JP2024520171A5 - - Google Patents

Info

Publication number
JP2024520171A5
JP2024520171A5 JP2023575484A JP2023575484A JP2024520171A5 JP 2024520171 A5 JP2024520171 A5 JP 2024520171A5 JP 2023575484 A JP2023575484 A JP 2023575484A JP 2023575484 A JP2023575484 A JP 2023575484A JP 2024520171 A5 JP2024520171 A5 JP 2024520171A5
Authority
JP
Japan
Prior art keywords
molten
silicon
weir
plates
zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023575484A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024520171A (ja
JP7825644B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2022/065434 external-priority patent/WO2022258634A1/en
Publication of JP2024520171A publication Critical patent/JP2024520171A/ja
Publication of JP2024520171A5 publication Critical patent/JP2024520171A5/ja
Application granted granted Critical
Publication of JP7825644B2 publication Critical patent/JP7825644B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2023575484A 2021-06-07 2022-06-07 単結晶シリコンインゴットの成長中の石英プレートの使用 Active JP7825644B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163197726P 2021-06-07 2021-06-07
US63/197,726 2021-06-07
PCT/EP2022/065434 WO2022258634A1 (en) 2021-06-07 2022-06-07 Use of quartz plates during growth of single crystal silicon ingots

Publications (3)

Publication Number Publication Date
JP2024520171A JP2024520171A (ja) 2024-05-21
JP2024520171A5 true JP2024520171A5 (https=) 2025-06-05
JP7825644B2 JP7825644B2 (ja) 2026-03-06

Family

ID=82196672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023575484A Active JP7825644B2 (ja) 2021-06-07 2022-06-07 単結晶シリコンインゴットの成長中の石英プレートの使用

Country Status (7)

Country Link
US (1) US12146236B2 (https=)
EP (1) EP4352283B1 (https=)
JP (1) JP7825644B2 (https=)
KR (1) KR20240018581A (https=)
CN (1) CN117616160A (https=)
TW (1) TWI912531B (https=)
WO (1) WO2022258634A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12410538B2 (en) 2021-11-08 2025-09-09 Globalwafers Co., Ltd. Use of arrays of quartz particles during single crystal silicon ingot production

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU661966A1 (ru) * 1976-11-23 1980-04-05 Всесоюзный Научно-Исследовательский Институт Монокристаллов И Особо Чистых Химических Веществ "Вниимонокристалл" Устройство дл выт гивани монокристаллов из расплава
JPS59141578U (ja) 1983-03-09 1984-09-21 株式会社日立製作所 単結晶引上装置
JPS61146788A (ja) * 1984-12-20 1986-07-04 Fujitsu Ltd 単結晶成長法
JPH0825833B2 (ja) * 1990-04-27 1996-03-13 東芝セラミックス株式会社 シリコン単結晶の製造方法
JPH0724976U (ja) * 1993-10-22 1995-05-12 川崎製鉄株式会社 シリコン単結晶製造装置
JP3769800B2 (ja) * 1996-01-12 2006-04-26 株式会社Sumco 単結晶引上装置
US7635414B2 (en) 2003-11-03 2009-12-22 Solaicx, Inc. System for continuous growing of monocrystalline silicon
WO2016179022A1 (en) * 2015-05-01 2016-11-10 Sunedison, Inc. Methods for producing single crystal ingots doped with volatile dopants
US20180291524A1 (en) * 2015-05-01 2018-10-11 Corner Star Limited Methods for producing single crystal ingots doped with volatile dopants
CN108350600A (zh) * 2015-11-18 2018-07-31 各星有限公司 将从单晶锭切割的单晶段再循环的方法
KR20170081499A (ko) * 2016-01-04 2017-07-12 주식회사 엘지실트론 단결정 잉곳 성장장치 및 이에 적용된 진동 방지판
US10221500B2 (en) 2017-01-04 2019-03-05 Corner Star Limited System for forming an ingot including crucible and conditioning members
US10407797B2 (en) 2017-05-04 2019-09-10 Corner Start Limited Crystal pulling system and method including crucible and barrier
WO2022103416A1 (en) 2020-11-11 2022-05-19 Globalwafers Co., Ltd. Methods for forming a single crystal silicon ingot with reduced crucible erosion
US11499245B2 (en) 2020-12-30 2022-11-15 Globalwafers Co., Ltd. Additive feed systems, ingot puller apparatus and methods for forming a single crystal silicon ingot with use of such additive feed systems
US11767610B2 (en) 2020-12-31 2023-09-26 Globalwafers Co., Ltd. Use of buffer members during growth of single crystal silicon ingots

Similar Documents

Publication Publication Date Title
SG182094A1 (en) Method for recharging raw material polycrystalline silicon
JP4203603B2 (ja) 半導体バルク多結晶の作製方法
CN102644108A (zh) 一种铸造法生长硅晶体的装料方法以及生长硅晶体的工艺
JPH01215788A (ja) 結晶引上げ方法
CN102797036B (zh) 多晶硅锭及其制造方法、太阳能电池
JP2024520171A5 (https=)
KR20120075427A (ko) 실리콘 단결정 잉곳을 제조하는 방법
CN101831696B (zh) 硅单晶的生长方法
JP4060106B2 (ja) 一方向凝固シリコンインゴット及びこの製造方法並びにシリコン板及び太陽電池用基板及びスパッタリング用ターゲット素材
JPH06227891A (ja) シリコン単結晶引上げ用ルツボ
JP7825644B2 (ja) 単結晶シリコンインゴットの成長中の石英プレートの使用
JP3648703B2 (ja) 化合物半導体単結晶の製造方法
KR100530889B1 (ko) 실리콘 카바이드 단결정 제조용 흑연 도가니
JP5167942B2 (ja) シリコン単結晶の製造方法
JP4344021B2 (ja) InP単結晶の製造方法
JP2025500603A5 (https=)
CN103097291B (zh) 硅锭制造用容器及硅锭的制造方法
CN110965119A (zh) 一种用于铸造单晶的坩埚石墨平台结构
JP2018504359A (ja) 多結晶シリコンの製造方法
CN111647941B (zh) 一种籽晶铺设方法及类单晶硅锭的制备方法和由其制得的类单晶硅锭
CN1766179B (zh) 一种高质量单晶的生长方法
JPH0733303B2 (ja) 結晶成長装置
JP2000154089A (ja) るつぼ壁面被覆用b2o3材料及びその製造方法並びに、それを用いた単結晶製造方法及びその方法により製造された単結晶
JPH0316989A (ja) シリコン単結晶の製造装置
JP2007254162A (ja) 単結晶製造装置およびリチャージ方法