CN115516361B - 用于旋转光学物镜的设备及方法 - Google Patents

用于旋转光学物镜的设备及方法

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Publication number
CN115516361B
CN115516361B CN202180032556.7A CN202180032556A CN115516361B CN 115516361 B CN115516361 B CN 115516361B CN 202180032556 A CN202180032556 A CN 202180032556A CN 115516361 B CN115516361 B CN 115516361B
Authority
CN
China
Prior art keywords
dark
field
objective
sample
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202180032556.7A
Other languages
English (en)
Chinese (zh)
Other versions
CN115516361A (zh
Inventor
A·罗曼诺夫斯基
J-K·龙
D·卡瓦德杰夫
王春海
B·怀特塞德
志伟·史蒂夫·许
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of CN115516361A publication Critical patent/CN115516361A/zh
Application granted granted Critical
Publication of CN115516361B publication Critical patent/CN115516361B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/10—Condensers affording dark-field illumination
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/24—Base structure
    • G02B21/26—Stages; Adjusting means therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts

Landscapes

  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
CN202180032556.7A 2020-05-15 2021-05-10 用于旋转光学物镜的设备及方法 Active CN115516361B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063025192P 2020-05-15 2020-05-15
US63/025,192 2020-05-15
US17/313,703 2021-05-06
US17/313,703 US11733172B2 (en) 2020-05-15 2021-05-06 Apparatus and method for rotating an optical objective
PCT/US2021/031662 WO2021231342A1 (en) 2020-05-15 2021-05-10 Apparatus and method for rotating an optical objective

Publications (2)

Publication Number Publication Date
CN115516361A CN115516361A (zh) 2022-12-23
CN115516361B true CN115516361B (zh) 2026-04-17

Family

ID=78513281

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180032556.7A Active CN115516361B (zh) 2020-05-15 2021-05-10 用于旋转光学物镜的设备及方法

Country Status (7)

Country Link
US (1) US11733172B2 (https=)
EP (1) EP4115229A4 (https=)
JP (1) JP7576635B2 (https=)
KR (1) KR102735955B1 (https=)
CN (1) CN115516361B (https=)
TW (1) TWI860476B (https=)
WO (1) WO2021231342A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7640397B2 (ja) * 2021-07-28 2025-03-05 アンリツ株式会社 物品検査装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE408638C (de) * 1924-01-17 1925-01-22 Ernst Leitz Spiegelkondensor fuer Dunkelfeldbeleuchtung
JP2732123B2 (ja) * 1989-06-19 1998-03-25 旭光学工業株式会社 パターン検査装置
US5820250A (en) 1995-10-24 1998-10-13 Dolan-Jenner Industries, Inc. Dark field illuminator ringlight adaptor
JP3185878B2 (ja) 1998-09-25 2001-07-11 日本電気株式会社 光学的検査装置
AU2002219847A1 (en) 2000-11-15 2002-05-27 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US6538730B2 (en) 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
US7369233B2 (en) * 2002-11-26 2008-05-06 Kla-Tencor Technologies Corporation Optical system for measuring samples using short wavelength radiation
US7433031B2 (en) * 2003-10-29 2008-10-07 Core Tech Optical, Inc. Defect review system with 2D scanning and a ring detector
WO2007008742A1 (en) * 2005-07-08 2007-01-18 Electro Scientific Industries, Inc. Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination
KR100663365B1 (ko) * 2005-07-18 2007-01-02 삼성전자주식회사 내부에 적어도 한 쌍의 빔 경로들을 갖는 렌즈 유니트를구비하는 광학적 검사장비들 및 이를 사용하여 기판의 표면결함들을 검출하는 방법들
DE102009017694B3 (de) * 2009-04-15 2010-12-02 Göpel electronic GmbH Anordnung einer rotatorischen Bildaufnahmeeinheit für die Abbildung von Objekten auf Leiterplatten unter einem polaren Betrachtungswinkel von 45°
JP5639169B2 (ja) * 2009-07-22 2014-12-10 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 暗視野検査システムおよび暗視野検査システムを構成する方法
US9044141B2 (en) * 2010-02-10 2015-06-02 Tokitae Llc Systems, devices, and methods including a dark-field reflected-illumination apparatus
DE102011114377A1 (de) * 2011-09-23 2013-03-28 Carl Zeiss Microscopy Gmbh Vorrichtung und Verfahren zur Durchlichtbeleuchtung für Lichtmikroskope und Mikroskopsystem
US10437034B2 (en) * 2014-10-14 2019-10-08 Nanotronics Imaging, Inc. Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto
US10072921B2 (en) * 2014-12-05 2018-09-11 Kla-Tencor Corporation Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element
DE102015105613B4 (de) * 2015-04-13 2023-08-31 Carl Zeiss Industrielle Messtechnik Gmbh Auflicht-Beleuchtung für variablen Arbeitsabstand
FR3045156B1 (fr) * 2015-12-11 2017-12-22 Soitec Silicon On Insulator Procede de detection de defauts et dispositif associe
KR102217258B1 (ko) * 2016-04-28 2021-02-18 에이에스엠엘 네델란즈 비.브이. Hhg 소스, 검사 장치, 및 측정 수행 방법
US10739275B2 (en) 2016-09-15 2020-08-11 Kla-Tencor Corporation Simultaneous multi-directional laser wafer inspection
CN207833096U (zh) * 2018-01-23 2018-09-07 芜湖市奥尔特光电科技有限公司 一种a-117痕迹检验综合仪

Also Published As

Publication number Publication date
EP4115229A1 (en) 2023-01-11
JP2023525584A (ja) 2023-06-16
US11733172B2 (en) 2023-08-22
TW202146974A (zh) 2021-12-16
TWI860476B (zh) 2024-11-01
WO2021231342A1 (en) 2021-11-18
CN115516361A (zh) 2022-12-23
JP7576635B2 (ja) 2024-10-31
EP4115229A4 (en) 2024-04-24
US20210356406A1 (en) 2021-11-18
KR20230005402A (ko) 2023-01-09
KR102735955B1 (ko) 2024-11-28

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