KR20240018581A - 단결정 실리콘 잉곳들의 성장 동안의 석영 플레이트들의 사용 - Google Patents

단결정 실리콘 잉곳들의 성장 동안의 석영 플레이트들의 사용 Download PDF

Info

Publication number
KR20240018581A
KR20240018581A KR1020247000242A KR20247000242A KR20240018581A KR 20240018581 A KR20240018581 A KR 20240018581A KR 1020247000242 A KR1020247000242 A KR 1020247000242A KR 20247000242 A KR20247000242 A KR 20247000242A KR 20240018581 A KR20240018581 A KR 20240018581A
Authority
KR
South Korea
Prior art keywords
melt
plates
silicon
zone
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247000242A
Other languages
English (en)
Korean (ko)
Inventor
마테오 파노치아
프란체스카 마르케세
파올로 토시
Original Assignee
글로벌웨이퍼스 씨오., 엘티디.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 글로벌웨이퍼스 씨오., 엘티디. filed Critical 글로벌웨이퍼스 씨오., 엘티디.
Publication of KR20240018581A publication Critical patent/KR20240018581A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/14Heating of the melt or the crystallised materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/002Continuous growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • C30B15/12Double crucible methods
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1020247000242A 2021-06-07 2022-06-07 단결정 실리콘 잉곳들의 성장 동안의 석영 플레이트들의 사용 Pending KR20240018581A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163197726P 2021-06-07 2021-06-07
US63/197,726 2021-06-07
PCT/EP2022/065434 WO2022258634A1 (en) 2021-06-07 2022-06-07 Use of quartz plates during growth of single crystal silicon ingots

Publications (1)

Publication Number Publication Date
KR20240018581A true KR20240018581A (ko) 2024-02-13

Family

ID=82196672

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247000242A Pending KR20240018581A (ko) 2021-06-07 2022-06-07 단결정 실리콘 잉곳들의 성장 동안의 석영 플레이트들의 사용

Country Status (7)

Country Link
US (1) US12146236B2 (https=)
EP (1) EP4352283B1 (https=)
JP (1) JP7825644B2 (https=)
KR (1) KR20240018581A (https=)
CN (1) CN117616160A (https=)
TW (1) TWI912531B (https=)
WO (1) WO2022258634A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12410538B2 (en) 2021-11-08 2025-09-09 Globalwafers Co., Ltd. Use of arrays of quartz particles during single crystal silicon ingot production

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU661966A1 (ru) * 1976-11-23 1980-04-05 Всесоюзный Научно-Исследовательский Институт Монокристаллов И Особо Чистых Химических Веществ "Вниимонокристалл" Устройство дл выт гивани монокристаллов из расплава
JPS59141578U (ja) 1983-03-09 1984-09-21 株式会社日立製作所 単結晶引上装置
JPS61146788A (ja) * 1984-12-20 1986-07-04 Fujitsu Ltd 単結晶成長法
JPH0825833B2 (ja) * 1990-04-27 1996-03-13 東芝セラミックス株式会社 シリコン単結晶の製造方法
JPH0724976U (ja) * 1993-10-22 1995-05-12 川崎製鉄株式会社 シリコン単結晶製造装置
JP3769800B2 (ja) * 1996-01-12 2006-04-26 株式会社Sumco 単結晶引上装置
US7635414B2 (en) 2003-11-03 2009-12-22 Solaicx, Inc. System for continuous growing of monocrystalline silicon
WO2016179022A1 (en) * 2015-05-01 2016-11-10 Sunedison, Inc. Methods for producing single crystal ingots doped with volatile dopants
US20180291524A1 (en) * 2015-05-01 2018-10-11 Corner Star Limited Methods for producing single crystal ingots doped with volatile dopants
CN108350600A (zh) * 2015-11-18 2018-07-31 各星有限公司 将从单晶锭切割的单晶段再循环的方法
KR20170081499A (ko) * 2016-01-04 2017-07-12 주식회사 엘지실트론 단결정 잉곳 성장장치 및 이에 적용된 진동 방지판
US10221500B2 (en) 2017-01-04 2019-03-05 Corner Star Limited System for forming an ingot including crucible and conditioning members
US10407797B2 (en) 2017-05-04 2019-09-10 Corner Start Limited Crystal pulling system and method including crucible and barrier
WO2022103416A1 (en) 2020-11-11 2022-05-19 Globalwafers Co., Ltd. Methods for forming a single crystal silicon ingot with reduced crucible erosion
US11499245B2 (en) 2020-12-30 2022-11-15 Globalwafers Co., Ltd. Additive feed systems, ingot puller apparatus and methods for forming a single crystal silicon ingot with use of such additive feed systems
US11767610B2 (en) 2020-12-31 2023-09-26 Globalwafers Co., Ltd. Use of buffer members during growth of single crystal silicon ingots

Also Published As

Publication number Publication date
WO2022258634A1 (en) 2022-12-15
EP4352283A1 (en) 2024-04-17
JP2024520171A (ja) 2024-05-21
CN117616160A (zh) 2024-02-27
US12146236B2 (en) 2024-11-19
TWI912531B (zh) 2026-01-21
TW202248470A (zh) 2022-12-16
US20220389609A1 (en) 2022-12-08
JP7825644B2 (ja) 2026-03-06
EP4352283B1 (en) 2025-03-12

Similar Documents

Publication Publication Date Title
KR102939619B1 (ko) 단결정 실리콘 잉곳들의 성장 중의 버퍼 부재들의 사용
EP1025288B1 (en) Process for preparing a silicon melt from a polysilicon charge
EP0170856B1 (en) Process for growing monocrystals of semiconductor materials from shallow crucibles by czochralski technique
CN101135061B (zh) 用于将固体原材料供应至单晶生长器的装置和方法
KR102658843B1 (ko) 연속 쵸크랄스키 방법을 사용하여 질소 도핑된 단결정 실리콘 잉곳을 성장시키기 위한 방법들 및 이 방법에 의해 성장되는 단결정 실리콘 잉곳
CN1206755A (zh) 通过控制拉速分布制造单晶硅锭和晶片的方法及其产品
CN101076618A (zh) 用于单晶硅连续生长的系统
JPH0676274B2 (ja) シリコン単結晶の製造装置
CN1608147A (zh) 用于拉晶机的热屏蔽组件
KR20240018581A (ko) 단결정 실리콘 잉곳들의 성장 동안의 석영 플레이트들의 사용
TW202328509A (zh) 用於涉及矽進料管之惰性氣體控制之單晶矽錠生長之方法
CN116783333B (zh) 用于以连续直拉法生长单晶硅锭的方法
US11866845B2 (en) Methods for growing single crystal silicon ingots that involve silicon feed tube inert gas control
US12037698B2 (en) Ingot puller apparatus having a flange that extends from the funnel or from the silicon feed tube
KR20240100412A (ko) 단결정 실리콘 잉곳 제조 동안의 석영 입자 어레이의 사용

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D16-exm-PA0302

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701