JP2024516479A - 光硬化性組成物 - Google Patents

光硬化性組成物 Download PDF

Info

Publication number
JP2024516479A
JP2024516479A JP2023546542A JP2023546542A JP2024516479A JP 2024516479 A JP2024516479 A JP 2024516479A JP 2023546542 A JP2023546542 A JP 2023546542A JP 2023546542 A JP2023546542 A JP 2023546542A JP 2024516479 A JP2024516479 A JP 2024516479A
Authority
JP
Japan
Prior art keywords
photocurable composition
monomer
photocurable
substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023546542A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024516479A5 (https=
JPWO2022231753A5 (https=
Inventor
フェン ワン，
ウェイジュン リウ，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of JP2024516479A publication Critical patent/JP2024516479A/ja
Publication of JP2024516479A5 publication Critical patent/JP2024516479A5/ja
Publication of JPWO2022231753A5 publication Critical patent/JPWO2022231753A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/71—Monoisocyanates or monoisothiocyanates
    • C08G18/711—Monoisocyanates or monoisothiocyanates containing oxygen in addition to isocyanate oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
    • C08F212/26—Nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/673—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing two or more acrylate or alkylacrylate ester groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/71—Monoisocyanates or monoisothiocyanates
    • C08G18/712—Monoisocyanates or monoisothiocyanates containing halogens
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/71—Monoisocyanates or monoisothiocyanates
    • C08G18/714—Monoisocyanates or monoisothiocyanates containing nitrogen in addition to isocyanate or isothiocyanate nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397—Phosphine oxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Laminated Bodies (AREA)
JP2023546542A 2021-04-29 2022-03-30 光硬化性組成物 Pending JP2024516479A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/244,508 US11753497B2 (en) 2021-04-29 2021-04-29 Photocurable composition
US17/244,508 2021-04-29
PCT/US2022/022536 WO2022231753A1 (en) 2021-04-29 2022-03-30 Photocurable composition

Publications (3)

Publication Number Publication Date
JP2024516479A true JP2024516479A (ja) 2024-04-16
JP2024516479A5 JP2024516479A5 (https=) 2025-04-04
JPWO2022231753A5 JPWO2022231753A5 (https=) 2025-04-04

Family

ID=83847288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023546542A Pending JP2024516479A (ja) 2021-04-29 2022-03-30 光硬化性組成物

Country Status (5)

Country Link
US (1) US11753497B2 (https=)
JP (1) JP2024516479A (https=)
KR (1) KR102899614B1 (https=)
TW (1) TWI833173B (https=)
WO (1) WO2022231753A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008138160A (ja) * 2006-11-08 2008-06-19 Sumitomo Osaka Cement Co Ltd ハードコート膜形成用塗料とハードコート膜及びハードコート膜付きプラスチック基材並びにポリビニル樹脂組成物の製造方法
JP2016002683A (ja) * 2014-06-16 2016-01-12 コニカミノルタ株式会社 ３ｄ造形物の製造方法、３ｄ造形用光硬化性組成物および３ｄ造形用インクセット
JP2019108535A (ja) * 2017-12-15 2019-07-04 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 熱成形可能なハードコート用途のためのｕｖ−硬化アクリル樹脂組成物
JP2019183031A (ja) * 2018-04-12 2019-10-24 積水化学工業株式会社 接着剤樹脂組成物
JP2020532631A (ja) * 2017-09-22 2020-11-12 エルジー・ケム・リミテッド 偏光板保護層用の無溶剤型光硬化性樹脂組成物、これの硬化物を含む偏光板及び画像表示装置
JP2021050332A (ja) * 2019-09-23 2021-04-01 キヤノン株式会社 ナノファブリケーション用の硬化性組成物

