172364 A JP2025172364 A JP 2025172364A JP 2025172364 A JP2025172364 A JP 2025172364A JP 2025185145 A5 JP2025185145 A5 JP 2025185145A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- formula
- halogen atom
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019219638 | 2019-12-04 | ||
| JP2019219638 | 2019-12-04 | ||
| JP2021562606A JPWO2021111976A1 (enExample) | 2019-12-04 | 2020-11-26 | |
| PCT/JP2020/044034 WO2021111976A1 (ja) | 2019-12-04 | 2020-11-26 | ポリマーの製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021562606A Division JPWO2021111976A1 (enExample) | 2019-12-04 | 2020-11-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025185145A JP2025185145A (ja) | 2025-12-18 |
| JP2025185145A5 true JP2025185145A5 (enExample) | 2026-01-09 |
Family
ID=76221082
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021562606A Pending JPWO2021111976A1 (enExample) | 2019-12-04 | 2020-11-26 | |
| JP2025172364A Pending JP2025185145A (ja) | 2019-12-04 | 2025-10-14 | ポリマーの製造方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021562606A Pending JPWO2021111976A1 (enExample) | 2019-12-04 | 2020-11-26 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230103242A1 (enExample) |
| JP (2) | JPWO2021111976A1 (enExample) |
| KR (1) | KR20220112264A (enExample) |
| CN (1) | CN114746468B (enExample) |
| WO (1) | WO2021111976A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240162535A (ko) * | 2022-03-24 | 2024-11-15 | 닛산 가가쿠 가부시키가이샤 | 보호막 형성용 조성물 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7790356B2 (en) | 2004-04-09 | 2010-09-07 | Nissan Chemical Industries, Ltd. | Condensation type polymer-containing anti-reflective coating for semiconductor |
| WO2007066597A1 (ja) * | 2005-12-06 | 2007-06-14 | Nissan Chemical Industries, Ltd. | 光架橋硬化のレジスト下層膜を形成するためのケイ素含有レジスト下層膜形成組成物 |
| US8603733B2 (en) * | 2007-04-13 | 2013-12-10 | Fujifilm Corporation | Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method |
| JP4558064B2 (ja) * | 2007-05-15 | 2010-10-06 | 富士フイルム株式会社 | パターン形成方法 |
| US8476001B2 (en) * | 2007-05-15 | 2013-07-02 | Fujifilm Corporation | Pattern forming method |
| KR101423061B1 (ko) * | 2008-01-30 | 2014-07-25 | 닛산 가가쿠 고교 가부시키 가이샤 | 유황원자를 함유하는 레지스트 하층막 형성용 조성물 및 레지스트패턴의 형성방법 |
| JP2010078981A (ja) * | 2008-09-26 | 2010-04-08 | Nissan Chem Ind Ltd | リソグラフィープロセスに適用されるリンス液及び当該リンス液を用いたレジストパターンの形成方法 |
| JP2010169871A (ja) * | 2009-01-22 | 2010-08-05 | Jsr Corp | 樹脂組成物溶液の製造方法、及びタンク |
| JP2010204306A (ja) * | 2009-03-02 | 2010-09-16 | Jsr Corp | フォトレジスト用樹脂溶液の製造方法 |
| JP5522415B2 (ja) * | 2009-07-07 | 2014-06-18 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| WO2011013630A1 (ja) * | 2009-07-29 | 2011-02-03 | 日産化学工業株式会社 | ナノインプリント用レジスト下層膜形成組成物 |
| JP5757242B2 (ja) * | 2009-10-22 | 2015-07-29 | 日産化学工業株式会社 | ケイ素化合物を用いる膜形成組成物 |
| JP6137483B2 (ja) * | 2011-08-04 | 2017-05-31 | 日産化学工業株式会社 | 縮合系ポリマーを有するｅｕｖリソグラフィー用レジスト下層膜形成組成物 |
| JP6083537B2 (ja) * | 2012-03-23 | 2017-02-22 | 日産化学工業株式会社 | Ｅｕｖリソグラフィー用レジスト下層膜形成組成物 |
| WO2014208542A1 (ja) * | 2013-06-26 | 2014-12-31 | 日産化学工業株式会社 | 置換された架橋性化合物を含むレジスト下層膜形成組成物 |
| US10067423B2 (en) * | 2014-03-26 | 2018-09-04 | Nissan Chemical Industries, Ltd. | Additive and resist underlayer film-forming composition containing the same |
| KR102367638B1 (ko) * | 2014-03-31 | 2022-02-28 | 닛산 가가쿠 가부시키가이샤 | 방향족 비닐화합물이 부가된 노볼락수지를 포함하는 레지스트 하층막 형성 조성물 |
| US9910354B2 (en) * | 2014-04-25 | 2018-03-06 | Nissan Chemical Industries, Ltd. | Resist underlayer film-forming composition and method for forming resist pattern using the same |
| JP2016141796A (ja) * | 2015-02-05 | 2016-08-08 | 信越化学工業株式会社 | ポリマー、レジスト材料及びパターン形成方法 |
| KR101762005B1 (ko) * | 2015-07-20 | 2017-07-28 | 이근수 | 흡광 특성 및 용해도가 향상된 공중합체, 이를 포함하는 반사 방지막 형성용 조성물 및 이의 응용 |
| WO2017056805A1 (ja) * | 2015-09-30 | 2017-04-06 | 富士フイルム株式会社 | パターン形成方法、電子デバイスの製造方法、及び積層体 |
| JP2017203941A (ja) * | 2016-05-13 | 2017-11-16 | 日産化学工業株式会社 | 添加剤を含むリソグラフィー用レジスト下層膜形成組成物 |
| TWI758326B (zh) * | 2016-09-16 | 2022-03-21 | 日商日產化學工業股份有限公司 | 保護膜形成組成物 |
| JP6853716B2 (ja) * | 2017-03-31 | 2021-03-31 | 信越化学工業株式会社 | レジスト下層膜材料、パターン形成方法、及びレジスト下層膜形成方法 |
| KR102754672B1 (ko) * | 2017-05-02 | 2025-01-14 | 닛산 가가쿠 가부시키가이샤 | 과산화수소수용액에 대한 보호막형성 조성물 |
| US11287741B2 (en) * | 2017-05-02 | 2022-03-29 | Nissan Chemical Corporation | Resist underlayer film-forming composition |
-
2020
- 2020-11-26 JP JP2021562606A patent/JPWO2021111976A1/ja active Pending
- 2020-11-26 US US17/782,215 patent/US20230103242A1/en active Pending
- 2020-11-26 KR KR1020227021916A patent/KR20220112264A/ko active Pending
- 2020-11-26 WO PCT/JP2020/044034 patent/WO2021111976A1/ja not_active Ceased
- 2020-11-26 CN CN202080084090.0A patent/CN114746468B/zh active Active
-
2025
- 2025-10-14 JP JP2025172364A patent/JP2025185145A/ja active Pending