TWI860476B - 用於旋轉一光學物鏡之設備及方法 - Google Patents

用於旋轉一光學物鏡之設備及方法 Download PDF

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Publication number
TWI860476B
TWI860476B TW110117424A TW110117424A TWI860476B TW I860476 B TWI860476 B TW I860476B TW 110117424 A TW110117424 A TW 110117424A TW 110117424 A TW110117424 A TW 110117424A TW I860476 B TWI860476 B TW I860476B
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TW
Taiwan
Prior art keywords
dark field
objective lens
sample
aperture
illumination
Prior art date
Application number
TW110117424A
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English (en)
Chinese (zh)
Other versions
TW202146974A (zh
Inventor
阿那托利 羅曼諾夫斯基
振坤 廖
丹尼爾 卡瓦德傑夫
春翰 王
布萊特 懷特席德
史提夫 蘇
Original Assignee
美商科磊股份有限公司
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Publication of TW202146974A publication Critical patent/TW202146974A/zh
Application granted granted Critical
Publication of TWI860476B publication Critical patent/TWI860476B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/10—Condensers affording dark-field illumination
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/24—Base structure
    • G02B21/26—Stages; Adjusting means therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts

Landscapes

  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW110117424A 2020-05-15 2021-05-14 用於旋轉一光學物鏡之設備及方法 TWI860476B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US202063025192P 2020-05-15 2020-05-15
US63/025,192 2020-05-15
US17/313,703 2021-05-06
US17/313,703 US11733172B2 (en) 2020-05-15 2021-05-06 Apparatus and method for rotating an optical objective

Publications (2)

Publication Number Publication Date
TW202146974A TW202146974A (zh) 2021-12-16
TWI860476B true TWI860476B (zh) 2024-11-01

Family

ID=78513281

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110117424A TWI860476B (zh) 2020-05-15 2021-05-14 用於旋轉一光學物鏡之設備及方法

Country Status (7)

Country Link
US (1) US11733172B2 (https=)
EP (1) EP4115229A4 (https=)
JP (1) JP7576635B2 (https=)
KR (1) KR102735955B1 (https=)
CN (1) CN115516361B (https=)
TW (1) TWI860476B (https=)
WO (1) WO2021231342A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7640397B2 (ja) * 2021-07-28 2025-03-05 アンリツ株式会社 物品検査装置

Citations (5)

* Cited by examiner, † Cited by third party
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US20020088952A1 (en) * 2000-11-15 2002-07-11 Rao Nagaraja P. Optical method and apparatus for inspecting large area planar objects
US20070013901A1 (en) * 2005-07-18 2007-01-18 Samsung Electronics Co., Ltd. Optical inspection tool having lens unit with multiple beam paths for detecting surface defects of a substrate and methods of using same
TWI536012B (zh) * 2009-07-22 2016-06-01 克萊譚克公司 暗場檢驗系統及其之提供方法
JP2018512623A (ja) * 2015-04-13 2018-05-17 カール・ツアイス・インダストリーエレ・メステクニク・ゲーエムベーハー 可変の作動距離用の入射光照明
US20200026053A1 (en) * 2014-10-14 2020-01-23 Nanotronics Imaging, Inc. Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto

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DE408638C (de) * 1924-01-17 1925-01-22 Ernst Leitz Spiegelkondensor fuer Dunkelfeldbeleuchtung
JP2732123B2 (ja) * 1989-06-19 1998-03-25 旭光学工業株式会社 パターン検査装置
US5820250A (en) 1995-10-24 1998-10-13 Dolan-Jenner Industries, Inc. Dark field illuminator ringlight adaptor
JP3185878B2 (ja) 1998-09-25 2001-07-11 日本電気株式会社 光学的検査装置
US6538730B2 (en) 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
US7369233B2 (en) * 2002-11-26 2008-05-06 Kla-Tencor Technologies Corporation Optical system for measuring samples using short wavelength radiation
US7433031B2 (en) * 2003-10-29 2008-10-07 Core Tech Optical, Inc. Defect review system with 2D scanning and a ring detector
WO2007008742A1 (en) * 2005-07-08 2007-01-18 Electro Scientific Industries, Inc. Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination
DE102009017694B3 (de) * 2009-04-15 2010-12-02 Göpel electronic GmbH Anordnung einer rotatorischen Bildaufnahmeeinheit für die Abbildung von Objekten auf Leiterplatten unter einem polaren Betrachtungswinkel von 45°
US9044141B2 (en) * 2010-02-10 2015-06-02 Tokitae Llc Systems, devices, and methods including a dark-field reflected-illumination apparatus
DE102011114377A1 (de) * 2011-09-23 2013-03-28 Carl Zeiss Microscopy Gmbh Vorrichtung und Verfahren zur Durchlichtbeleuchtung für Lichtmikroskope und Mikroskopsystem
US10072921B2 (en) * 2014-12-05 2018-09-11 Kla-Tencor Corporation Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element
FR3045156B1 (fr) * 2015-12-11 2017-12-22 Soitec Silicon On Insulator Procede de detection de defauts et dispositif associe
KR102217258B1 (ko) * 2016-04-28 2021-02-18 에이에스엠엘 네델란즈 비.브이. Hhg 소스, 검사 장치, 및 측정 수행 방법
US10739275B2 (en) 2016-09-15 2020-08-11 Kla-Tencor Corporation Simultaneous multi-directional laser wafer inspection
CN207833096U (zh) * 2018-01-23 2018-09-07 芜湖市奥尔特光电科技有限公司 一种a-117痕迹检验综合仪

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020088952A1 (en) * 2000-11-15 2002-07-11 Rao Nagaraja P. Optical method and apparatus for inspecting large area planar objects
US20070013901A1 (en) * 2005-07-18 2007-01-18 Samsung Electronics Co., Ltd. Optical inspection tool having lens unit with multiple beam paths for detecting surface defects of a substrate and methods of using same
TWI536012B (zh) * 2009-07-22 2016-06-01 克萊譚克公司 暗場檢驗系統及其之提供方法
US20200026053A1 (en) * 2014-10-14 2020-01-23 Nanotronics Imaging, Inc. Unique oblique lighting technique using a brightfield darkfield objective and imaging method relating thereto
JP2018512623A (ja) * 2015-04-13 2018-05-17 カール・ツアイス・インダストリーエレ・メステクニク・ゲーエムベーハー 可変の作動距離用の入射光照明

Also Published As

Publication number Publication date
EP4115229A1 (en) 2023-01-11
JP2023525584A (ja) 2023-06-16
US11733172B2 (en) 2023-08-22
TW202146974A (zh) 2021-12-16
WO2021231342A1 (en) 2021-11-18
CN115516361A (zh) 2022-12-23
CN115516361B (zh) 2026-04-17
JP7576635B2 (ja) 2024-10-31
EP4115229A4 (en) 2024-04-24
US20210356406A1 (en) 2021-11-18
KR20230005402A (ko) 2023-01-09
KR102735955B1 (ko) 2024-11-28

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