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1275668B1 (en) * 2000-03-30 2011-05-11 Mitsubishi Chemical Corporation Photocurable composition, cured object, and process for producing the same
US7745505B2 (en) * 2004-12-29 2010-06-29 Henkel Ag & Co. Kgaa Photoinitiators and UV-crosslinkable acrylic polymers for pressure sensitive adhesives
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8106134B2 (en) 2008-08-28 2012-01-31 Bridgestone Sports Co., Ltd. Golf ball and method of improving golf ball performance
US20100109195A1 (en) 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography
US20120016050A1 (en) 2008-12-26 2012-01-19 Leon Joseph A Monoisocyanate-Acrylate Monomers and Products Ulitilizing the Same
KR20110007687A (ko) * 2009-07-17 2011-01-25 공주대학교 산학협력단 무용제 자외선 경화형 아크릴 점착제 조성물 및 그 제조방법
EP2484706A1 (de) 2011-02-03 2012-08-08 Sika Technology AG Haftvermittlerzusammensetzung
IN2014DN00290A (https=) 2011-06-17 2015-06-05 Materia Inc
WO2013019821A1 (en) 2011-08-01 2013-02-07 Sun Chemical Corporation High-stretch energy curable inks & method of use in heat transfer label applications
CN103946998B (zh) * 2011-11-18 2017-03-29 Lg化学株式会社 用于封装有机电子器件的光可固化压敏粘合剂膜，有机电子器件及其封装方法
JP2016183304A (ja) * 2015-03-26 2016-10-20 デクセリアルズ株式会社 アクリル系粘着テープの製造方法及びアクリル系粘着テープ
KR102047291B1 (ko) * 2016-09-23 2019-11-21 주식회사 엘지화학 접착제 조성물
CN108003802B (zh) * 2017-12-07 2021-03-30 烟台德邦科技股份有限公司 一种基于逐步聚合机理热致自愈合紫外光固化胶黏剂
US20200339828A1 (en) 2019-04-26 2020-10-29 Canon Kabushiki Kaisha Photocurable composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008138160A (ja) * 2006-11-08 2008-06-19 Sumitomo Osaka Cement Co Ltd ハードコート膜形成用塗料とハードコート膜及びハードコート膜付きプラスチック基材並びにポリビニル樹脂組成物の製造方法
JP2016002683A (ja) * 2014-06-16 2016-01-12 コニカミノルタ株式会社 ３ｄ造形物の製造方法、３ｄ造形用光硬化性組成物および３ｄ造形用インクセット
JP2020532631A (ja) * 2017-09-22 2020-11-12 エルジー・ケム・リミテッド 偏光板保護層用の無溶剤型光硬化性樹脂組成物、これの硬化物を含む偏光板及び画像表示装置
JP2019108535A (ja) * 2017-12-15 2019-07-04 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 熱成形可能なハードコート用途のためのｕｖ−硬化アクリル樹脂組成物
JP2019183031A (ja) * 2018-04-12 2019-10-24 積水化学工業株式会社 接着剤樹脂組成物
JP2021050332A (ja) * 2019-09-23 2021-04-01 キヤノン株式会社 ナノファブリケーション用の硬化性組成物

Also Published As

Publication number Publication date
KR20230173705A (ko) 2023-12-27
TWI833173B (zh) 2024-02-21
US20220363807A1 (en) 2022-11-17
TW202309658A (zh) 2023-03-01
US11753497B2 (en) 2023-09-12
KR102899614B1 (ko) 2025-12-15
WO2022231753A1 (en) 2022-11-03

Similar Documents

Publication Publication Date Title
JP7423658B2 (ja) 光硬化性組成物
JP7754988B2 (ja) 仮固定組成物及びその硬化体、並びにそれを用いる半導体ウエハの製造方法
JP7663515B2 (ja) 硬化性組成物
TW200903146A (en) Method for imprint lithography utilizing an adhesion primer layer
KR20230120130A (ko) 높은 열적 안정성을 갖는 경화된 층을 형성하기 위한 광경화성 조성물
JP2009503139A (ja) 材料を相互に接着するための方法及び組成物
TWI535809B (zh) A semiconductor adhesive composition, a semiconductor wafer, and a semiconductor device
TWI600740B (zh) Sheet having a curable resin film-forming layer, and method of manufacturing the semiconductor device using the same
JP7629143B2 (ja) 仮固定用組成物、仮固定用接着剤、及び薄型ウエハの製造方法
TWI837235B (zh) 附有硬塗層之模製樹脂及其製造方法
JP2021510394A (ja) 臨時固定用粘着シートおよびこれを使用した半導体装置の製造方法
CN106715631B (zh) 半导体用粘合剂组合物和切割管芯粘结膜
JP7638439B2 (ja) 仮固定用組成物
JP7223073B2 (ja) 光硬化性組成物
KR20120080385A (ko) 패턴 형성용 접착 필름 조성물, 이를 포함하는 접착 필름 및 이를 이용한 반도체 패키징 방법
JP2024516479A (ja) 光硬化性組成物
JP5698958B2 (ja) インプリント用モールドの製造方法
WO2019199085A1 (ko) 임시고정용 점착시트 및 이를 사용한 반도체 장치의 제조 방법
CN112447573B (zh) 保护膜形成用复合片
JP2016171182A (ja) インプリント用モールドおよびその製造方法、並びに微細構造の製造方法
WO2025192625A1 (ja) 組成物、仮固定用組成物、及びこれを用いたウエハの製造方法
JP2023001909A (ja) ディスプレイ用接着シート、及びこれを含むディスプレイ
TW202216794A (zh) 光可固化組成物
JPWO2022231753A5 (https=)
JP2014220454A (ja) インプリント用レジスト材およびそれを用いた微細構造の製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250327

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250327

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20251224

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20260202

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20260401