JP2023525584A5 - - Google Patents

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Publication number
JP2023525584A5
JP2023525584A5 JP2022569122A JP2022569122A JP2023525584A5 JP 2023525584 A5 JP2023525584 A5 JP 2023525584A5 JP 2022569122 A JP2022569122 A JP 2022569122A JP 2022569122 A JP2022569122 A JP 2022569122A JP 2023525584 A5 JP2023525584 A5 JP 2023525584A5
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JP
Japan
Prior art keywords
dark
objective lens
field
sample
aperture
Prior art date
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Granted
Application number
JP2022569122A
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English (en)
Japanese (ja)
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JP2023525584A (ja
JP7576635B2 (ja
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Priority claimed from US17/313,703 external-priority patent/US11733172B2/en
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Publication of JP2023525584A publication Critical patent/JP2023525584A/ja
Publication of JP2023525584A5 publication Critical patent/JP2023525584A5/ja
Application granted granted Critical
Publication of JP7576635B2 publication Critical patent/JP7576635B2/ja
Active legal-status Critical Current
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JP2022569122A 2020-05-15 2021-05-10 光学対物レンズを回転させるための装置および方法 Active JP7576635B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063025192P 2020-05-15 2020-05-15
US63/025,192 2020-05-15
US17/313,703 2021-05-06
US17/313,703 US11733172B2 (en) 2020-05-15 2021-05-06 Apparatus and method for rotating an optical objective
PCT/US2021/031662 WO2021231342A1 (en) 2020-05-15 2021-05-10 Apparatus and method for rotating an optical objective

Publications (3)

Publication Number Publication Date
JP2023525584A JP2023525584A (ja) 2023-06-16
JP2023525584A5 true JP2023525584A5 (https=) 2024-03-18
JP7576635B2 JP7576635B2 (ja) 2024-10-31

Family

ID=78513281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022569122A Active JP7576635B2 (ja) 2020-05-15 2021-05-10 光学対物レンズを回転させるための装置および方法

Country Status (7)

Country Link
US (1) US11733172B2 (https=)
EP (1) EP4115229A4 (https=)
JP (1) JP7576635B2 (https=)
KR (1) KR102735955B1 (https=)
CN (1) CN115516361B (https=)
TW (1) TWI860476B (https=)
WO (1) WO2021231342A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7640397B2 (ja) * 2021-07-28 2025-03-05 アンリツ株式会社 物品検査装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE408638C (de) * 1924-01-17 1925-01-22 Ernst Leitz Spiegelkondensor fuer Dunkelfeldbeleuchtung
JP2732123B2 (ja) * 1989-06-19 1998-03-25 旭光学工業株式会社 パターン検査装置
US5820250A (en) 1995-10-24 1998-10-13 Dolan-Jenner Industries, Inc. Dark field illuminator ringlight adaptor
JP3185878B2 (ja) 1998-09-25 2001-07-11 日本電気株式会社 光学的検査装置
AU2002219847A1 (en) 2000-11-15 2002-05-27 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US6538730B2 (en) 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
US7369233B2 (en) * 2002-11-26 2008-05-06 Kla-Tencor Technologies Corporation Optical system for measuring samples using short wavelength radiation
US7433031B2 (en) * 2003-10-29 2008-10-07 Core Tech Optical, Inc. Defect review system with 2D scanning and a ring detector
WO2007008742A1 (en) * 2005-07-08 2007-01-18 Electro Scientific Industries, Inc. Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination
KR100663365B1 (ko) * 2005-07-18 2007-01-02 삼성전자주식회사 내부에 적어도 한 쌍의 빔 경로들을 갖는 렌즈 유니트를구비하는 광학적 검사장비들 및 이를 사용하여 기판의 표면결함들을 검출하는 방법들
DE102009017694B3 (de) * 2009-04-15 2010-12-02 Göpel electronic GmbH Anordnung einer rotatorischen Bildaufnahmeeinheit für die Abbildung von Objekten auf Leiterplatten unter einem polaren Betrachtungswinkel von 45°
JP5639169B2 (ja) * 2009-07-22 2014-12-10 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 暗視野検査システムおよび暗視野検査システムを構成する方法
US9044141B2 (en) * 2010-02-10 2015-06-02 Tokitae Llc Systems, devices, and methods including a dark-field reflected-illumination apparatus
DE102011114377A1 (de) * 2011-09-23 2013-03-28 Carl Zeiss Microscopy Gmbh Vorrichtung und Verfahren zur Durchlichtbeleuchtung für Lichtmikroskope und Mikroskopsystem
US10437034B2 (en) * 2014-10-14 2019-10-08 Nanotronics Imaging, Inc. Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto
US10072921B2 (en) * 2014-12-05 2018-09-11 Kla-Tencor Corporation Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element
DE102015105613B4 (de) * 2015-04-13 2023-08-31 Carl Zeiss Industrielle Messtechnik Gmbh Auflicht-Beleuchtung für variablen Arbeitsabstand
FR3045156B1 (fr) * 2015-12-11 2017-12-22 Soitec Silicon On Insulator Procede de detection de defauts et dispositif associe
KR102217258B1 (ko) * 2016-04-28 2021-02-18 에이에스엠엘 네델란즈 비.브이. Hhg 소스, 검사 장치, 및 측정 수행 방법
US10739275B2 (en) 2016-09-15 2020-08-11 Kla-Tencor Corporation Simultaneous multi-directional laser wafer inspection
CN207833096U (zh) * 2018-01-23 2018-09-07 芜湖市奥尔特光电科技有限公司 一种a-117痕迹检验综合仪

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